AU2003236107A1 - Method of measuring accurate parallelism - Google Patents
Method of measuring accurate parallelismInfo
- Publication number
- AU2003236107A1 AU2003236107A1 AU2003236107A AU2003236107A AU2003236107A1 AU 2003236107 A1 AU2003236107 A1 AU 2003236107A1 AU 2003236107 A AU2003236107 A AU 2003236107A AU 2003236107 A AU2003236107 A AU 2003236107A AU 2003236107 A1 AU2003236107 A1 AU 2003236107A1
- Authority
- AU
- Australia
- Prior art keywords
- measuring accurate
- accurate parallelism
- parallelism
- measuring
- accurate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/26—Measuring arrangements characterised by the use of optical techniques for measuring angles or tapers; for testing the alignment of axes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN03111155.6 | 2003-03-12 | ||
CNB031111556A CN100390502C (en) | 2003-03-12 | 2003-03-12 | Measuring method for precision parallelism |
PCT/CN2003/000245 WO2004081493A1 (en) | 2003-03-12 | 2003-04-07 | Method of measuring accurate parallelism |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003236107A1 true AU2003236107A1 (en) | 2004-09-30 |
Family
ID=32968456
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003236107A Abandoned AU2003236107A1 (en) | 2003-03-12 | 2003-04-07 | Method of measuring accurate parallelism |
Country Status (3)
Country | Link |
---|---|
CN (1) | CN100390502C (en) |
AU (1) | AU2003236107A1 (en) |
WO (1) | WO2004081493A1 (en) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN100451540C (en) * | 2006-01-12 | 2009-01-14 | 中国科学院长春光学精密机械与物理研究所 | Device for detecting three-axle parallel of large photoelectric monitoring equipment using thermal target technology |
CN102520799B (en) * | 2011-12-22 | 2015-03-25 | 胡世曦 | Projection keyboard |
US8743375B2 (en) | 2012-06-26 | 2014-06-03 | Shenzhen China Star Optoelectronics Technology Co., Ltd. | Parallelism measuring system and method thereof |
CN102749044B (en) * | 2012-06-26 | 2015-06-24 | 深圳市华星光电技术有限公司 | Parallel detection system and method |
CN102967277A (en) * | 2012-11-19 | 2013-03-13 | 尹玉军 | Method for measuring depth of parallelism of orienting pipes |
CN103471526B (en) * | 2013-07-29 | 2016-03-30 | 中国原子能科学研究院 | A kind of accurate parallelism adjusting device and control method |
CN106767420B (en) * | 2017-02-13 | 2022-07-26 | 苏州迅威光电科技有限公司 | Full-automatic detection device and method for precision images of vertical axis group of total station |
CN115299843B (en) * | 2022-06-17 | 2023-04-07 | 中山市微视医用科技有限公司 | Endoscope lens flatness adjusting system and using method thereof |
CN115655123A (en) * | 2022-12-12 | 2023-01-31 | 宁夏大学 | Device for detecting parallelism of heat shield of single crystal furnace |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5114236A (en) * | 1989-08-04 | 1992-05-19 | Canon Kabushiki Kaisha | Position detection method and apparatus |
JP3271348B2 (en) * | 1993-01-14 | 2002-04-02 | 株式会社ニコン | Leveling mating surface measuring method and exposure apparatus |
JP3451606B2 (en) * | 1994-12-08 | 2003-09-29 | 株式会社ニコン | Projection exposure equipment |
JP3757430B2 (en) * | 1994-02-22 | 2006-03-22 | 株式会社ニコン | Substrate positioning apparatus and exposure apparatus |
JPH09189519A (en) * | 1996-01-11 | 1997-07-22 | Ushio Inc | Pattern detection method and device for aligning positions of mask and work |
JPH10246618A (en) * | 1997-03-04 | 1998-09-14 | Toshiba Corp | Parallelism-measuring apparatus |
JP3513031B2 (en) * | 1998-10-09 | 2004-03-31 | 株式会社東芝 | Adjustment method of alignment apparatus, aberration measurement method, and aberration measurement mark |
JP3204253B2 (en) * | 1999-07-06 | 2001-09-04 | 株式会社ニコン | Exposure apparatus, device manufactured by the exposure apparatus, exposure method, and method of manufacturing device using the exposure method |
JP3869645B2 (en) * | 2000-11-01 | 2007-01-17 | 住友重機械工業株式会社 | Exposure apparatus adjustment method and exposure apparatus |
-
2003
- 2003-03-12 CN CNB031111556A patent/CN100390502C/en not_active Expired - Fee Related
- 2003-04-07 WO PCT/CN2003/000245 patent/WO2004081493A1/en not_active Application Discontinuation
- 2003-04-07 AU AU2003236107A patent/AU2003236107A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CN1530629A (en) | 2004-09-22 |
CN100390502C (en) | 2008-05-28 |
WO2004081493A1 (en) | 2004-09-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |