AU2003235925A1 - Rear surface irradiation photodiode array and method for producing the same - Google Patents

Rear surface irradiation photodiode array and method for producing the same

Info

Publication number
AU2003235925A1
AU2003235925A1 AU2003235925A AU2003235925A AU2003235925A1 AU 2003235925 A1 AU2003235925 A1 AU 2003235925A1 AU 2003235925 A AU2003235925 A AU 2003235925A AU 2003235925 A AU2003235925 A AU 2003235925A AU 2003235925 A1 AU2003235925 A1 AU 2003235925A1
Authority
AU
Australia
Prior art keywords
producing
same
rear surface
photodiode array
surface irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003235925A
Inventor
Yoshimaro Fujii
Kouji Okamoto
Akira Sakamoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hamamatsu Photonics KK
Original Assignee
Hamamatsu Photonics KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hamamatsu Photonics KK filed Critical Hamamatsu Photonics KK
Publication of AU2003235925A1 publication Critical patent/AU2003235925A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/14634Assemblies, i.e. Hybrid structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14601Structural or functional details thereof
    • H01L27/1464Back illuminated imager structures
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • H01L27/144Devices controlled by radiation
    • H01L27/146Imager structures
    • H01L27/14683Processes or apparatus peculiar to the manufacture or treatment of these devices or parts thereof
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/02Details
    • H01L31/0224Electrodes
AU2003235925A 2002-05-10 2003-05-09 Rear surface irradiation photodiode array and method for producing the same Abandoned AU2003235925A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-136206 2002-05-10
JP2002136206 2002-05-10
PCT/JP2003/005852 WO2003096427A1 (en) 2002-05-10 2003-05-09 Rear surface irradiation photodiode array and method for producing the same

Publications (1)

Publication Number Publication Date
AU2003235925A1 true AU2003235925A1 (en) 2003-11-11

Family

ID=29416780

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003235925A Abandoned AU2003235925A1 (en) 2002-05-10 2003-05-09 Rear surface irradiation photodiode array and method for producing the same

Country Status (5)

Country Link
JP (1) JP4478012B2 (en)
CN (1) CN100388503C (en)
AU (1) AU2003235925A1 (en)
DE (1) DE10392637B4 (en)
WO (1) WO2003096427A1 (en)

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US6927383B2 (en) * 2002-07-26 2005-08-09 Raytheon Company Radiation hardened visible P-I-N detector
JP4331033B2 (en) * 2004-03-29 2009-09-16 浜松ホトニクス株式会社 Semiconductor light detecting element and manufacturing method thereof
JP2006073852A (en) * 2004-09-03 2006-03-16 Dainippon Printing Co Ltd Sensor package and its manufacturing method
JP4841834B2 (en) * 2004-12-24 2011-12-21 浜松ホトニクス株式会社 Photodiode array
KR100718878B1 (en) * 2005-06-28 2007-05-17 (주)실리콘화일 Separation type unit pixel of image sensor having 3 dimension structure and manufacture method thereof
US8049256B2 (en) * 2006-10-05 2011-11-01 Omnivision Technologies, Inc. Active pixel sensor having a sensor wafer connected to a support circuit wafer
JP5281252B2 (en) * 2007-03-05 2013-09-04 新光電気工業株式会社 Illuminance detection device
KR100872719B1 (en) * 2007-04-17 2008-12-05 동부일렉트로닉스 주식회사 Image Sensor and Method for Manufacturing thereof
JP4644696B2 (en) 2007-05-30 2011-03-02 富士フイルム株式会社 Back-illuminated image sensor and manufacturing method thereof
WO2009005098A1 (en) * 2007-07-03 2009-01-08 Hamamatsu Photonics K.K. Back surface incident type distance measuring sensor and distance measuring device
JP4966897B2 (en) * 2008-03-25 2012-07-04 株式会社フジクラ Manufacturing method of semiconductor package
JP5185207B2 (en) 2009-02-24 2013-04-17 浜松ホトニクス株式会社 Photodiode array
JP5185205B2 (en) 2009-02-24 2013-04-17 浜松ホトニクス株式会社 Semiconductor photo detector
JP5185206B2 (en) 2009-02-24 2013-04-17 浜松ホトニクス株式会社 Semiconductor photo detector
JP5185208B2 (en) 2009-02-24 2013-04-17 浜松ホトニクス株式会社 Photodiode and photodiode array
JP2010283223A (en) * 2009-06-05 2010-12-16 Hamamatsu Photonics Kk Semiconductor optical detecting element and method of manufacturing semiconductor optical detecting element
JP5363222B2 (en) * 2009-07-13 2013-12-11 浜松ホトニクス株式会社 Semiconductor light detection element and method for manufacturing semiconductor light detection element
JP5261304B2 (en) * 2009-07-13 2013-08-14 浜松ホトニクス株式会社 Semiconductor light detection element and method for manufacturing semiconductor light detection element
JP2010199602A (en) * 2010-04-16 2010-09-09 Sony Corp Solid-state imaging element and manufacturing method of the same
JP5223883B2 (en) * 2010-05-17 2013-06-26 ソニー株式会社 Solid-state image sensor
JP5925711B2 (en) 2013-02-20 2016-05-25 浜松ホトニクス株式会社 Detector, PET apparatus and X-ray CT apparatus
JP7089930B2 (en) * 2018-04-16 2022-06-23 浜松ホトニクス株式会社 Semiconductor photodetector
JP7089931B2 (en) * 2018-04-16 2022-06-23 浜松ホトニクス株式会社 Manufacturing method of backside incident type semiconductor photodetection
JP7034816B2 (en) * 2018-04-16 2022-03-14 浜松ホトニクス株式会社 Backside incident type semiconductor photodetector
JP7148261B2 (en) * 2018-04-16 2022-10-05 浜松ホトニクス株式会社 Back-thinned semiconductor photodetector
JP7364343B2 (en) * 2019-02-26 2023-10-18 浜松ホトニクス株式会社 Method for manufacturing a photodetection device and photodetection device
FR3094141A1 (en) * 2019-03-18 2020-09-25 Commissariat à l'Energie Atomique et aux Energies Alternatives method of manufacturing an optoelectronic component with optical transmission on the rear face

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS55128870A (en) * 1979-03-26 1980-10-06 Semiconductor Res Found Electrostatic induction thyristor and semiconductor device
JPH01205465A (en) * 1988-02-10 1989-08-17 Sony Corp Manufacture of solid-state image sensing device
JPH04286160A (en) * 1991-03-14 1992-10-12 Fujitsu Ltd Photodetector and manufacture thereof
JP4522531B2 (en) * 2000-04-04 2010-08-11 浜松ホトニクス株式会社 Semiconductor energy detector
JP3713418B2 (en) * 2000-05-30 2005-11-09 光正 小柳 Manufacturing method of three-dimensional image processing apparatus

Also Published As

Publication number Publication date
JP4478012B2 (en) 2010-06-09
CN1653617A (en) 2005-08-10
DE10392637T5 (en) 2005-06-16
WO2003096427A1 (en) 2003-11-20
DE10392637B4 (en) 2014-09-04
CN100388503C (en) 2008-05-14
JPWO2003096427A1 (en) 2005-09-15

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase
TH Corrigenda

Free format text: IN VOL 18, NO 2, PAGE(S) 519 UNDER THE HEADING APPLICATIONS OPI - NAME INDEX UNDER THE NAME HAMAMATSU PHOTONICS K.K., APPLICATION NO. 2003235925, UNDER INID (43) CORRECT THE PUBLICATION DATE TO READ 24.11.2003