AU2002225666A1 - Antireflective layer for use in microlithography - Google Patents

Antireflective layer for use in microlithography

Info

Publication number
AU2002225666A1
AU2002225666A1 AU2002225666A AU2566602A AU2002225666A1 AU 2002225666 A1 AU2002225666 A1 AU 2002225666A1 AU 2002225666 A AU2002225666 A AU 2002225666A AU 2566602 A AU2566602 A AU 2566602A AU 2002225666 A1 AU2002225666 A1 AU 2002225666A1
Authority
AU
Australia
Prior art keywords
microlithography
antireflective layer
antireflective
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002225666A
Inventor
Larry L. Berger
Michael Karl Crawford
Roger Harquail French
Robert Clayton Wheland
Frederick Claus Zumsteg Jr.
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of AU2002225666A1 publication Critical patent/AU2002225666A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0046—Photosensitive materials with perfluoro compounds, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
AU2002225666A 2000-11-29 2001-11-21 Antireflective layer for use in microlithography Abandoned AU2002225666A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US25398000P 2000-11-29 2000-11-29
US60/253,980 2000-11-29
PCT/US2001/043437 WO2002044816A2 (en) 2000-11-29 2001-11-21 Antireflective layer for use in microlithography

Publications (1)

Publication Number Publication Date
AU2002225666A1 true AU2002225666A1 (en) 2002-06-11

Family

ID=22962450

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002225666A Abandoned AU2002225666A1 (en) 2000-11-29 2001-11-21 Antireflective layer for use in microlithography

Country Status (7)

Country Link
EP (1) EP1364254A2 (en)
JP (1) JP2004537059A (en)
KR (1) KR20040012692A (en)
CN (1) CN1545644A (en)
AU (1) AU2002225666A1 (en)
TW (1) TW561310B (en)
WO (1) WO2002044816A2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005050320A1 (en) * 2003-11-19 2005-06-02 Daikin Industries, Ltd. Method for forming multilayer resist
US7671348B2 (en) 2007-06-26 2010-03-02 Advanced Micro Devices, Inc. Hydrocarbon getter for lithographic exposure tools
CN101989046B (en) * 2009-08-06 2013-05-29 中芯国际集成电路制造(上海)有限公司 Pattern transfer method and mask manufacturing method
KR101247830B1 (en) * 2009-09-15 2013-03-26 도오꾜오까고오교 가부시끼가이샤 Protective film forming material and photoresist pattern forming method
WO2020114970A1 (en) * 2018-12-04 2020-06-11 Solvay Specialty Polymers Italy S.P.A. Fluoropolymer having alicyclic repeating units

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3979553B2 (en) * 1998-06-12 2007-09-19 東京応化工業株式会社 Coating liquid composition for forming antireflection film and resist material using the same
IL141803A0 (en) * 1998-09-23 2002-03-10 Du Pont Photoresists, polymers and processes for microlithography
JP3724709B2 (en) * 1998-10-27 2005-12-07 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニー Method for photoresist and microlithography
JP2000249804A (en) * 1999-02-24 2000-09-14 Asahi Glass Co Ltd Antirelfective base material and article using the same
WO2001037047A2 (en) * 1999-11-17 2001-05-25 E.I. Du Pont De Nemours And Company Nitrile/fluoroalcohol polymer-containing photoresists and associated processes for microlithography

Also Published As

Publication number Publication date
WO2002044816A3 (en) 2003-09-12
KR20040012692A (en) 2004-02-11
TW561310B (en) 2003-11-11
CN1545644A (en) 2004-11-10
EP1364254A2 (en) 2003-11-26
WO2002044816A2 (en) 2002-06-06
JP2004537059A (en) 2004-12-09

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