AU2003229584A1 - Method and device for reduction of the ignition voltage of plasmas - Google Patents

Method and device for reduction of the ignition voltage of plasmas

Info

Publication number
AU2003229584A1
AU2003229584A1 AU2003229584A AU2003229584A AU2003229584A1 AU 2003229584 A1 AU2003229584 A1 AU 2003229584A1 AU 2003229584 A AU2003229584 A AU 2003229584A AU 2003229584 A AU2003229584 A AU 2003229584A AU 2003229584 A1 AU2003229584 A1 AU 2003229584A1
Authority
AU
Australia
Prior art keywords
plasmas
reduction
ignition voltage
ignition
voltage
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003229584A
Other versions
AU2003229584A8 (en
Inventor
Ullrich Hartung
Torsten Kopte
Uwe Krause
Matthias List
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Original Assignee
Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV filed Critical Fraunhofer Gesellschaft zur Forderung der Angewandten Forschung eV
Publication of AU2003229584A8 publication Critical patent/AU2003229584A8/en
Publication of AU2003229584A1 publication Critical patent/AU2003229584A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/216—ZnO
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd
    • C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/154—Deposition methods from the vapour phase by sputtering
    • C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Plasma Technology (AREA)
  • Ignition Installations For Internal Combustion Engines (AREA)
AU2003229584A 2002-06-05 2003-03-31 Method and device for reduction of the ignition voltage of plasmas Abandoned AU2003229584A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10224991.1 2002-06-05
DE10224991A DE10224991A1 (en) 2002-06-05 2002-06-05 Method and device for reducing the ignition voltage of plasmas
PCT/EP2003/003344 WO2003105543A2 (en) 2002-06-05 2003-03-31 Method and device for reduction of the ignition voltage of plasmas

Publications (2)

Publication Number Publication Date
AU2003229584A8 AU2003229584A8 (en) 2003-12-22
AU2003229584A1 true AU2003229584A1 (en) 2003-12-22

Family

ID=29718860

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003229584A Abandoned AU2003229584A1 (en) 2002-06-05 2003-03-31 Method and device for reduction of the ignition voltage of plasmas

Country Status (3)

Country Link
AU (1) AU2003229584A1 (en)
DE (2) DE10224991A1 (en)
WO (1) WO2003105543A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102008018589A1 (en) * 2008-04-08 2009-11-05 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and device for igniting an arc
DE102010038605B4 (en) 2010-07-29 2012-06-14 Hüttinger Elektronik Gmbh + Co. Kg Ignition circuit for igniting a powered with alternating power plasma
DE102010038603B4 (en) * 2010-07-29 2016-06-02 Trumpf Huettinger Sp. Z O. O. Dc plasma arrangement
DE102012206553A1 (en) * 2012-04-20 2013-10-24 Von Ardenne Anlagentechnik Gmbh Controlling thickness distribution in vacuum coating of substrate, comprises placing cathode and anode in vacuum chamber, where plasma discharge is generated during treating the substrate in plasma area defined between cathode and substrate
DE102015113104A1 (en) * 2015-08-09 2017-02-09 Isa Installations-, Steuerungs- U. Automatisierungssysteme Gmbh Apparatus for igniting a vacuum arc discharge and method for its use

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE899240C (en) * 1942-02-24 1953-12-10 Siemens Ag Electric metal vapor converter
US3793179A (en) * 1971-07-19 1974-02-19 L Sablev Apparatus for metal evaporation coating
US4565618A (en) * 1983-05-17 1986-01-21 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Apparatus for producing diamondlike carbon flakes
DE3413891A1 (en) * 1984-04-12 1985-10-17 Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich METHOD AND DEVICE FOR EVAPORATING MATERIAL IN VACUUM
DD252205B5 (en) * 1986-09-01 1993-12-09 Fraunhofer Ges Forschung atomizing
DE3881256D1 (en) * 1987-03-06 1993-07-01 Balzers Hochvakuum METHOD AND DEVICES FOR VACUUM COATING BY ELECTRIC ARCH DISCHARGE.
DE69007786T2 (en) * 1990-07-09 1994-07-07 Armin Karl Sonnenschein Power supply circuit for deuterium lamp.
DE4102554A1 (en) * 1991-01-29 1992-09-03 Dresden Vakuumtech Gmbh CIRCUIT ARRANGEMENT FOR IGNITING AND OPERATING A HOLLOW CATALOG ARCH DISCHARGE
CH687111A5 (en) * 1992-05-26 1996-09-13 Balzers Hochvakuum A method for generating a low voltage discharge, vacuum treatment system here, as well as for application of the method.
DE4223505C1 (en) * 1992-07-17 1993-11-04 Fraunhofer Ges Forschung Reactive magnetron sputtering device for application of insulating or low conductivity layer - uses anode potential for relative isolation of all parts in contact with plasma on outside of cathode target
US5441624A (en) * 1992-08-25 1995-08-15 Northeastern University Triggered vacuum anodic arc
DE19835512C1 (en) * 1998-08-06 1999-12-16 Daimlerchrysler Aerospace Ag Ion engine designed as an electrostatic motor switched on by positive voltage
DE10042629C2 (en) * 2000-08-30 2003-08-28 Angaris Gmbh Ignition device for an arc evaporator
DE10051508C2 (en) * 2000-10-18 2003-08-07 Fraunhofer Ges Forschung Method and device for reducing the ignition voltage of power pulses of pulsed plasmas

Also Published As

Publication number Publication date
AU2003229584A8 (en) 2003-12-22
DE10392649D2 (en) 2005-07-14
WO2003105543A2 (en) 2003-12-18
WO2003105543A3 (en) 2004-04-01
DE10224991A1 (en) 2004-01-08

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase