AU2003236154A1 - Circuit pattern dividing method, stencil mask manufacturing method, stencil mask, and exposure method - Google Patents
Circuit pattern dividing method, stencil mask manufacturing method, stencil mask, and exposure methodInfo
- Publication number
- AU2003236154A1 AU2003236154A1 AU2003236154A AU2003236154A AU2003236154A1 AU 2003236154 A1 AU2003236154 A1 AU 2003236154A1 AU 2003236154 A AU2003236154 A AU 2003236154A AU 2003236154 A AU2003236154 A AU 2003236154A AU 2003236154 A1 AU2003236154 A1 AU 2003236154A1
- Authority
- AU
- Australia
- Prior art keywords
- stencil mask
- circuit pattern
- pattern dividing
- exposure
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F1/00—Details not covered by groups G06F3/00 - G06F13/00 and G06F21/00
- G06F1/16—Constructional details or arrangements
- G06F1/20—Cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
- H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
- H01L21/0274—Photolithographic processes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Theoretical Computer Science (AREA)
- Human Computer Interaction (AREA)
- General Engineering & Computer Science (AREA)
- Electron Beam Exposure (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002-85748 | 2002-03-26 | ||
JP2002085748 | 2002-03-26 | ||
PCT/JP2003/003731 WO2003081649A1 (en) | 2002-03-26 | 2003-03-26 | Circuit pattern dividing method, stencil mask manufacturing method, stencil mask, and exposure method |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003236154A1 true AU2003236154A1 (en) | 2003-10-08 |
Family
ID=28449269
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003236154A Abandoned AU2003236154A1 (en) | 2002-03-26 | 2003-03-26 | Circuit pattern dividing method, stencil mask manufacturing method, stencil mask, and exposure method |
Country Status (8)
Country | Link |
---|---|
US (1) | US7181722B2 (en) |
EP (1) | EP1489644A1 (en) |
JP (1) | JP4314998B2 (en) |
KR (1) | KR100931552B1 (en) |
CN (1) | CN100380583C (en) |
AU (1) | AU2003236154A1 (en) |
TW (1) | TWI296823B (en) |
WO (1) | WO2003081649A1 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8100847B2 (en) * | 2007-10-25 | 2012-01-24 | Fournet Ii Louis J | Protective skin cover |
US8369569B2 (en) * | 2008-03-21 | 2013-02-05 | Synopsys, Inc. | Method and apparatus for detecting non-uniform fracturing of a photomask shape |
CN102339329B (en) * | 2010-07-19 | 2013-07-31 | 中国科学院微电子研究所 | Method for dividing physical layout |
US9854856B1 (en) | 2012-04-13 | 2018-01-02 | Jimmy R. Baldonado | Safety vest |
JP6988202B2 (en) * | 2017-03-23 | 2022-01-05 | 大日本印刷株式会社 | Mask for charged particle beam exposure and its manufacturing method |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3105580B2 (en) * | 1991-07-29 | 2000-11-06 | 富士通株式会社 | Method of making charged particle beam drawing mask and mask |
JP3357927B2 (en) * | 1993-07-09 | 2002-12-16 | 株式会社ニコン | Charged particle beam exposure apparatus and charged particle beam exposure method |
JP3491093B2 (en) * | 1994-03-30 | 2004-01-26 | 株式会社ニコン | Exposure data creation device for mask |
JP3601630B2 (en) * | 1995-11-01 | 2004-12-15 | 株式会社ニコン | Charged particle beam transfer method |
JP3360666B2 (en) * | 1999-11-12 | 2002-12-24 | 日本電気株式会社 | Drawing pattern verification method |
JP3476410B2 (en) * | 2000-03-01 | 2003-12-10 | Necエレクトロニクス株式会社 | Manufacturing method of exposure mask |
JP3479024B2 (en) * | 2000-03-28 | 2003-12-15 | Necエレクトロニクス株式会社 | Electron beam exposure mask and pattern design method thereof |
US6855467B2 (en) * | 2000-09-05 | 2005-02-15 | Hoya Corporation | Transfer mask, method of dividing pattern or transfer mask, and method of manufacturing transfer mask |
JP2002260983A (en) * | 2001-02-28 | 2002-09-13 | Nec Corp | Eb transfer mask and its manufacturing method |
JP4746753B2 (en) * | 2001-03-05 | 2011-08-10 | ルネサスエレクトロニクス株式会社 | Charged particle beam exposure mask forming method and pattern data processing program for forming charged particle beam mask |
US6830852B2 (en) * | 2001-07-19 | 2004-12-14 | Nikon Corporation | Stencil reticles for use in charged-particle-beam microlithography, and pattern-determination methods for such reticles |
JP2003045786A (en) * | 2001-08-01 | 2003-02-14 | Seiko Instruments Inc | Layout figure data division processing apparatus and method of stencil mask, and program for making computer perform layout figure data division processing of the stencil mask |
JP2003092250A (en) * | 2001-09-18 | 2003-03-28 | Hitachi Ltd | Semiconductor device and manufacturing method therefor |
JP3686367B2 (en) * | 2001-11-15 | 2005-08-24 | 株式会社ルネサステクノロジ | Pattern forming method and semiconductor device manufacturing method |
-
2003
- 2003-03-26 KR KR1020047014234A patent/KR100931552B1/en not_active IP Right Cessation
- 2003-03-26 EP EP03745010A patent/EP1489644A1/en not_active Withdrawn
- 2003-03-26 AU AU2003236154A patent/AU2003236154A1/en not_active Abandoned
- 2003-03-26 JP JP2003579270A patent/JP4314998B2/en not_active Expired - Fee Related
- 2003-03-26 WO PCT/JP2003/003731 patent/WO2003081649A1/en active Application Filing
- 2003-03-26 TW TW092106716A patent/TWI296823B/en not_active IP Right Cessation
- 2003-03-26 CN CNB038068850A patent/CN100380583C/en not_active Expired - Fee Related
-
2004
- 2004-09-24 US US10/948,154 patent/US7181722B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TWI296823B (en) | 2008-05-11 |
JP4314998B2 (en) | 2009-08-19 |
US20050079426A1 (en) | 2005-04-14 |
TW200305929A (en) | 2003-11-01 |
US7181722B2 (en) | 2007-02-20 |
KR20040111396A (en) | 2004-12-31 |
EP1489644A1 (en) | 2004-12-22 |
WO2003081649A1 (en) | 2003-10-02 |
CN1643654A (en) | 2005-07-20 |
KR100931552B1 (en) | 2009-12-14 |
JPWO2003081649A1 (en) | 2005-07-28 |
CN100380583C (en) | 2008-04-09 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |