AU2001280558A1 - Absorbing compounds for spin-on glass anti-reflective coatings for photolithography - Google Patents

Absorbing compounds for spin-on glass anti-reflective coatings for photolithography

Info

Publication number
AU2001280558A1
AU2001280558A1 AU2001280558A AU8055801A AU2001280558A1 AU 2001280558 A1 AU2001280558 A1 AU 2001280558A1 AU 2001280558 A AU2001280558 A AU 2001280558A AU 8055801 A AU8055801 A AU 8055801A AU 2001280558 A1 AU2001280558 A1 AU 2001280558A1
Authority
AU
Australia
Prior art keywords
photolithography
spin
reflective coatings
absorbing compounds
glass anti
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001280558A
Inventor
Teresa Baldwin
James Drage
Mary Richey
Richard Spear
Hui-Jung Wu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Honeywell International Inc
Original Assignee
Honeywell International Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Honeywell International Inc filed Critical Honeywell International Inc
Publication of AU2001280558A1 publication Critical patent/AU2001280558A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/42—Block-or graft-polymers containing polysiloxane sequences
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/28—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material
    • C03C17/30—Surface treatment of glass, not in the form of fibres or filaments, by coating with organic material with silicon-containing compounds
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic System
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane
AU2001280558A 2000-07-17 2001-07-12 Absorbing compounds for spin-on glass anti-reflective coatings for photolithography Abandoned AU2001280558A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09617365 2000-07-17
US09/617,365 US6368400B1 (en) 2000-07-17 2000-07-17 Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
PCT/US2001/022232 WO2002006402A1 (en) 2000-07-17 2001-07-12 Absorbing compounds for spin-on glass anti-reflective coatings for photolithography

Publications (1)

Publication Number Publication Date
AU2001280558A1 true AU2001280558A1 (en) 2002-01-30

Family

ID=24473372

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001280558A Abandoned AU2001280558A1 (en) 2000-07-17 2001-07-12 Absorbing compounds for spin-on glass anti-reflective coatings for photolithography

Country Status (9)

Country Link
US (3) US6368400B1 (en)
EP (1) EP1301569A4 (en)
JP (1) JP2004504328A (en)
KR (1) KR100804870B1 (en)
CN (1) CN1296435C (en)
AU (1) AU2001280558A1 (en)
CA (1) CA2413726C (en)
TW (2) TWI238174B (en)
WO (1) WO2002006402A1 (en)

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Also Published As

Publication number Publication date
TW200512257A (en) 2005-04-01
TWI238174B (en) 2005-08-21
WO2002006402A1 (en) 2002-01-24
CA2413726C (en) 2005-11-29
CN1443218A (en) 2003-09-17
US20030199659A1 (en) 2003-10-23
CN1296435C (en) 2007-01-24
KR100804870B1 (en) 2008-02-20
US6605362B2 (en) 2003-08-12
KR20030031120A (en) 2003-04-18
US20020068181A1 (en) 2002-06-06
US6914114B2 (en) 2005-07-05
CA2413726A1 (en) 2002-01-24
EP1301569A1 (en) 2003-04-16
JP2004504328A (en) 2004-02-12
EP1301569A4 (en) 2007-08-29
US6368400B1 (en) 2002-04-09

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