AU2003235237A1 - Oxide superconductive thin-film, process for producing the same and superconducting fault current limiter - Google Patents

Oxide superconductive thin-film, process for producing the same and superconducting fault current limiter

Info

Publication number
AU2003235237A1
AU2003235237A1 AU2003235237A AU2003235237A AU2003235237A1 AU 2003235237 A1 AU2003235237 A1 AU 2003235237A1 AU 2003235237 A AU2003235237 A AU 2003235237A AU 2003235237 A AU2003235237 A AU 2003235237A AU 2003235237 A1 AU2003235237 A1 AU 2003235237A1
Authority
AU
Australia
Prior art keywords
producing
film
same
fault current
current limiter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003235237A
Inventor
Shuji Hahakura
Kazuya Ohmatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Publication of AU2003235237A1 publication Critical patent/AU2003235237A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/087—Oxides of copper or solid solutions thereof
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0521—Processes for depositing or forming copper oxide superconductor layers by pulsed laser deposition, e.g. laser sputtering
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/30—Devices switchable between superconducting and normal states

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Manufacturing & Machinery (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Emergency Protection Circuit Devices (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Physical Vapour Deposition (AREA)
AU2003235237A 2002-04-26 2003-04-17 Oxide superconductive thin-film, process for producing the same and superconducting fault current limiter Abandoned AU2003235237A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002-125719 2002-04-26
JP2002125719A JP2005344125A (en) 2002-04-26 2002-04-26 Oxide superconductive thin-film, process for producing the same, and superconducting fault current limiter
PCT/JP2003/004933 WO2003091158A1 (en) 2002-04-26 2003-04-17 Oxide superconductive thin-film, process for producing the same and superconducting fault current limiter

Publications (1)

Publication Number Publication Date
AU2003235237A1 true AU2003235237A1 (en) 2003-11-10

Family

ID=29267573

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003235237A Abandoned AU2003235237A1 (en) 2002-04-26 2003-04-17 Oxide superconductive thin-film, process for producing the same and superconducting fault current limiter

Country Status (3)

Country Link
JP (1) JP2005344125A (en)
AU (1) AU2003235237A1 (en)
WO (1) WO2003091158A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5658891B2 (en) * 2010-02-24 2015-01-28 株式会社フジクラ Manufacturing method of oxide superconducting film

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3110473B2 (en) * 1990-03-01 2000-11-20 住友電気工業株式会社 Method for producing oxide superconducting thin film
JPH06132571A (en) * 1992-10-21 1994-05-13 Sumitomo Electric Ind Ltd Current limiting element and current limiting device

Also Published As

Publication number Publication date
WO2003091158A1 (en) 2003-11-06
JP2005344125A (en) 2005-12-15

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase