AU2002324314A8 - A method and system for measurements in patterned structures - Google Patents

A method and system for measurements in patterned structures

Info

Publication number
AU2002324314A8
AU2002324314A8 AU2002324314A AU2002324314A AU2002324314A8 AU 2002324314 A8 AU2002324314 A8 AU 2002324314A8 AU 2002324314 A AU2002324314 A AU 2002324314A AU 2002324314 A AU2002324314 A AU 2002324314A AU 2002324314 A8 AU2002324314 A8 AU 2002324314A8
Authority
AU
Australia
Prior art keywords
measurements
patterned structures
patterned
structures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002324314A
Other versions
AU2002324314A1 (en
Inventor
Moshe Finarov
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nova Ltd
Original Assignee
Nova Measuring Instruments Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nova Measuring Instruments Ltd filed Critical Nova Measuring Instruments Ltd
Publication of AU2002324314A1 publication Critical patent/AU2002324314A1/en
Publication of AU2002324314A8 publication Critical patent/AU2002324314A8/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
AU2002324314A 2001-08-15 2002-08-08 A method and system for measurements in patterned structures Abandoned AU2002324314A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
IL144911A IL144911A (en) 2001-08-15 2001-08-15 Method and system for measurements in patterned structures
IL144911 2001-08-15
PCT/IL2002/000655 WO2003017322A2 (en) 2001-08-15 2002-08-08 A method and system for measurements in patterned structures

Publications (2)

Publication Number Publication Date
AU2002324314A1 AU2002324314A1 (en) 2003-03-03
AU2002324314A8 true AU2002324314A8 (en) 2009-07-30

Family

ID=11075698

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002324314A Abandoned AU2002324314A1 (en) 2001-08-15 2002-08-08 A method and system for measurements in patterned structures

Country Status (3)

Country Link
AU (1) AU2002324314A1 (en)
IL (1) IL144911A (en)
WO (1) WO2003017322A2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10355573B4 (en) 2003-11-28 2007-12-20 Advanced Micro Devices, Inc., Sunnyvale A method of increasing production yield by controlling lithography based on electrical velocity data

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6362245A (en) * 1986-09-02 1988-03-18 Canon Inc Wafer prober
KR100649387B1 (en) * 1999-06-22 2006-11-27 브룩스 오토메이션 인코퍼레이티드 Run-to-run controller for use in microelectronic fabrication
US6428673B1 (en) * 2000-07-08 2002-08-06 Semitool, Inc. Apparatus and method for electrochemical processing of a microelectronic workpiece, capable of modifying processing based on metrology

Also Published As

Publication number Publication date
AU2002324314A1 (en) 2003-03-03
WO2003017322A2 (en) 2003-02-27
IL144911A0 (en) 2002-06-30
IL144911A (en) 2007-02-11
WO2003017322A3 (en) 2009-06-11

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase