AU2003252351A1 - Plasma processing apparatus and plasma processing method - Google Patents

Plasma processing apparatus and plasma processing method

Info

Publication number
AU2003252351A1
AU2003252351A1 AU2003252351A AU2003252351A AU2003252351A1 AU 2003252351 A1 AU2003252351 A1 AU 2003252351A1 AU 2003252351 A AU2003252351 A AU 2003252351A AU 2003252351 A AU2003252351 A AU 2003252351A AU 2003252351 A1 AU2003252351 A1 AU 2003252351A1
Authority
AU
Australia
Prior art keywords
plasma processing
processing apparatus
processing method
plasma
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003252351A
Inventor
Toshiaki Hongoh
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2003252351A1 publication Critical patent/AU2003252351A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
AU2003252351A 2002-07-30 2003-07-30 Plasma processing apparatus and plasma processing method Abandoned AU2003252351A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-221260 2002-07-30
JP2002221260A JP2006054206A (en) 2002-07-30 2002-07-30 Plasma processing apparatus and method
PCT/JP2003/009695 WO2004012251A1 (en) 2002-07-30 2003-07-30 Plasma processing apparatus and plasma processing method

Publications (1)

Publication Number Publication Date
AU2003252351A1 true AU2003252351A1 (en) 2004-02-16

Family

ID=31184850

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003252351A Abandoned AU2003252351A1 (en) 2002-07-30 2003-07-30 Plasma processing apparatus and plasma processing method

Country Status (3)

Country Link
JP (1) JP2006054206A (en)
AU (1) AU2003252351A1 (en)
WO (1) WO2004012251A1 (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008005186A (en) * 2006-06-22 2008-01-10 Ube Ind Ltd Thin film piezoelectric resonator and thin film piezoelectric filter
US7485827B2 (en) 2006-07-21 2009-02-03 Alter S.R.L. Plasma generator

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0888096A (en) * 1994-09-19 1996-04-02 Hitachi Ltd Plasma generating method
JPH09293599A (en) * 1996-04-30 1997-11-11 Hitachi Ltd Plasma treating method and device
US6312554B1 (en) * 1996-12-05 2001-11-06 Applied Materials, Inc. Apparatus and method for controlling the ratio of reactive to non-reactive ions in a semiconductor wafer processing chamber

Also Published As

Publication number Publication date
WO2004012251A1 (en) 2004-02-05
JP2006054206A (en) 2006-02-23

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase