AU2002212468A1 - Control of deposition and other processes - Google Patents

Control of deposition and other processes

Info

Publication number
AU2002212468A1
AU2002212468A1 AU2002212468A AU1246802A AU2002212468A1 AU 2002212468 A1 AU2002212468 A1 AU 2002212468A1 AU 2002212468 A AU2002212468 A AU 2002212468A AU 1246802 A AU1246802 A AU 1246802A AU 2002212468 A1 AU2002212468 A1 AU 2002212468A1
Authority
AU
Australia
Prior art keywords
deposition
processes
control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2002212468A
Other languages
English (en)
Inventor
Stephen Richard Duncan
Patrick Spencer Grant
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oxford University Innovation Ltd
Original Assignee
Oxford University Innovation Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oxford University Innovation Ltd filed Critical Oxford University Innovation Ltd
Publication of AU2002212468A1 publication Critical patent/AU2002212468A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/08—Arrangements for controlling delivery; Arrangements for controlling the spray area responsive to condition of liquid or other fluent material to be discharged, of ambient medium or of target ; responsive to condition of spray devices or of supply means, e.g. pipes, pumps or their drive means
    • B05B12/084—Arrangements for controlling delivery; Arrangements for controlling the spray area responsive to condition of liquid or other fluent material to be discharged, of ambient medium or of target ; responsive to condition of spray devices or of supply means, e.g. pipes, pumps or their drive means responsive to condition of liquid or other fluent material already sprayed on the target, e.g. coating thickness, weight or pattern
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/08—Arrangements for controlling delivery; Arrangements for controlling the spray area responsive to condition of liquid or other fluent material to be discharged, of ambient medium or of target ; responsive to condition of spray devices or of supply means, e.g. pipes, pumps or their drive means
    • B05B12/12—Arrangements for controlling delivery; Arrangements for controlling the spray area responsive to condition of liquid or other fluent material to be discharged, of ambient medium or of target ; responsive to condition of spray devices or of supply means, e.g. pipes, pumps or their drive means responsive to conditions of ambient medium or target, e.g. humidity, temperature position or movement of the target relative to the spray apparatus
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/16—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed
    • B05B7/22—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc
    • B05B7/222—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc
    • B05B7/224—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas incorporating means for heating or cooling the material to be sprayed electrically, magnetically or electromagnetically, e.g. by arc using an arc the material having originally the shape of a wire, rod or the like
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
AU2002212468A 2000-11-03 2001-10-31 Control of deposition and other processes Abandoned AU2002212468A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
GB0026868 2000-11-03
GBGB0026868.0A GB0026868D0 (en) 2000-11-03 2000-11-03 Control of deposition and other processes
PCT/GB2001/004840 WO2002036845A1 (fr) 2000-11-03 2001-10-31 Commande de depot et d'autres processus

Publications (1)

Publication Number Publication Date
AU2002212468A1 true AU2002212468A1 (en) 2002-05-15

Family

ID=9902479

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2002212468A Abandoned AU2002212468A1 (en) 2000-11-03 2001-10-31 Control of deposition and other processes

Country Status (6)

Country Link
US (1) US6945306B2 (fr)
EP (1) EP1332237A1 (fr)
JP (1) JP2004512941A (fr)
AU (1) AU2002212468A1 (fr)
GB (1) GB0026868D0 (fr)
WO (1) WO2002036845A1 (fr)

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WO2001087817A1 (fr) * 2000-05-16 2001-11-22 Tokuyama Corporation Procede de production d'ester de 2-alkyl-2-adamantyle
GB0105411D0 (en) 2001-03-05 2001-04-25 Isis Innovation Control of deposition and other processes
DE102004010782A1 (de) * 2004-03-05 2005-09-22 Mtu Aero Engines Gmbh Verfahren zur Beschichtung eines Werkstücks
US8685501B2 (en) * 2004-10-07 2014-04-01 Lockheed Martin Corporation Co-continuous metal-metal matrix composite material using timed deposition processing
US20060075850A1 (en) * 2004-10-07 2006-04-13 Lockheed Martin Corporation Nitrogen-modified titanium and method of producing same
US8389072B2 (en) * 2004-10-28 2013-03-05 Lockheed Martin Corporation System, method, and apparatus for variable hardness gradient armor alloys
US7693491B2 (en) * 2004-11-30 2010-04-06 Broadcom Corporation Method and system for transmitter output power compensation
US8715772B2 (en) * 2005-04-12 2014-05-06 Air Products And Chemicals, Inc. Thermal deposition coating method
CA2579773A1 (fr) * 2006-04-19 2007-10-19 Sulzer Metco Ag Methode permettant de determiner les parametres de fonctionnement d'un processus de projection a chaud
US8293035B2 (en) 2006-10-12 2012-10-23 Air Products And Chemicals, Inc. Treatment method, system and product
EP1988185A1 (fr) * 2007-04-25 2008-11-05 Sulzer Metco AG Procédé informatique destiné au réglage de paramètres spécifiques aux particules dans un processus thermique de vaporisation
US20090047439A1 (en) * 2007-08-16 2009-02-19 Withers James C Method and apparatus for manufacturing porous articles
US7991577B2 (en) * 2007-08-30 2011-08-02 HSB Solomon Associates, LLP Control asset comparative performance analysis system and methodology
TWI544505B (zh) * 2011-06-30 2016-08-01 皮爾西蒙科技公司 噴射沈積塊體材料
JP6305673B2 (ja) * 2011-11-07 2018-04-04 セイコーエプソン株式会社 ロボット制御システム、ロボットシステム及びロボット
KR101376565B1 (ko) * 2011-12-15 2014-04-02 (주)포스코 연속 소둔라인 급냉대의 스트립 온도제어 방법 및 장치
US8596525B2 (en) * 2012-02-06 2013-12-03 Oracle International Corporation Topographic spot scanning for a storage library
US8613386B2 (en) * 2012-02-29 2013-12-24 Oracle International Corporation Contrast spot scanning for a storage library
US20130287934A1 (en) * 2012-04-30 2013-10-31 Pallant Satnarine Ramsundar Liquid Metal Digital Manufacturing System
AU2014273107B2 (en) * 2013-05-28 2017-06-29 Nestec S.A. A capsule for beverage preparation
JP6239294B2 (ja) * 2013-07-18 2017-11-29 株式会社日立ハイテクノロジーズ プラズマ処理装置及びプラズマ処理装置の運転方法
DE102014220180A1 (de) 2014-10-06 2016-06-09 Siemens Aktiengesellschaft Überwachung und Steuerung eines Beschichtungsvorgangs anhand einer Wärmeverteilung auf dem Werkstück
US11569135B2 (en) 2019-12-23 2023-01-31 Hitachi High-Tech Corporation Plasma processing method and wavelength selection method used in plasma processing

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Publication number Priority date Publication date Assignee Title
US4858556A (en) * 1986-09-15 1989-08-22 Siebert Jerome F Method and apparatus for physical vapor deposition of thin films
US4783341A (en) 1987-05-04 1988-11-08 United Technologies Corporation Method and apparatus for measuring the density and hardness of porous plasma sprayed coatings
IL103888A0 (en) * 1991-12-06 1993-04-04 Hughes Aircraft Co Optical coatings having a plurality of prescribed properties and method of fabricating same
JP2895683B2 (ja) * 1992-07-30 1999-05-24 住友電気工業株式会社 酸化物超電導膜製造装置
JPH09200755A (ja) 1996-01-12 1997-07-31 Canon Inc 直交変換符号化装置および復号化装置
DE19535078B4 (de) * 1995-09-21 2006-06-08 Robert Bosch Gmbh Überwachung und Regelung von thermischen Spritzverfahren
KR0165470B1 (ko) * 1995-11-08 1999-02-01 김광호 반도체 소자의 박막형성 프로그램의 자동보정 시스템
US5726919A (en) * 1995-11-30 1998-03-10 General Electric Company Method and apparatus for measuring electron beam effective focus
JP3592826B2 (ja) * 1996-03-05 2004-11-24 株式会社東芝 膜形状予測方法
US6348232B1 (en) 1996-10-21 2002-02-19 Kabushiki Kaisha Toshiba Spraying robot system and spraying method wherein spray conditions are determined by using computer
JPH1129846A (ja) * 1997-07-10 1999-02-02 Ishikawajima Harima Heavy Ind Co Ltd 溶射皮膜の制御方法
JPH1168884A (ja) 1997-08-20 1999-03-09 Matsushita Electric Ind Co Ltd 伝送媒体接続装置および制御装置ならびに被制御装置および記憶媒体
DE19756467A1 (de) * 1997-12-18 1999-07-01 Abb Research Ltd Verfahren und Vorrichtung zur Regelung der Qualität von Lackschichten
JP3132560B2 (ja) * 1998-03-16 2001-02-05 エス．エス．アロイ株式会社 熱加工装置
KR100275738B1 (ko) 1998-08-07 2000-12-15 윤종용 원자층 증착법을 이용한 박막 제조방법
DE19837400C1 (de) * 1998-08-18 1999-11-18 Siemens Ag Verfahren und Vorrichtung zur Beschichtung von Hochtemperaturbauteilen mittels Plasmaspritzens
US6179039B1 (en) * 1999-03-25 2001-01-30 Visteon Global Technologies, Inc. Method of reducing distortion in a spray formed rapid tool

Also Published As

Publication number Publication date
WO2002036845A1 (fr) 2002-05-10
EP1332237A1 (fr) 2003-08-06
US20040020624A1 (en) 2004-02-05
JP2004512941A (ja) 2004-04-30
US6945306B2 (en) 2005-09-20
GB0026868D0 (en) 2000-12-20

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