AU2002214560A1 - Anode with porous insulating layer for discharge lasers - Google Patents
Anode with porous insulating layer for discharge lasersInfo
- Publication number
- AU2002214560A1 AU2002214560A1 AU2002214560A AU1456002A AU2002214560A1 AU 2002214560 A1 AU2002214560 A1 AU 2002214560A1 AU 2002214560 A AU2002214560 A AU 2002214560A AU 1456002 A AU1456002 A AU 1456002A AU 2002214560 A1 AU2002214560 A1 AU 2002214560A1
- Authority
- AU
- Australia
- Prior art keywords
- anode
- insulating layer
- comprised
- lead
- porous insulating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
- H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70025—Production of exposure light, i.e. light sources by lasers
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0381—Anodes or particular adaptations thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0382—Cathodes or particular adaptations thereof
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0385—Shape
- H01S3/0387—Helical shape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/03—Constructional details of gas laser discharge tubes
- H01S3/038—Electrodes, e.g. special shape, configuration or composition
- H01S3/0388—Compositions, materials or coatings
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/02—Constructional details
- H01S3/04—Arrangements for thermal management
- H01S3/041—Arrangements for thermal management for gas lasers
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/09702—Details of the driver electronics and electric discharge circuits
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/09—Processes or apparatus for excitation, e.g. pumping
- H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
- H01S3/0979—Gas dynamic lasers, i.e. with expansion of the laser gas medium to supersonic flow speeds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
- H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
- H01S3/22—Gases
- H01S3/2207—Noble gas ions, e.g. Ar+>, Kr+>
Abstract
A gas discharge laser having an elongated cathode and an elongated anode with a porous insulating layer covering the anode discharge surface. A pulse power system provides electrical pulses at rates of at least 1 KHz. A blower circulates laser gas between the electrodes at speeds of at least 5 m/s and a heat exchanger is provided to remove heat produced by the blower and the discharges. In preferred embodiments at least a portion of the anode is comprised of lead, and fluorine ion sputtering of the anode surface creates the insulating layer (over the discharge surface of the anode) comprised in large part of lead fluoride. In a particular preferred embodiment the anode is fabricated in two parts, a first part having the general shape of a prior art anode with a trench shaped cavity at the top and a second part comprised of lead rich brass and disposed in the trench shape cavity.
Applications Claiming Priority (11)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09703697 | 2000-11-01 | ||
US09/703,697 US6363094B1 (en) | 2000-06-09 | 2000-11-01 | Gas discharge laser electrode with reduced sensitivity to adverse boundary layer effects |
US09742485 | 2000-12-20 | ||
US09/742,485 US7190708B2 (en) | 2000-11-01 | 2000-12-20 | Annealed copper alloy electrodes for fluorine containing gas discharge lasers |
US09/768,753 US6414979B2 (en) | 2000-06-09 | 2001-01-23 | Gas discharge laser with blade-dielectric electrode |
US09768753 | 2001-01-23 | ||
US09776044 | 2001-02-01 | ||
US09/776,044 US6584132B2 (en) | 2000-11-01 | 2001-02-01 | Spinodal copper alloy electrodes |
US09/953,026 US6711202B2 (en) | 2000-06-09 | 2001-09-13 | Discharge laser with porous insulating layer covering anode discharge surface |
US09953026 | 2001-09-13 | ||
PCT/US2001/031494 WO2002037626A1 (en) | 2000-11-01 | 2001-10-08 | Anode with porous insulating layer for discharge lasers |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2002214560A1 true AU2002214560A1 (en) | 2002-05-15 |
Family
ID=27542104
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2002214560A Abandoned AU2002214560A1 (en) | 2000-11-01 | 2001-10-08 | Anode with porous insulating layer for discharge lasers |
Country Status (9)
Country | Link |
---|---|
US (3) | US6711202B2 (en) |
EP (1) | EP1330860B1 (en) |
JP (1) | JP4046975B2 (en) |
KR (1) | KR100870868B1 (en) |
AT (1) | ATE434278T1 (en) |
AU (1) | AU2002214560A1 (en) |
DE (1) | DE60139019D1 (en) |
TW (1) | TW507409B (en) |
WO (1) | WO2002037626A1 (en) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6711202B2 (en) * | 2000-06-09 | 2004-03-23 | Cymer, Inc. | Discharge laser with porous insulating layer covering anode discharge surface |
US6914919B2 (en) * | 2000-06-19 | 2005-07-05 | Cymer, Inc. | Six to ten KHz, or greater gas discharge laser system |
US7230965B2 (en) * | 2001-02-01 | 2007-06-12 | Cymer, Inc. | Anodes for fluorine gas discharge lasers |
US6810061B2 (en) | 2001-08-27 | 2004-10-26 | Komatsu Ltd. | Discharge electrode and discharge electrode manufacturing method |
WO2003023910A2 (en) * | 2001-09-13 | 2003-03-20 | Cymer, Inc. | High rep-rate laser with improved electrodes |
JP2005535642A (en) * | 2002-06-28 | 2005-11-24 | ニトロメッド インコーポレーティッド | Nitrosated and / or nitrosylated cyclooxygenase-2 selective inhibitors, compositions and methods of use containing oximes and / or hydrazones |
US8858978B2 (en) | 2004-09-28 | 2014-10-14 | Atrium Medical Corporation | Heat cured gel and method of making |
JP2006229137A (en) * | 2005-02-21 | 2006-08-31 | Komatsu Ltd | Pulse oscillation type discharge pumped laser device |
JP5059968B2 (en) * | 2009-04-09 | 2012-10-31 | オリンパス株式会社 | A / D converter |
US11077962B2 (en) | 2015-12-07 | 2021-08-03 | The George Washington University | High thrust to power micro cathode arc thruster |
TW202108791A (en) * | 2019-05-10 | 2021-03-01 | 美商希瑪有限責任公司 | Long life laser chamber electrode |
CN116581627B (en) * | 2023-07-12 | 2023-09-15 | 吉林省永利激光科技有限公司 | Gas laser |
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US6466602B1 (en) * | 2000-06-09 | 2002-10-15 | Cymer, Inc. | Gas discharge laser long life electrodes |
US6711202B2 (en) * | 2000-06-09 | 2004-03-23 | Cymer, Inc. | Discharge laser with porous insulating layer covering anode discharge surface |
US6914919B2 (en) | 2000-06-19 | 2005-07-05 | Cymer, Inc. | Six to ten KHz, or greater gas discharge laser system |
US7230965B2 (en) * | 2001-02-01 | 2007-06-12 | Cymer, Inc. | Anodes for fluorine gas discharge lasers |
US6690704B2 (en) | 2001-04-09 | 2004-02-10 | Cymer, Inc. | Control system for a two chamber gas discharge laser |
US7339973B2 (en) * | 2001-09-13 | 2008-03-04 | Cymer, Inc. | Electrodes for fluorine gas discharge lasers |
US6798812B2 (en) | 2002-01-23 | 2004-09-28 | Cymer, Inc. | Two chamber F2 laser system with F2 pressure based line selection |
-
2001
- 2001-09-13 US US09/953,026 patent/US6711202B2/en not_active Expired - Lifetime
- 2001-10-08 EP EP01983106A patent/EP1330860B1/en not_active Expired - Lifetime
- 2001-10-08 AU AU2002214560A patent/AU2002214560A1/en not_active Abandoned
- 2001-10-08 AT AT01983106T patent/ATE434278T1/en not_active IP Right Cessation
- 2001-10-08 DE DE60139019T patent/DE60139019D1/en not_active Expired - Lifetime
- 2001-10-08 WO PCT/US2001/031494 patent/WO2002037626A1/en active Search and Examination
- 2001-10-08 KR KR1020037005762A patent/KR100870868B1/en active IP Right Grant
- 2001-10-22 TW TW090126064A patent/TW507409B/en not_active IP Right Cessation
- 2001-11-01 JP JP2001336704A patent/JP4046975B2/en not_active Expired - Lifetime
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2003
- 2003-10-10 US US10/684,016 patent/US7003012B2/en not_active Expired - Fee Related
- 2003-10-10 US US10/684,089 patent/US7046713B2/en not_active Expired - Lifetime
Also Published As
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US20040071177A1 (en) | 2004-04-15 |
US6711202B2 (en) | 2004-03-23 |
US7046713B2 (en) | 2006-05-16 |
EP1330860A4 (en) | 2005-11-23 |
JP2002185061A (en) | 2002-06-28 |
KR20030041173A (en) | 2003-05-23 |
US7003012B2 (en) | 2006-02-21 |
EP1330860B1 (en) | 2009-06-17 |
KR100870868B1 (en) | 2008-11-27 |
US20020051478A1 (en) | 2002-05-02 |
DE60139019D1 (en) | 2009-07-30 |
ATE434278T1 (en) | 2009-07-15 |
TW507409B (en) | 2002-10-21 |
WO2002037626A1 (en) | 2002-05-10 |
EP1330860A1 (en) | 2003-07-30 |
JP4046975B2 (en) | 2008-02-13 |
US20050018737A1 (en) | 2005-01-27 |
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