AU2001276820A1 - Discharge laser having electrodes with sputter cavities and discharge peaks - Google Patents

Discharge laser having electrodes with sputter cavities and discharge peaks

Info

Publication number
AU2001276820A1
AU2001276820A1 AU2001276820A AU7682001A AU2001276820A1 AU 2001276820 A1 AU2001276820 A1 AU 2001276820A1 AU 2001276820 A AU2001276820 A AU 2001276820A AU 7682001 A AU7682001 A AU 7682001A AU 2001276820 A1 AU2001276820 A1 AU 2001276820A1
Authority
AU
Australia
Prior art keywords
discharge
electrodes
peaks
laser
sputter
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001276820A
Inventor
Zsolt Bor
Richard G. Morton
Eckehard D. Onkels
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Cymer Inc
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of AU2001276820A1 publication Critical patent/AU2001276820A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0385—Shape
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
AU2001276820A 2000-06-09 2001-04-27 Discharge laser having electrodes with sputter cavities and discharge peaks Abandoned AU2001276820A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/590,958 US6560263B1 (en) 2000-06-09 2000-06-09 Discharge laser having electrodes with sputter cavities and discharge peaks
US09590958 2000-06-09
PCT/US2001/013673 WO2001097346A1 (en) 2000-06-09 2001-04-27 Discharge laser having electrodes with sputter cavities and discharge peaks

Publications (1)

Publication Number Publication Date
AU2001276820A1 true AU2001276820A1 (en) 2001-12-24

Family

ID=24364430

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001276820A Abandoned AU2001276820A1 (en) 2000-06-09 2001-04-27 Discharge laser having electrodes with sputter cavities and discharge peaks

Country Status (4)

Country Link
US (1) US6560263B1 (en)
JP (1) JP3930704B2 (en)
AU (1) AU2001276820A1 (en)
WO (1) WO2001097346A1 (en)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7230965B2 (en) * 2001-02-01 2007-06-12 Cymer, Inc. Anodes for fluorine gas discharge lasers
US6810061B2 (en) 2001-08-27 2004-10-26 Komatsu Ltd. Discharge electrode and discharge electrode manufacturing method
DE10306066B4 (en) * 2002-02-20 2004-07-29 Tuilaser Ag Electrode for a gas laser
US6879616B2 (en) * 2003-01-24 2005-04-12 Trumpf, Inc. Diffusion-cooled laser system
US20050002427A1 (en) * 2003-05-28 2005-01-06 Igor Bragin Cooled electrodes for high repetition excimer or molecular fluorine lasers
US7999915B2 (en) * 2005-11-01 2011-08-16 Cymer, Inc. Laser system
US7778302B2 (en) * 2005-11-01 2010-08-17 Cymer, Inc. Laser system
US7630424B2 (en) * 2005-11-01 2009-12-08 Cymer, Inc. Laser system
JP5506194B2 (en) * 2005-11-01 2014-05-28 サイマー インコーポレイテッド Laser system
US7746913B2 (en) 2005-11-01 2010-06-29 Cymer, Inc. Laser system
US7920616B2 (en) * 2005-11-01 2011-04-05 Cymer, Inc. Laser system
US7885309B2 (en) 2005-11-01 2011-02-08 Cymer, Inc. Laser system
US7643529B2 (en) 2005-11-01 2010-01-05 Cymer, Inc. Laser system
US7715459B2 (en) * 2005-11-01 2010-05-11 Cymer, Inc. Laser system
US20090296755A1 (en) * 2005-11-01 2009-12-03 Cymer, Inc. Laser system
US7804879B2 (en) * 2006-05-23 2010-09-28 Coherent, Inc. Gas laser electrodes shaped in the longitudinal axis
US7756184B2 (en) * 2007-02-27 2010-07-13 Coherent, Inc. Electrodes for generating a stable discharge in gas laser system
US20150273600A1 (en) * 2012-10-25 2015-10-01 Applied Materials, Inc. Electro discharge machining system and method of operation thereof
US11777271B2 (en) 2017-10-24 2023-10-03 Cymer, Llc Method of and apparatus for extending electrode life in a laser chamber
WO2023048931A1 (en) * 2021-09-23 2023-03-30 Cymer, Llc Electrode with engineered surface for improved energy performance

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4245194A (en) 1979-07-16 1981-01-13 Gte Products Corporation Compact pulsed gas transport laser
DE2952046C2 (en) 1979-12-22 1982-04-15 Deutsche Forschungs- und Versuchsanstalt für Luft- und Raumfahrt e.V., 5300 Bonn Method and device for generating an electrical discharge in a gas flowing at supersonic speed
IT1148956B (en) 1982-06-15 1986-12-03 Selenia Industire Elettroniche PULSING GAS LASERS IN SEALED STRUCTURE
US4774714A (en) 1983-05-19 1988-09-27 Laser Science, Inc. Laser system with interchangeable modules and method for interchanging such modules
US4686682A (en) 1984-10-09 1987-08-11 Mitsubishi Denki Kabushiki Kaisha Discharge excitation type short pulse laser device
NO853264L (en) 1984-10-15 1986-04-16 Siemens Ag TRANSVERSAL EXCITED GAS WELDING AND PROCEDURE FOR ITS OPERATION.
US4876693A (en) 1984-12-26 1989-10-24 Hughes Aircraft Company Integrated laser head and low inductance pulse forming circuit for pulsed gas lasers
US4959840A (en) 1988-01-15 1990-09-25 Cymer Laser Technologies Compact excimer laser including an electrode mounted in insulating relationship to wall of the laser
IT1231783B (en) 1989-05-12 1992-01-14 Enea LASER HEAD FOR TRANSVERSE DISCHARGE EXCITATION WITH THREE ELECTRODES
JPH04218985A (en) * 1990-07-06 1992-08-10 Mitsubishi Electric Corp Excimer laser device
US5557629A (en) 1992-08-28 1996-09-17 Kabushiki Kaisha Komatsu Seisakusho Laser device having an electrode with auxiliary conductor members
US5771258A (en) 1997-02-11 1998-06-23 Cymer, Inc. Aerodynamic chamber design for high pulse repetition rate excimer lasers
DE19750320C1 (en) 1997-11-13 1999-04-01 Max Planck Gesellschaft Light pulse amplification method
US6208675B1 (en) * 1998-08-27 2001-03-27 Cymer, Inc. Blower assembly for a pulsed laser system incorporating ceramic bearings

Also Published As

Publication number Publication date
JP2002057386A (en) 2002-02-22
JP3930704B2 (en) 2007-06-13
US6560263B1 (en) 2003-05-06
WO2001097346A1 (en) 2001-12-20

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