AU2001292916A1 - Pinhole defect repair by resist flow - Google Patents

Pinhole defect repair by resist flow

Info

Publication number
AU2001292916A1
AU2001292916A1 AU2001292916A AU9291601A AU2001292916A1 AU 2001292916 A1 AU2001292916 A1 AU 2001292916A1 AU 2001292916 A AU2001292916 A AU 2001292916A AU 9291601 A AU9291601 A AU 9291601A AU 2001292916 A1 AU2001292916 A1 AU 2001292916A1
Authority
AU
Australia
Prior art keywords
defect repair
resist flow
pinhole defect
pinhole
resist
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001292916A
Inventor
Michael K. Templeton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Advanced Micro Devices Inc
Original Assignee
Advanced Micro Devices Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Micro Devices Inc filed Critical Advanced Micro Devices Inc
Publication of AU2001292916A1 publication Critical patent/AU2001292916A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y15/00—Nanotechnology for interacting, sensing or actuating, e.g. quantum dots as markers in protein assays or molecular motors

Landscapes

  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2001292916A 2000-09-22 2001-09-21 Pinhole defect repair by resist flow Abandoned AU2001292916A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US23465800P 2000-09-22 2000-09-22
US60/234,658 2000-09-22
US09/951,473 US6834158B1 (en) 2000-09-22 2001-09-13 Pinhole defect repair by resist flow
US09/951,473 2001-09-13
PCT/US2001/029565 WO2002025375A2 (en) 2000-09-22 2001-09-21 Pinhole defect repair by resist flow

Publications (1)

Publication Number Publication Date
AU2001292916A1 true AU2001292916A1 (en) 2002-04-02

Family

ID=26928173

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001292916A Abandoned AU2001292916A1 (en) 2000-09-22 2001-09-21 Pinhole defect repair by resist flow

Country Status (7)

Country Link
US (1) US6834158B1 (en)
EP (1) EP1319199A2 (en)
JP (1) JP2004512676A (en)
KR (1) KR20040004380A (en)
CN (1) CN1466707A (en)
AU (1) AU2001292916A1 (en)
WO (1) WO2002025375A2 (en)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7591780B2 (en) * 2002-03-18 2009-09-22 Sterling Lc Miniaturized imaging device with integrated circuit connector system
US7787939B2 (en) 2002-03-18 2010-08-31 Sterling Lc Miniaturized imaging device including utility aperture and SSID
US8614768B2 (en) 2002-03-18 2013-12-24 Raytheon Company Miniaturized imaging device including GRIN lens optically coupled to SSID
CN100335920C (en) * 2004-05-12 2007-09-05 统宝光电股份有限公司 Method and device for repairing defect of color filter
KR101144796B1 (en) * 2005-02-15 2012-06-14 엘지전자 주식회사 The repairing equipment for inferiority on surface of display panel and the repairing methode of the same
US7835074B2 (en) 2007-06-05 2010-11-16 Sterling Lc Mini-scope for multi-directional imaging
US7969659B2 (en) 2008-01-11 2011-06-28 Sterling Lc Grin lens microscope system
JP5596027B2 (en) 2008-06-18 2014-09-24 レイセオン カンパニー catheter
WO2010014792A2 (en) 2008-07-30 2010-02-04 Sterling Lc Method and device for incremental wavelength variation to analyze tissue
US9060704B2 (en) 2008-11-04 2015-06-23 Sarcos Lc Method and device for wavelength shifted imaging
US9661996B2 (en) 2009-10-01 2017-05-30 Sarcos Lc Needle delivered imaging device
US8717428B2 (en) 2009-10-01 2014-05-06 Raytheon Company Light diffusion apparatus
US9144664B2 (en) 2009-10-01 2015-09-29 Sarcos Lc Method and apparatus for manipulating movement of a micro-catheter
US8828028B2 (en) 2009-11-03 2014-09-09 Raytheon Company Suture device and method for closing a planar opening
US8164818B2 (en) 2010-11-08 2012-04-24 Soladigm, Inc. Electrochromic window fabrication methods
US9885934B2 (en) 2011-09-14 2018-02-06 View, Inc. Portable defect mitigators for electrochromic windows
US9507232B2 (en) 2011-09-14 2016-11-29 View, Inc. Portable defect mitigator for electrochromic windows
US9341912B2 (en) 2012-03-13 2016-05-17 View, Inc. Multi-zone EC windows
WO2013138535A1 (en) 2012-03-13 2013-09-19 View, Inc. Pinhole mitigation for optical devices
CN104302437B (en) 2012-05-18 2017-09-05 唯景公司 Limit the defect in Optical devices
US9538582B2 (en) * 2012-07-26 2017-01-03 Taiwan Semiconductor Manufacturing Company, Ltd. Warpage control in the packaging of integrated circuits
CN110034035B (en) * 2019-03-06 2021-06-15 重庆慧聚成江信息技术合伙企业(有限合伙) Photoresist coating detection device integrating wafer production quality inspection and repair
KR20240011465A (en) 2022-07-19 2024-01-26 삼성전기주식회사 Printed Circuit Board and method for manufacturing the same

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5278012A (en) * 1989-03-29 1994-01-11 Hitachi, Ltd. Method for producing thin film multilayer substrate, and method and apparatus for detecting circuit conductor pattern of the substrate
US5935734A (en) * 1997-03-03 1999-08-10 Micron Technology, Inc. Method for fabrication of and apparatus for use as a semiconductor photomask
US6121158A (en) 1997-08-13 2000-09-19 Sony Corporation Method for hardening a photoresist material formed on a substrate
US6034771A (en) * 1998-11-04 2000-03-07 Advanced Micro Devices, Inc. System for uniformly heating photoresist
US6445439B1 (en) * 1999-12-27 2002-09-03 Svg Lithography Systems, Inc. EUV reticle thermal management

Also Published As

Publication number Publication date
KR20040004380A (en) 2004-01-13
CN1466707A (en) 2004-01-07
EP1319199A2 (en) 2003-06-18
JP2004512676A (en) 2004-04-22
WO2002025375A2 (en) 2002-03-28
US6834158B1 (en) 2004-12-21
WO2002025375A3 (en) 2002-08-22

Similar Documents

Publication Publication Date Title
AU2001292916A1 (en) Pinhole defect repair by resist flow
AU2003299002A1 (en) Photolithography mask repair
AU2001274579A1 (en) Resist composition
AU2002239630A1 (en) Bioprosthetic cardiovascular valve system
AU2002351201A1 (en) Tissue repair
AU2002220050A1 (en) Endovascular valve
AU2001240123A1 (en) Defect parameter for wooden members
AU3404901A (en) Constructive nanolithography
GB2363856B (en) Photoresist composition
AU2001288946A1 (en) Photoresist composition
AU4228301A (en) Valve
AU2001272397A1 (en) Multi-layered pipe
AU2001255047A1 (en) Flow meter
AU2001227891A1 (en) Lithographic condenser
AU2002254232A1 (en) Photoresist composition
AU2001259509A1 (en) Polymers for photoresist compositions for microlithography
AU2002232383A1 (en) Compositions for microlithography
AU2001251460A1 (en) Fluorocarbon repair bladder
AU2002250101A1 (en) Lithography method
AU2002334937A1 (en) Axon repair
AU2001241166A1 (en) Kidney repairing factor
AUPQ823800A0 (en) Valve
AU2002218755A1 (en) Homogenization valve
GB0007843D0 (en) Repair kit
AUPQ667400A0 (en) Pipeline repairs