AU2001296655A1 - Process control methods for use with e-beam fabrication technology - Google Patents

Process control methods for use with e-beam fabrication technology

Info

Publication number
AU2001296655A1
AU2001296655A1 AU2001296655A AU9665501A AU2001296655A1 AU 2001296655 A1 AU2001296655 A1 AU 2001296655A1 AU 2001296655 A AU2001296655 A AU 2001296655A AU 9665501 A AU9665501 A AU 9665501A AU 2001296655 A1 AU2001296655 A1 AU 2001296655A1
Authority
AU
Australia
Prior art keywords
process control
control methods
fabrication technology
beam fabrication
technology
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001296655A
Inventor
David M. Pepper
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
HRL Laboratories LLC
Original Assignee
HRL Laboratories LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by HRL Laboratories LLC filed Critical HRL Laboratories LLC
Publication of AU2001296655A1 publication Critical patent/AU2001296655A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3005—Observing the objects or the point of impact on the object
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/171—Systems in which incident light is modified in accordance with the properties of the material investigated with calorimetric detection, e.g. with thermal lens detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N25/00—Investigating or analyzing materials by the use of thermal means
    • G01N25/72—Investigating presence of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
    • G01N29/22—Details, e.g. general constructional or apparatus details
    • G01N29/24—Probes
    • G01N29/2418—Probes using optoacoustic interaction with the material, e.g. laser radiation, photoacoustics
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N2021/8472—Investigation of composite materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/02—Indexing codes associated with the analysed material
    • G01N2291/023—Solids
    • G01N2291/0231—Composite or layered materials
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2291/00—Indexing codes associated with group G01N29/00
    • G01N2291/02—Indexing codes associated with the analysed material
    • G01N2291/028—Material parameters
    • G01N2291/02881—Temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244—Detection characterized by the detecting means
    • H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/245—Detection characterised by the variable being measured
    • H01J2237/24592—Inspection and quality control of devices
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/248—Components associated with the control of the tube
    • H01J2237/2482—Optical means
AU2001296655A 2000-11-06 2001-10-04 Process control methods for use with e-beam fabrication technology Abandoned AU2001296655A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/707,444 US6696692B1 (en) 2000-11-06 2000-11-06 Process control methods for use with e-beam fabrication technology
US09707444 2000-11-06
PCT/US2001/031282 WO2002037085A1 (en) 2000-11-06 2001-10-04 Process control methods for use with e-beam fabrication technology

Publications (1)

Publication Number Publication Date
AU2001296655A1 true AU2001296655A1 (en) 2002-05-15

Family

ID=24841718

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001296655A Abandoned AU2001296655A1 (en) 2000-11-06 2001-10-04 Process control methods for use with e-beam fabrication technology

Country Status (3)

Country Link
US (1) US6696692B1 (en)
AU (1) AU2001296655A1 (en)
WO (1) WO2002037085A1 (en)

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US7330583B2 (en) * 2002-08-19 2008-02-12 Photon Dynamics, Inc. Integrated visual imaging and electronic sensing inspection systems
JP2005177763A (en) * 2003-12-16 2005-07-07 Disco Abrasive Syst Ltd Verifying apparatus for affected layer machined by laser beam
KR100741110B1 (en) * 2006-02-15 2007-07-19 삼성에스디아이 주식회사 Optic fibre and method of forming electrodes of plasma display panel
US7516663B2 (en) * 2006-11-03 2009-04-14 General Electric Company Systems and method for locating failure events in samples under load
US7605924B2 (en) * 2006-12-06 2009-10-20 Lockheed Martin Corporation Laser-ultrasound inspection using infrared thermography
US7966883B2 (en) * 2006-12-06 2011-06-28 Lockheed Martin Corporation Non-destructive inspection using laser-ultrasound and infrared thermography
CA2672378A1 (en) 2007-12-06 2009-06-11 Lockheed Martin Corporation Non-destructive inspection using laser-ultrasound and infrared thermography
US8440974B2 (en) * 2009-09-16 2013-05-14 Siemens Energy, Inc. System and method for analysis of ultrasonic power coupling during acoustic thermography
US20110122459A1 (en) * 2009-11-24 2011-05-26 International Business Machines Corporation Scanning and Capturing digital Images Using Document Characteristics Detection
US8610924B2 (en) * 2009-11-24 2013-12-17 International Business Machines Corporation Scanning and capturing digital images using layer detection
US8522614B2 (en) * 2010-05-26 2013-09-03 General Electric Company In-line inspection methods and closed loop processes for the manufacture of prepregs and/or laminates comprising the same
CN114770829A (en) * 2022-01-05 2022-07-22 南京航空航天大学 Composite material electron beam repair and repair process detection integrated device and method

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US4468136A (en) * 1982-02-12 1984-08-28 The Johns Hopkins University Optical beam deflection thermal imaging
JPS59177846A (en) 1983-03-28 1984-10-08 Fujitsu Ltd Electron beam device
US4752140A (en) * 1983-12-02 1988-06-21 Canadian Patents And Development Limited/Societe Canadienne Des Brevets Et D'exploitation Limitee Pulsed dilatometric method and device for the detection of delaminations
US4589783A (en) * 1984-04-04 1986-05-20 Wayne State University Thermal wave imaging apparatus
US4579463A (en) * 1984-05-21 1986-04-01 Therma-Wave Partners Detecting thermal waves to evaluate thermal parameters
US4636088A (en) * 1984-05-21 1987-01-13 Therma-Wave, Inc. Method and apparatus for evaluating surface conditions of a sample
US4710030A (en) 1985-05-17 1987-12-01 Bw Brown University Research Foundation Optical generator and detector of stress pulses
IE58049B1 (en) 1985-05-21 1993-06-16 Tekscan Ltd Surface analysis microscopy apparatus
NO164133C (en) 1985-07-15 1993-10-26 Svein Otto Kanstad PROCEDURE AND APPARATUS FOR CHARACTERIZATION AND CONTROL OF SUBSTANCES, MATERIALS AND OBJECTS
US4799392A (en) * 1987-08-06 1989-01-24 Motorola Inc. Method for determining silicon (mass 28) beam purity prior to implantation of gallium arsenide
US5020920A (en) * 1989-11-03 1991-06-04 The United States Of America As Represented By The United States Department Of Energy Method and apparatus for millimeter-wave detection of thermal waves for materials evaluation
JP3117836B2 (en) * 1993-03-02 2000-12-18 セイコーインスツルメンツ株式会社 Focused ion beam equipment
US5376793A (en) * 1993-09-15 1994-12-27 Stress Photonics, Inc. Forced-diffusion thermal imaging apparatus and method
US5483068A (en) * 1994-01-07 1996-01-09 Moulton; Russell D. Use of IR (thermal) imaging for determining cell diagnostics
US5432119A (en) 1994-01-31 1995-07-11 Hughes Aircraft Company High yield electron-beam gate fabrication method for sub-micron gate FETS
JP3221797B2 (en) * 1994-06-14 2001-10-22 株式会社日立製作所 Sample preparation method and apparatus
EP0731490A3 (en) * 1995-03-02 1998-03-11 Ebara Corporation Ultra-fine microfabrication method using an energy beam
JPH09115861A (en) * 1995-10-20 1997-05-02 Hitachi Ltd Machining system for sample
US5760904A (en) 1996-07-26 1998-06-02 General Electric Company Method and system for inspecting a surface of an object with laser ultrasound
US5966626A (en) * 1996-11-07 1999-10-12 Mosel Vitelic, Inc. Method for stabilizing a silicon structure after ion implantation
FR2760528B1 (en) * 1997-03-05 1999-05-21 Framatome Sa METHOD AND DEVICE FOR PHOTOTHERMAL EXAMINATION OF A MATERIAL
US5900935A (en) 1997-12-22 1999-05-04 Klein; Marvin B. Homodyne interferometer and method of sensing material
US6049220A (en) * 1998-06-10 2000-04-11 Boxer Cross Incorporated Apparatus and method for evaluating a wafer of semiconductor material

Also Published As

Publication number Publication date
US6696692B1 (en) 2004-02-24
WO2002037085A1 (en) 2002-05-10

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