AU2001294685A1 - Web-style pad conditioning system and methods for implementing the same - Google Patents

Web-style pad conditioning system and methods for implementing the same

Info

Publication number
AU2001294685A1
AU2001294685A1 AU2001294685A AU9468501A AU2001294685A1 AU 2001294685 A1 AU2001294685 A1 AU 2001294685A1 AU 2001294685 A AU2001294685 A AU 2001294685A AU 9468501 A AU9468501 A AU 9468501A AU 2001294685 A1 AU2001294685 A1 AU 2001294685A1
Authority
AU
Australia
Prior art keywords
implementing
web
methods
same
conditioning system
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001294685A
Inventor
Joh M. Boyd
Katrina A. Mikhaylich
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Lam Research Corp
Original Assignee
Lam Research Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Research Corp filed Critical Lam Research Corp
Publication of AU2001294685A1 publication Critical patent/AU2001294685A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00—Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017—Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B21/00—Machines or devices using grinding or polishing belts; Accessories therefor
    • B24B21/04—Machines or devices using grinding or polishing belts; Accessories therefor for grinding plane surfaces
AU2001294685A 2000-10-02 2001-09-21 Web-style pad conditioning system and methods for implementing the same Abandoned AU2001294685A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/678,423 US6800020B1 (en) 2000-10-02 2000-10-02 Web-style pad conditioning system and methods for implementing the same
US09678423 2000-10-02
PCT/US2001/029919 WO2002028596A1 (en) 2000-10-02 2001-09-21 Web-style pad conditioning system and methods for implementing the same

Publications (1)

Publication Number Publication Date
AU2001294685A1 true AU2001294685A1 (en) 2002-04-15

Family

ID=24722720

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001294685A Abandoned AU2001294685A1 (en) 2000-10-02 2001-09-21 Web-style pad conditioning system and methods for implementing the same

Country Status (8)

Country Link
US (1) US6800020B1 (en)
EP (1) EP1322449B1 (en)
JP (1) JP2004511090A (en)
KR (1) KR20030067674A (en)
AU (1) AU2001294685A1 (en)
DE (1) DE60110922T2 (en)
TW (1) TW565487B (en)
WO (1) WO2002028596A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040192178A1 (en) * 2003-03-28 2004-09-30 Barak Yardeni Diamond conditioning of soft chemical mechanical planarization/polishing (CMP) polishing pads
US7160178B2 (en) 2003-08-07 2007-01-09 3M Innovative Properties Company In situ activation of a three-dimensional fixed abrasive article
US6951509B1 (en) 2004-03-09 2005-10-04 3M Innovative Properties Company Undulated pad conditioner and method of using same
US7014539B1 (en) * 2004-11-18 2006-03-21 Lam Research Corporation Method and apparatus for minimizing agglomerate particle size in a polishing fluid
EP1712329B1 (en) * 2005-04-13 2008-02-27 Cross Hüller GmbH Production line with a workpiece load and transport device
US20090061743A1 (en) * 2007-08-29 2009-03-05 Stephen Jew Method of soft pad preparation to reduce removal rate ramp-up effect and to stabilize defect rate
US9108293B2 (en) * 2012-07-30 2015-08-18 Rohm And Haas Electronic Materials Cmp Holdings, Inc. Method for chemical mechanical polishing layer pretexturing
EP3571009A4 (en) 2017-01-20 2021-01-20 Applied Materials, Inc. A thin plastic polishing article for cmp applications
US11717936B2 (en) 2018-09-14 2023-08-08 Applied Materials, Inc. Methods for a web-based CMP system

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US4202071A (en) 1978-03-20 1980-05-13 Scharpf Mike A Apparatus for washing and drying phonograph records
US4356671A (en) * 1980-07-14 1982-11-02 Belt Master, Inc. Method and apparatus for cleaning abrasive surfaces
US4347689A (en) * 1980-10-20 1982-09-07 Verbatim Corporation Method for burnishing
US4382308A (en) 1981-02-18 1983-05-10 Chemcut Corporation Scrubbing torque monitoring and control system
US5357645A (en) 1989-04-09 1994-10-25 System Seiko Co., Ltd. Apparatus for cleaning and drying hard disk substrates
JP2680418B2 (en) * 1989-05-12 1997-11-19 捨義 沼尾 Polishing equipment
JP2797488B2 (en) 1989-07-28 1998-09-17 三菱瓦斯化学株式会社 Manufacturing method of thin copper foil-clad circuit board
DE3926673A1 (en) 1989-08-11 1991-02-14 Wacker Chemitronic METHOD AND DEVICE FOR PROCESSING POLISHING TOWELS IN CHEMOMECHANICAL POLISHING, ESPECIALLY OF SEMICONDUCTOR DISCS
US5317778A (en) 1991-07-31 1994-06-07 Shin-Etsu Handotai Co., Ltd. Automatic cleaning apparatus for wafers
US5486134A (en) 1992-02-27 1996-01-23 Oliver Design, Inc. System and method for texturing magnetic data storage disks
US6069080A (en) 1992-08-19 2000-05-30 Rodel Holdings, Inc. Fixed abrasive polishing system for the manufacture of semiconductor devices, memory disks and the like
EP0812656A3 (en) 1992-09-24 1998-07-15 Ebara Corporation Dressing device for dressing a polishing pad in a polishing machine
JP2877216B2 (en) 1992-10-02 1999-03-31 東京エレクトロン株式会社 Cleaning equipment
JP2888412B2 (en) 1994-07-04 1999-05-10 信越半導体株式会社 Brush cleaning device and work cleaning system
TW316995B (en) 1995-01-19 1997-10-01 Tokyo Electron Co Ltd
US5639311A (en) 1995-06-07 1997-06-17 International Business Machines Corporation Method of cleaning brushes used in post CMP semiconductor wafer cleaning operations
JP3778594B2 (en) 1995-07-18 2006-05-24 株式会社荏原製作所 Dressing method
US5645471A (en) * 1995-08-11 1997-07-08 Minnesota Mining And Manufacturing Company Method of texturing a substrate using an abrasive article having multiple abrasive natures
US5624501A (en) 1995-09-26 1997-04-29 Gill, Jr.; Gerald L. Apparatus for cleaning semiconductor wafers
KR100392828B1 (en) 1995-10-13 2003-10-17 램 리서치 코포레이션 Method and apparatus for chemical delivery through the brush
US5693148A (en) 1995-11-08 1997-12-02 Ontrak Systems, Incorporated Process for brush cleaning
US5879226A (en) 1996-05-21 1999-03-09 Micron Technology, Inc. Method for conditioning a polishing pad used in chemical-mechanical planarization of semiconductor wafers
US5675856A (en) 1996-06-14 1997-10-14 Solid State Equipment Corp. Wafer scrubbing device
US5778554A (en) 1996-07-15 1998-07-14 Oliver Design, Inc. Wafer spin dryer and method of drying a wafer
US5875507A (en) 1996-07-15 1999-03-02 Oliver Design, Inc. Wafer cleaning apparatus
US5782675A (en) * 1996-10-21 1998-07-21 Micron Technology, Inc. Apparatus and method for refurbishing fixed-abrasive polishing pads used in chemical-mechanical planarization of semiconductor wafers
US5725417A (en) 1996-11-05 1998-03-10 Micron Technology, Inc. Method and apparatus for conditioning polishing pads used in mechanical and chemical-mechanical planarization of substrates
US6312319B1 (en) * 1997-04-04 2001-11-06 Timothy J. Donohue Polishing media magazine for improved polishing
US5919082A (en) 1997-08-22 1999-07-06 Micron Technology, Inc. Fixed abrasive polishing pad
US5944585A (en) * 1997-10-02 1999-08-31 Lsi Logic Corporation Use of abrasive tape conveying assemblies for conditioning polishing pads
FR2769248B1 (en) 1997-10-06 2000-01-28 St Microelectronics Sa PROCESS FOR MECHANICAL-CHEMICAL POST-POLISHING CLEANING OF AN OXIDE OR NITRIDE LAYER DEPOSITED ON A SUBSTRATE
US6196896B1 (en) 1997-10-31 2001-03-06 Obsidian, Inc. Chemical mechanical polisher
JP3770752B2 (en) * 1998-08-11 2006-04-26 株式会社日立製作所 Semiconductor device manufacturing method and processing apparatus
TW396084B (en) 1998-08-12 2000-07-01 Worldwild Semiconductor Mfg Co Chemical mechanic polishing machine
US6322427B1 (en) * 1999-04-30 2001-11-27 Applied Materials, Inc. Conditioning fixed abrasive articles
US6196899B1 (en) * 1999-06-21 2001-03-06 Micron Technology, Inc. Polishing apparatus

Also Published As

Publication number Publication date
EP1322449A1 (en) 2003-07-02
DE60110922D1 (en) 2005-06-23
JP2004511090A (en) 2004-04-08
US6800020B1 (en) 2004-10-05
DE60110922T2 (en) 2006-01-19
EP1322449B1 (en) 2005-05-18
WO2002028596A1 (en) 2002-04-11
TW565487B (en) 2003-12-11
KR20030067674A (en) 2003-08-14

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