AU2003229584A8 - Method and device for reduction of the ignition voltage of plasmas - Google Patents
Method and device for reduction of the ignition voltage of plasmasInfo
- Publication number
- AU2003229584A8 AU2003229584A8 AU2003229584A AU2003229584A AU2003229584A8 AU 2003229584 A8 AU2003229584 A8 AU 2003229584A8 AU 2003229584 A AU2003229584 A AU 2003229584A AU 2003229584 A AU2003229584 A AU 2003229584A AU 2003229584 A8 AU2003229584 A8 AU 2003229584A8
- Authority
- AU
- Australia
- Prior art keywords
- plasmas
- reduction
- ignition voltage
- ignition
- voltage
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/001—General methods for coating; Devices therefor
- C03C17/002—General methods for coating; Devices therefor for flat glass, e.g. float glass
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
- C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
- C03C17/23—Oxides
- C03C17/245—Oxides by deposition from the vapour phase
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/0021—Reactive sputtering or evaporation
- C23C14/0036—Reactive sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/086—Oxides of zinc, germanium, cadmium, indium, tin, thallium or bismuth
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2217/00—Coatings on glass
- C03C2217/20—Materials for coating a single layer on glass
- C03C2217/21—Oxides
- C03C2217/216—ZnO
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/152—Deposition methods from the vapour phase by cvd
- C03C2218/153—Deposition methods from the vapour phase by cvd by plasma-enhanced cvd
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2218/00—Methods for coating glass
- C03C2218/10—Deposition methods
- C03C2218/15—Deposition methods from the vapour phase
- C03C2218/154—Deposition methods from the vapour phase by sputtering
- C03C2218/156—Deposition methods from the vapour phase by sputtering by magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Plasma Technology (AREA)
- Ignition Installations For Internal Combustion Engines (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10224991A DE10224991A1 (en) | 2002-06-05 | 2002-06-05 | Method and device for reducing the ignition voltage of plasmas |
DE10224991.1 | 2002-06-05 | ||
PCT/EP2003/003344 WO2003105543A2 (en) | 2002-06-05 | 2003-03-31 | Method and device for reduction of the ignition voltage of plasmas |
Publications (2)
Publication Number | Publication Date |
---|---|
AU2003229584A8 true AU2003229584A8 (en) | 2003-12-22 |
AU2003229584A1 AU2003229584A1 (en) | 2003-12-22 |
Family
ID=29718860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003229584A Abandoned AU2003229584A1 (en) | 2002-06-05 | 2003-03-31 | Method and device for reduction of the ignition voltage of plasmas |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2003229584A1 (en) |
DE (2) | DE10224991A1 (en) |
WO (1) | WO2003105543A2 (en) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102008018589A1 (en) * | 2008-04-08 | 2009-11-05 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Method and device for igniting an arc |
DE102010038603B4 (en) * | 2010-07-29 | 2016-06-02 | Trumpf Huettinger Sp. Z O. O. | Dc plasma arrangement |
DE102010038605B4 (en) * | 2010-07-29 | 2012-06-14 | Hüttinger Elektronik Gmbh + Co. Kg | Ignition circuit for igniting a powered with alternating power plasma |
DE102012206553A1 (en) * | 2012-04-20 | 2013-10-24 | Von Ardenne Anlagentechnik Gmbh | Controlling thickness distribution in vacuum coating of substrate, comprises placing cathode and anode in vacuum chamber, where plasma discharge is generated during treating the substrate in plasma area defined between cathode and substrate |
DE102015113104A1 (en) * | 2015-08-09 | 2017-02-09 | Isa Installations-, Steuerungs- U. Automatisierungssysteme Gmbh | Apparatus for igniting a vacuum arc discharge and method for its use |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE899240C (en) * | 1942-02-24 | 1953-12-10 | Siemens Ag | Electric metal vapor converter |
US3793179A (en) * | 1971-07-19 | 1974-02-19 | L Sablev | Apparatus for metal evaporation coating |
US4565618A (en) * | 1983-05-17 | 1986-01-21 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Apparatus for producing diamondlike carbon flakes |
DE3413891A1 (en) * | 1984-04-12 | 1985-10-17 | Horst Dipl.-Phys. Dr. 4270 Dorsten Ehrich | METHOD AND DEVICE FOR EVAPORATING MATERIAL IN VACUUM |
DD252205B5 (en) * | 1986-09-01 | 1993-12-09 | Fraunhofer Ges Forschung | atomizing |
DE3881256D1 (en) * | 1987-03-06 | 1993-07-01 | Balzers Hochvakuum | METHOD AND DEVICES FOR VACUUM COATING BY ELECTRIC ARCH DISCHARGE. |
DE69007786T2 (en) * | 1990-07-09 | 1994-07-07 | Armin Karl Sonnenschein | Power supply circuit for deuterium lamp. |
DE4102554A1 (en) * | 1991-01-29 | 1992-09-03 | Dresden Vakuumtech Gmbh | CIRCUIT ARRANGEMENT FOR IGNITING AND OPERATING A HOLLOW CATALOG ARCH DISCHARGE |
CH687111A5 (en) * | 1992-05-26 | 1996-09-13 | Balzers Hochvakuum | A method for generating a low voltage discharge, vacuum treatment system here, as well as for application of the method. |
DE4223505C1 (en) * | 1992-07-17 | 1993-11-04 | Fraunhofer Ges Forschung | Reactive magnetron sputtering device for application of insulating or low conductivity layer - uses anode potential for relative isolation of all parts in contact with plasma on outside of cathode target |
US5441624A (en) * | 1992-08-25 | 1995-08-15 | Northeastern University | Triggered vacuum anodic arc |
DE19835512C1 (en) * | 1998-08-06 | 1999-12-16 | Daimlerchrysler Aerospace Ag | Ion engine designed as an electrostatic motor switched on by positive voltage |
DE10042629C2 (en) * | 2000-08-30 | 2003-08-28 | Angaris Gmbh | Ignition device for an arc evaporator |
DE10051508C2 (en) * | 2000-10-18 | 2003-08-07 | Fraunhofer Ges Forschung | Method and device for reducing the ignition voltage of power pulses of pulsed plasmas |
-
2002
- 2002-06-05 DE DE10224991A patent/DE10224991A1/en not_active Ceased
-
2003
- 2003-03-31 WO PCT/EP2003/003344 patent/WO2003105543A2/en not_active Application Discontinuation
- 2003-03-31 AU AU2003229584A patent/AU2003229584A1/en not_active Abandoned
- 2003-03-31 DE DE10392649T patent/DE10392649D2/en not_active Ceased
Also Published As
Publication number | Publication date |
---|---|
DE10392649D2 (en) | 2005-07-14 |
WO2003105543A2 (en) | 2003-12-18 |
DE10224991A1 (en) | 2004-01-08 |
WO2003105543A3 (en) | 2004-04-01 |
AU2003229584A1 (en) | 2003-12-22 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |