AU2001290065A1 - Method and system for determining pressure compensation factors in an ion implanter - Google Patents
Method and system for determining pressure compensation factors in an ion implanterInfo
- Publication number
- AU2001290065A1 AU2001290065A1 AU2001290065A AU9006501A AU2001290065A1 AU 2001290065 A1 AU2001290065 A1 AU 2001290065A1 AU 2001290065 A AU2001290065 A AU 2001290065A AU 9006501 A AU9006501 A AU 9006501A AU 2001290065 A1 AU2001290065 A1 AU 2001290065A1
- Authority
- AU
- Australia
- Prior art keywords
- pressure compensation
- ion implanter
- compensation factors
- determining pressure
- determining
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Measuring Fluid Pressure (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US23408800P | 2000-09-20 | 2000-09-20 | |
US60/234,088 | 2000-09-20 | ||
PCT/GB2001/004199 WO2002025722A2 (en) | 2000-09-20 | 2001-09-19 | Method and system for determining pressure compensation factors in an ion implanter |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001290065A1 true AU2001290065A1 (en) | 2002-04-02 |
Family
ID=22879860
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001290065A Abandoned AU2001290065A1 (en) | 2000-09-20 | 2001-09-19 | Method and system for determining pressure compensation factors in an ion implanter |
Country Status (7)
Country | Link |
---|---|
US (1) | US6657209B2 (zh) |
EP (1) | EP1320882A2 (zh) |
JP (1) | JP5131576B2 (zh) |
KR (1) | KR100786914B1 (zh) |
AU (1) | AU2001290065A1 (zh) |
TW (1) | TW514953B (zh) |
WO (1) | WO2002025722A2 (zh) |
Families Citing this family (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6908836B2 (en) * | 2002-09-23 | 2005-06-21 | Applied Materials, Inc. | Method of implanting a substrate and an ion implanter for performing the method |
US7282427B1 (en) | 2006-05-04 | 2007-10-16 | Applied Materials, Inc. | Method of implanting a substrate and an ion implanter for performing the method |
US7049210B2 (en) * | 2002-09-23 | 2006-05-23 | Applied Materials, Inc. | Method of implanting a substrate and an ion implanter for performing the method |
JP2005005098A (ja) * | 2003-06-11 | 2005-01-06 | Sumitomo Eaton Noba Kk | イオン注入装置及びその制御方法 |
US7009193B2 (en) * | 2003-10-31 | 2006-03-07 | Infineon Technologies Richmond, Lp | Utilization of an ion gauge in the process chamber of a semiconductor ion implanter |
TWI225272B (en) * | 2003-11-04 | 2004-12-11 | Promos Technologies Inc | Method of controlling implanting dosage and method of controlling pressure compensate factor in-situ |
JP4251453B2 (ja) * | 2004-02-23 | 2009-04-08 | 日新イオン機器株式会社 | イオン注入方法 |
US6870170B1 (en) * | 2004-03-04 | 2005-03-22 | Applied Materials, Inc. | Ion implant dose control |
GB2432040B (en) * | 2004-03-04 | 2007-11-28 | Applied Materials Inc | Ion implant dose control |
US6984832B2 (en) * | 2004-04-15 | 2006-01-10 | Axcelis Technologies, Inc. | Beam angle control in a batch ion implantation system |
US7173260B2 (en) * | 2004-12-22 | 2007-02-06 | Axcelis Technologies, Inc. | Removing byproducts of physical and chemical reactions in an ion implanter |
US7557363B2 (en) * | 2006-06-02 | 2009-07-07 | Axcelis Technologies, Inc. | Closed loop dose control for ion implantation |
KR100779383B1 (ko) * | 2006-12-11 | 2007-11-23 | 동부일렉트로닉스 주식회사 | 이온주입기의 빔 에퍼처 디플렉터 |
US8003956B2 (en) * | 2008-10-03 | 2011-08-23 | Varian Semiconductor Equipment Associates, Inc. | Method and apparatus for controlling beam current uniformity in an ion implanter |
EP2487552A1 (de) * | 2011-02-14 | 2012-08-15 | Schneider GmbH & Co. KG | Verfahren und Vorrichtung zur Regelung eines Antriebs für ein Werkzeug oder Werkstück mit Anwendung einer Vorsteuerung |
US9315892B2 (en) * | 2013-03-15 | 2016-04-19 | Taiwan Semiconductor Manufacturing Company Limited | Method and apparatus for controlling beam angle during ion implantation of a semiconductor wafer based upon pressure |
US9679739B2 (en) * | 2014-12-26 | 2017-06-13 | Axcelis Technologies, Inc. | Combined electrostatic lens system for ion implantation |
JP6675789B2 (ja) * | 2017-02-27 | 2020-04-01 | 住友重機械イオンテクノロジー株式会社 | イオン注入装置 |
US11264205B2 (en) * | 2019-12-06 | 2022-03-01 | Applied Materials, Inc. | Techniques for determining and correcting for expected dose variation during implantation of photoresist-coated substrates |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4587433A (en) * | 1984-06-27 | 1986-05-06 | Eaton Corporation | Dose control apparatus |
US4539217A (en) | 1984-06-27 | 1985-09-03 | Eaton Corporation | Dose control method |
JPH08264152A (ja) * | 1995-03-27 | 1996-10-11 | Fujitsu Ltd | イオンビーム電流の補正方法、イオン注入方法及び装置 |
US5760409A (en) * | 1996-06-14 | 1998-06-02 | Eaton Corporation | Dose control for use in an ion implanter |
JP3006535B2 (ja) * | 1997-04-07 | 2000-02-07 | 日本電気株式会社 | イオン注入方法および装置 |
GB2325561B (en) | 1997-05-20 | 2001-10-17 | Applied Materials Inc | Apparatus for and methods of implanting desired chemical species in semiconductor substrates |
JPH1116849A (ja) * | 1997-06-25 | 1999-01-22 | Sony Corp | イオン注入方法およびイオン注入装置 |
US5998798A (en) * | 1998-06-11 | 1999-12-07 | Eaton Corporation | Ion dosage measurement apparatus for an ion beam implanter and method |
US6297510B1 (en) * | 1999-04-19 | 2001-10-02 | Applied Materials, Inc. | Ion implant dose control |
-
2001
- 2001-01-29 US US09/772,146 patent/US6657209B2/en not_active Expired - Lifetime
- 2001-09-11 TW TW090122438A patent/TW514953B/zh not_active IP Right Cessation
- 2001-09-19 AU AU2001290065A patent/AU2001290065A1/en not_active Abandoned
- 2001-09-19 JP JP2002529831A patent/JP5131576B2/ja not_active Expired - Lifetime
- 2001-09-19 WO PCT/GB2001/004199 patent/WO2002025722A2/en active Application Filing
- 2001-09-19 EP EP01969942A patent/EP1320882A2/en not_active Withdrawn
- 2001-09-19 KR KR1020037004064A patent/KR100786914B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
US20020130277A1 (en) | 2002-09-19 |
WO2002025722A2 (en) | 2002-03-28 |
TW514953B (en) | 2002-12-21 |
JP5131576B2 (ja) | 2013-01-30 |
KR100786914B1 (ko) | 2007-12-17 |
US6657209B2 (en) | 2003-12-02 |
EP1320882A2 (en) | 2003-06-25 |
KR20030038757A (ko) | 2003-05-16 |
JP2004510296A (ja) | 2004-04-02 |
WO2002025722A3 (en) | 2002-10-17 |
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