AU2001296673A1 - Mountable and removable sensor - Google Patents

Mountable and removable sensor

Info

Publication number
AU2001296673A1
AU2001296673A1 AU2001296673A AU9667301A AU2001296673A1 AU 2001296673 A1 AU2001296673 A1 AU 2001296673A1 AU 2001296673 A AU2001296673 A AU 2001296673A AU 9667301 A AU9667301 A AU 9667301A AU 2001296673 A1 AU2001296673 A1 AU 2001296673A1
Authority
AU
Australia
Prior art keywords
mountable
removable sensor
removable
sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001296673A
Other languages
English (en)
Inventor
Todd J. Bednarek
Eric B. Catey
David A. Hult
Stephen Roux
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML US Inc
Original Assignee
ASML US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML US Inc filed Critical ASML US Inc
Publication of AU2001296673A1 publication Critical patent/AU2001296673A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
AU2001296673A 2000-10-05 2001-10-05 Mountable and removable sensor Abandoned AU2001296673A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US67938800A 2000-10-05 2000-10-05
US09679388 2000-10-05
PCT/US2001/031332 WO2002029495A1 (fr) 2000-10-05 2001-10-05 Capteur montable et amovible

Publications (1)

Publication Number Publication Date
AU2001296673A1 true AU2001296673A1 (en) 2002-04-15

Family

ID=24726720

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001296673A Abandoned AU2001296673A1 (en) 2000-10-05 2001-10-05 Mountable and removable sensor

Country Status (6)

Country Link
EP (1) EP1250630B1 (fr)
JP (1) JP2004511093A (fr)
KR (1) KR100691570B1 (fr)
AU (1) AU2001296673A1 (fr)
DE (1) DE60136790D1 (fr)
WO (1) WO2002029495A1 (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6828542B2 (en) * 2002-06-07 2004-12-07 Brion Technologies, Inc. System and method for lithography process monitoring and control
JP2004055933A (ja) * 2002-07-22 2004-02-19 Advantest Corp 電子ビーム露光装置、及び電子ビーム計測モジュール
SG115631A1 (en) 2003-03-11 2005-10-28 Asml Netherlands Bv Lithographic projection assembly, load lock and method for transferring objects
EP1457831A1 (fr) * 2003-03-11 2004-09-15 ASML Netherlands B.V. Méthode et appareil d'entretien d'une pièce de machine
US7053355B2 (en) 2003-03-18 2006-05-30 Brion Technologies, Inc. System and method for lithography process monitoring and control
US7171334B2 (en) 2004-06-01 2007-01-30 Brion Technologies, Inc. Method and apparatus for synchronizing data acquisition of a monitored IC fabrication process
US8547522B2 (en) 2005-03-03 2013-10-01 Asml Netherlands B.V. Dedicated metrology stage for lithography applications
US7755742B2 (en) * 2005-10-11 2010-07-13 Asml Netherlands B.V. Lithographic apparatus with mounted sensor
TW202212812A (zh) * 2020-06-04 2022-04-01 日商東京威力科創股份有限公司 檢查基板、其再生方法及基板處理裝置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4585342A (en) * 1984-06-29 1986-04-29 International Business Machines Corporation System for real-time monitoring the characteristics, variations and alignment errors of lithography structures
JPH1092722A (ja) * 1996-09-18 1998-04-10 Nikon Corp 露光装置
WO1999060361A1 (fr) * 1998-05-19 1999-11-25 Nikon Corporation Instrument et procede de mesure d'aberrations, appareil et procede de sensibilisation par projection incorporant cet instrument, et procede de fabrication de dispositifs associe
JP2000240717A (ja) * 1999-02-19 2000-09-05 Canon Inc 能動的除振装置
AU3193900A (en) * 1999-03-18 2000-10-04 Nikon Corporation Exposure system and aberration measurement method for its projection optical system, and production method for device
JP2001338868A (ja) * 2000-03-24 2001-12-07 Nikon Corp 照度計測装置及び露光装置

Also Published As

Publication number Publication date
JP2004511093A (ja) 2004-04-08
KR20030023602A (ko) 2003-03-19
DE60136790D1 (de) 2009-01-15
EP1250630B1 (fr) 2008-12-03
WO2002029495A1 (fr) 2002-04-11
KR100691570B1 (ko) 2007-03-12
EP1250630A1 (fr) 2002-10-23

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