AU2003239102A1 - Method for electroless metalisation of polymer substrate - Google Patents

Method for electroless metalisation of polymer substrate

Info

Publication number
AU2003239102A1
AU2003239102A1 AU2003239102A AU2003239102A AU2003239102A1 AU 2003239102 A1 AU2003239102 A1 AU 2003239102A1 AU 2003239102 A AU2003239102 A AU 2003239102A AU 2003239102 A AU2003239102 A AU 2003239102A AU 2003239102 A1 AU2003239102 A1 AU 2003239102A1
Authority
AU
Australia
Prior art keywords
metalisation
electroless
polymer substrate
polymer
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003239102A
Other versions
AU2003239102A8 (en
Inventor
Sunil Madhukar Bhangale
Peter Malcolm Moran
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Agency for Science Technology and Research Singapore
Original Assignee
Institute of Materials Research and Engineering
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Institute of Materials Research and Engineering filed Critical Institute of Materials Research and Engineering
Publication of AU2003239102A1 publication Critical patent/AU2003239102A1/en
Publication of AU2003239102A8 publication Critical patent/AU2003239102A8/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/28—Sensitising or activating
    • C23C18/30—Activating or accelerating or sensitising with palladium or other noble metal
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1603—Process or apparatus coating on selected surface areas
    • C23C18/1605—Process or apparatus coating on selected surface areas by masking
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1633—Process of electroless plating
    • C23C18/1689—After-treatment
    • C23C18/1692—Heat-treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073—Multistep pretreatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/18—Pretreatment of the material to be coated
    • C23C18/20—Pretreatment of the material to be coated of organic surfaces, e.g. resins
    • C23C18/2006—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30
    • C23C18/2046—Pretreatment of the material to be coated of organic surfaces, e.g. resins by other methods than those of C23C18/22 - C23C18/30 by chemical pretreatment
    • C23C18/2073—Multistep pretreatment
    • C23C18/2086—Multistep pretreatment with use of organic or inorganic compounds other than metals, first
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0313—Organic insulating material
    • H05K1/032—Organic insulating material consisting of one material
    • H05K1/0346—Organic insulating material consisting of one material containing N
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/18—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material
    • H05K3/181—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern using precipitation techniques to apply the conductive material by electroless plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Chemically Coating (AREA)
AU2003239102A 2002-06-04 2003-06-03 Method for electroless metalisation of polymer substrate Abandoned AU2003239102A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
SG20023314-0 2002-06-04
SG200203314A SG107593A1 (en) 2002-06-04 2002-06-04 Method for electroless metalisation of polymer substrate
PCT/SG2003/000136 WO2003102267A1 (en) 2002-06-04 2003-06-03 Method for electroless metalisation of polymer substrate

Publications (2)

Publication Number Publication Date
AU2003239102A1 true AU2003239102A1 (en) 2003-12-19
AU2003239102A8 AU2003239102A8 (en) 2003-12-19

Family

ID=29708003

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003239102A Abandoned AU2003239102A1 (en) 2002-06-04 2003-06-03 Method for electroless metalisation of polymer substrate

Country Status (6)

Country Link
CN (1) CN100424226C (en)
AU (1) AU2003239102A1 (en)
MY (1) MY135932A (en)
SG (1) SG107593A1 (en)
TW (1) TWI255825B (en)
WO (1) WO2003102267A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2078607B1 (en) * 2006-10-23 2018-09-12 FUJIFILM Corporation Process for producing a metal film coated material, process for producing a metallic pattern bearing material and use of a composition for polymer layer formation
CN103588930B (en) * 2006-10-23 2017-04-26 富士胶片株式会社 Nitrile group-containing polymer, synthesizing method thereof, composition using nitrile group-containing polymer, and laminated body
TWI475934B (en) * 2013-04-22 2015-03-01 Ichia Tech Inc Flexible circuit board and process for producing the same
TW201505493A (en) 2013-07-17 2015-02-01 Ichia Tech Inc Precursor substrate, flexible circuit board and process for producing the same
TW201529885A (en) * 2014-01-24 2015-08-01 Taiwan Uyemura Co Ltd Polyimide substrate metallization method
JP6328575B2 (en) * 2015-02-23 2018-05-23 東京エレクトロン株式会社 Catalyst layer forming method, catalyst layer forming system, and storage medium
JP6944197B2 (en) 2015-06-04 2021-10-06 カティーバ， インコーポレイテッド Method for manufacturing etch resist pattern on metal surface
KR102626521B1 (en) * 2015-08-13 2024-01-17 카티바, 인크. Methods for producing an etch resist pattern on a metallic surface
CN111434190B (en) * 2018-11-09 2022-08-09 庆鼎精密电子（淮安）有限公司 Rigid-flexible circuit board and manufacturing method thereof
CN113893876B (en) * 2021-09-10 2023-07-21 浙江鑫柔科技有限公司 Electroless copper plating catalyst and method for forming metal mesh using the same
CN115249757A (en) * 2022-09-20 2022-10-28 南昌凯捷半导体科技有限公司 Step-free mini LED chip and manufacturing method thereof

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3149919A1 (en) * 1981-12-11 1983-06-23 Schering Ag, 1000 Berlin Und 4619 Bergkamen METHOD FOR ADHESIVELY METALLIZING POLYIMIDE
US4640718A (en) * 1985-10-29 1987-02-03 International Business Machines Corporation Process for accelerating Pd/Sn seeds for electroless copper plating
US4770899A (en) * 1987-06-10 1988-09-13 Unisys Corporation Method of coating copper conductors on polyimide with a corrosion resistant metal, and module produced thereby
DE69229115T2 (en) * 1991-06-20 1999-10-14 Harnden BASIC ACCELERATOR SOLUTION FOR DIRECT ELECTRO COATING
US5376248A (en) * 1991-10-15 1994-12-27 Enthone-Omi, Inc. Direct metallization process
JPH07216553A (en) * 1994-01-28 1995-08-15 Sumitomo Metal Mining Co Ltd Production of copper-coated polyimide substrate

Also Published As

Publication number Publication date
WO2003102267A1 (en) 2003-12-11
MY135932A (en) 2008-07-31
TWI255825B (en) 2006-06-01
CN100424226C (en) 2008-10-08
WO2003102267A8 (en) 2004-04-15
SG107593A1 (en) 2004-12-29
TW200403290A (en) 2004-03-01
AU2003239102A8 (en) 2003-12-19
CN1659310A (en) 2005-08-24

Similar Documents

Publication Publication Date Title
EP1443127B8 (en) Method for coating large-area substrates
AU2003236304A1 (en) Method of treating substrate
AU2003278248A1 (en) Diffusing substrate
AU2003262077A1 (en) Method for cutting semiconductor substrate
AU2003266565A1 (en) Substrate processing apparatus
AU2003266564A1 (en) Substrate processing apparatus
AU2003205552A1 (en) Methods of treating polymeric substrates
AU2003234206A1 (en) Substrate transfer apparatus
AU2003251718A1 (en) Formation of lattice-tuning semiconductor substrates
AU2003251376A1 (en) Formation of lattice-tuning semiconductor substrates
AU2002359947A1 (en) Substrate treatment apparatus
AU2003265634A1 (en) Substrate processing system
AU2003244352A1 (en) Method of producing organic semiconductor device
AU2003239102A1 (en) Method for electroless metalisation of polymer substrate
AU2002367724A1 (en) Method of carrying substrate
AU2003231516A1 (en) Method of treating substrate
AU2003244412A1 (en) Method for forming electroluminescent devices
AU2003257620A1 (en) Substrate treating apparatus
AU2003214524A1 (en) Method of manufacturing an electronic device
AU2003219996A1 (en) Metallization of polymer parts for painting
AU2003262125A1 (en) Improved method for etching vias
AU2003274369A1 (en) Formation of contacts on semiconductor substrates
AU2003255034A1 (en) Method of forming insulation film on semiconductor substrate
AU2003248256A1 (en) Surface treating method for substrate
AU2003241759A1 (en) Method of electroless plating

Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase