AU2001288115A1 - Flaw detecting device and computer-readable storage medium - Google Patents

Flaw detecting device and computer-readable storage medium

Info

Publication number
AU2001288115A1
AU2001288115A1 AU2001288115A AU8811501A AU2001288115A1 AU 2001288115 A1 AU2001288115 A1 AU 2001288115A1 AU 2001288115 A AU2001288115 A AU 2001288115A AU 8811501 A AU8811501 A AU 8811501A AU 2001288115 A1 AU2001288115 A1 AU 2001288115A1
Authority
AU
Australia
Prior art keywords
computer
storage medium
readable storage
detecting device
flaw detecting
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001288115A
Inventor
Yoshinari Ota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Olympus Corp
Original Assignee
Olympus Optical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Optical Co Ltd filed Critical Olympus Optical Co Ltd
Publication of AU2001288115A1 publication Critical patent/AU2001288115A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
AU2001288115A 2000-09-26 2001-09-25 Flaw detecting device and computer-readable storage medium Abandoned AU2001288115A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000292938 2000-09-26
JP2000-292938 2000-09-26
PCT/JP2001/008295 WO2002027305A1 (en) 2000-09-26 2001-09-25 Flaw detecting device and computer-readable storage medium

Publications (1)

Publication Number Publication Date
AU2001288115A1 true AU2001288115A1 (en) 2002-04-08

Family

ID=18775802

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001288115A Abandoned AU2001288115A1 (en) 2000-09-26 2001-09-25 Flaw detecting device and computer-readable storage medium

Country Status (6)

Country Link
US (1) US6753542B2 (en)
JP (1) JP3699958B2 (en)
KR (1) KR100705983B1 (en)
AU (1) AU2001288115A1 (en)
TW (1) TWI285738B (en)
WO (1) WO2002027305A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4529366B2 (en) * 2003-03-26 2010-08-25 株式会社ニコン Defect inspection apparatus, defect inspection method, and hole pattern inspection method
US7220978B2 (en) * 2003-04-15 2007-05-22 The University Of South Carolina System and method for detecting defects in semiconductor wafers
JP2007003376A (en) * 2005-06-24 2007-01-11 Toppan Printing Co Ltd Irregularity inspection device of cyclic pattern and cyclic pattern imaging method
JP4661441B2 (en) * 2005-08-05 2011-03-30 凸版印刷株式会社 Defect measuring equipment for periodic structure
JP2007212260A (en) * 2006-02-09 2007-08-23 Mitsubishi Electric Corp Reflectance measuring device, reflectance measuring method, and manufacturing method of display panel
JP5119602B2 (en) * 2006-03-08 2013-01-16 凸版印刷株式会社 Periodic pattern defect inspection method and defect inspection apparatus
JPWO2007132925A1 (en) * 2006-05-15 2009-09-24 株式会社ニコン Surface inspection device
JP2008014650A (en) * 2006-07-03 2008-01-24 Olympus Corp Surface defect inspection apparatus
US20080079936A1 (en) * 2006-09-29 2008-04-03 Caterpillar Inc. Internal thread inspection probe
JP5078583B2 (en) * 2007-12-10 2012-11-21 インターナショナル・ビジネス・マシーンズ・コーポレーション Macro inspection device and macro inspection method
JP5175605B2 (en) * 2008-04-18 2013-04-03 株式会社日立ハイテクノロジーズ Pattern shape inspection method
KR101018151B1 (en) * 2009-02-06 2011-02-28 삼성전기주식회사 Surface measurement apparatus and method of surface measurement
JP2011075310A (en) * 2009-09-29 2011-04-14 Toppan Printing Co Ltd Method and apparatus for inspecting unevenness

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5363187A (en) * 1990-09-12 1994-11-08 Nikon Corporation Light scanning apparatus for detecting foreign particles on surface having circuit pattern
US5252836A (en) * 1991-03-07 1993-10-12 U.S. Natural Resources, Inc. Reflective grain defect scanning
US5936254A (en) * 1997-03-11 1999-08-10 Nikon Research Corporation Of America Thin film detection method and apparatus
JP3832028B2 (en) * 1997-06-06 2006-10-11 株式会社ニコン Substrate defect inspection apparatus and defect inspection method
JPH11281585A (en) * 1998-03-26 1999-10-15 Nikon Corp Method and apparatus for inspection
JP4470239B2 (en) * 1999-07-29 2010-06-02 株式会社ニコン Defect detection method and apparatus
TW500920B (en) * 2000-03-24 2002-09-01 Olympus Optical Co Defect detecting apparatus
JP2002139451A (en) * 2000-08-04 2002-05-17 Nikon Corp Surface inspection apparatus

Also Published As

Publication number Publication date
JP3699958B2 (en) 2005-09-28
WO2002027305A1 (en) 2002-04-04
KR20030027060A (en) 2003-04-03
US20030178588A1 (en) 2003-09-25
JPWO2002027305A1 (en) 2004-02-05
US6753542B2 (en) 2004-06-22
KR100705983B1 (en) 2007-04-11
TWI285738B (en) 2007-08-21

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