AU2003207488A1 - Apparatus and method of exposing light to a semiconductor device having a curved surface - Google Patents
Apparatus and method of exposing light to a semiconductor device having a curved surfaceInfo
- Publication number
- AU2003207488A1 AU2003207488A1 AU2003207488A AU2003207488A AU2003207488A1 AU 2003207488 A1 AU2003207488 A1 AU 2003207488A1 AU 2003207488 A AU2003207488 A AU 2003207488A AU 2003207488 A AU2003207488 A AU 2003207488A AU 2003207488 A1 AU2003207488 A1 AU 2003207488A1
- Authority
- AU
- Australia
- Prior art keywords
- semiconductor device
- curved surface
- exposing light
- exposing
- light
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/703—Non-planar pattern areas or non-planar masks, e.g. curved masks or substrates
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/24—Curved surfaces
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/US2003/000579 WO2004063813A1 (en) | 2003-01-09 | 2003-01-09 | Apparatus and method of exposing light to a semiconductor device having a curved surface |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003207488A1 true AU2003207488A1 (en) | 2004-08-10 |
Family
ID=32710273
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003207488A Abandoned AU2003207488A1 (en) | 2003-01-09 | 2003-01-09 | Apparatus and method of exposing light to a semiconductor device having a curved surface |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4535881B2 (en) |
AU (1) | AU2003207488A1 (en) |
WO (1) | WO2004063813A1 (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR102079427B1 (en) * | 2017-10-25 | 2020-02-19 | 부산대학교 산학협력단 | Apparatus for making interference patterns on the inclined surface |
JP6837633B2 (en) * | 2019-03-19 | 2021-03-03 | 学校法人近畿大学 | Exposure device and exposure method |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3573045A (en) * | 1966-02-01 | 1971-03-30 | Jerome H Lemelson | Scanning technique,image and article produced therefrom |
US4102734A (en) * | 1976-10-05 | 1978-07-25 | Mbi, Inc. | Method for producing a design on an arcuate surface |
US5106455A (en) * | 1991-01-28 | 1992-04-21 | Sarcos Group | Method and apparatus for fabrication of micro-structures using non-planar, exposure beam lithography |
US5955776A (en) * | 1996-12-04 | 1999-09-21 | Ball Semiconductor, Inc. | Spherical shaped semiconductor integrated circuit |
JPH10256123A (en) * | 1997-03-12 | 1998-09-25 | Canon Inc | Spherical device aligner and manufacture thereof |
JPH1154406A (en) * | 1997-08-04 | 1999-02-26 | Mitsui High Tec Inc | Method for exposing spheric ic |
US6130742A (en) * | 1997-10-17 | 2000-10-10 | Ball Semiconductor, Ltd. | Exposure apparatus for a ball shaped substrate |
JPH11195580A (en) * | 1997-12-25 | 1999-07-21 | Ball Semiconductor Inc | Apparatus and method for exposing semiconductors |
WO2000003296A1 (en) * | 1998-07-10 | 2000-01-20 | Ball Semiconductor, Inc. | A reflection system for imaging on a nonplanar substrate |
US6251550B1 (en) * | 1998-07-10 | 2001-06-26 | Ball Semiconductor, Inc. | Maskless photolithography system that digitally shifts mask data responsive to alignment data |
JP3526780B2 (en) * | 1999-04-15 | 2004-05-17 | 宮崎沖電気株式会社 | Exposure apparatus and method of manufacturing semiconductor device |
JP2001284236A (en) * | 2000-03-31 | 2001-10-12 | Canon Inc | Projection exposure system and exposure method |
-
2003
- 2003-01-09 AU AU2003207488A patent/AU2003207488A1/en not_active Abandoned
- 2003-01-09 JP JP2004566395A patent/JP4535881B2/en not_active Expired - Fee Related
- 2003-01-09 WO PCT/US2003/000579 patent/WO2004063813A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
JP4535881B2 (en) | 2010-09-01 |
JP2006513569A (en) | 2006-04-20 |
WO2004063813A1 (en) | 2004-07-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |