AU2001271949A1 - Wafer container washing apparatus - Google Patents

Wafer container washing apparatus

Info

Publication number
AU2001271949A1
AU2001271949A1 AU2001271949A AU7194901A AU2001271949A1 AU 2001271949 A1 AU2001271949 A1 AU 2001271949A1 AU 2001271949 A AU2001271949 A AU 2001271949A AU 7194901 A AU7194901 A AU 7194901A AU 2001271949 A1 AU2001271949 A1 AU 2001271949A1
Authority
AU
Australia
Prior art keywords
washing apparatus
wafer container
container washing
wafer
washing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001271949A
Inventor
David L. Halbmaier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fluoroware Inc
Original Assignee
Fluoroware Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fluoroware Inc filed Critical Fluoroware Inc
Publication of AU2001271949A1 publication Critical patent/AU2001271949A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/02—Cleaning by the force of jets or sprays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto 
    • B08B9/08—Cleaning containers, e.g. tanks
    • B08B9/093—Cleaning containers, e.g. tanks by the force of jets or sprays
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer
AU2001271949A 2000-07-07 2001-07-09 Wafer container washing apparatus Abandoned AU2001271949A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US21687300P 2000-07-07 2000-07-07
US60216873 2000-07-07
US09884450 2001-06-18
US09/884,450 US6926017B2 (en) 1998-01-09 2001-06-18 Wafer container washing apparatus
PCT/US2001/021679 WO2002005316A2 (en) 2000-07-07 2001-07-09 Wafer container washing apparatus

Publications (1)

Publication Number Publication Date
AU2001271949A1 true AU2001271949A1 (en) 2002-01-21

Family

ID=26911408

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001271949A Abandoned AU2001271949A1 (en) 2000-07-07 2001-07-09 Wafer container washing apparatus

Country Status (7)

Country Link
US (1) US6926017B2 (en)
EP (1) EP1332008A2 (en)
JP (1) JP2004503105A (en)
KR (1) KR20030026313A (en)
CN (1) CN1452522A (en)
AU (1) AU2001271949A1 (en)
WO (1) WO2002005316A2 (en)

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US7021323B1 (en) * 2000-06-01 2006-04-04 Dainichi Shoji Kabushiki Kaisha Dust-incompatible article transfer container cleaner
CN1324647C (en) * 2003-04-29 2007-07-04 力晶半导体股份有限公司 A contamination sampling process inside carrier of semiconductor wafer
US20050233926A1 (en) * 2004-04-05 2005-10-20 Quantum Global Technologies, Llc Etchants for removing titanium contaminant species from titanium substrates
CN101024225B (en) * 2006-02-17 2011-06-22 鸿富锦精密工业（深圳）有限公司 Washing fixture and washing method
WO2009079636A2 (en) * 2007-12-18 2009-06-25 Entegris, Inc. Methods and apparatuses for controlling contamination of substrates
DE602009001114D1 (en) * 2008-01-25 2011-06-09 Mitsubishi Materials Corp Reactor cleaning device
US20090200250A1 (en) * 2008-02-07 2009-08-13 Multimetrixs, Llc Cleanliness-improved wafer container
US20090208669A1 (en) * 2008-02-15 2009-08-20 Multimetrixs. Llc Apparatus and method for application of a thin barrier layer onto inner surfaces of wafer containers
DE102008019456B4 (en) * 2008-04-18 2019-09-26 Ecoclean Gmbh Cleaning device and method for cleaning a workpiece
US9514972B2 (en) * 2008-05-28 2016-12-06 Air Products And Chemicals, Inc. Fixture drying apparatus and method
KR100974801B1 (en) * 2008-10-21 2010-08-06 주식회사 실트론 Tray for wafer shipping box cleaner and methods for drying the box using the tray
KR101022014B1 (en) * 2010-05-18 2011-03-16 (주) 디바이스이엔지 Cleaner for wafer container
CN103170469B (en) * 2011-12-22 2016-02-03 中芯国际集成电路制造(上海)有限公司 For cleaning the device and method with dry wafer cassette
CN102825042B (en) * 2012-08-15 2015-03-25 王曙光 Full-automatic multifunctional cleaning machine
JP5943519B2 (en) * 2012-09-20 2016-07-05 ヒューグルエレクトロニクス株式会社 Substrate case cleaning device
KR20150057379A (en) * 2013-11-19 2015-05-28 삼성디스플레이 주식회사 Apparatus of cleaning substrate
CN106040688A (en) * 2016-06-29 2016-10-26 昆山国显光电有限公司 Cartridge cleaning equipment
TWI674930B (en) * 2017-04-18 2019-10-21 韓商Ｓｔｉ股份有限公司 Apparatus for cleaning container
KR102538284B1 (en) * 2018-07-06 2023-05-30 쉘백 세미컨덕터 테크놀러지, 엘엘씨 Systems and methods for spray metering devices
CN109570126B (en) * 2018-12-27 2021-06-22 北京半导体专用设备研究所（中国电子科技集团公司第四十五研究所） Single-piece cleaning device for multistage medicine recovery
JP6875447B2 (en) * 2019-04-15 2021-05-26 株式会社スギノマシン How to operate the pump device and pump
DE202020103979U1 (en) 2020-07-09 2021-10-12 Carl Freudenberg Kg Anti-viral filter medium
DE102020129469A1 (en) * 2020-11-09 2022-05-12 PACE-Tec GmbH Device for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for EUV lithography masks
KR102593653B1 (en) * 2020-11-16 2023-10-26 (주)에스티아이 Pod cleaning device
US20220280982A1 (en) * 2021-03-02 2022-09-08 Mazor Robotics Ltd. Tool cleaning station
CN113695272A (en) * 2021-08-13 2021-11-26 江苏中科晶元信息材料有限公司 Process for repairing Wafer packaging box
WO2023213457A1 (en) 2022-05-06 2023-11-09 Gsec German Semiconductor Equipment Company Gmbh Device for cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for euv lithography masks
DE102022122723A1 (en) 2022-05-06 2023-11-09 Gsec German Semiconductor Equipment Company Gmbh Device and method for drying and/or cleaning cup-shaped hollow bodies, in particular transport containers for semiconductor wafers or for EUV lithography masks
WO2023213456A1 (en) 2022-05-06 2023-11-09 Gsec German Semiconductor Equipment Company Gmbh Device and method for drying and/or cleaning pot-shaped hollow bodies, in particular transport containers for semiconductor wafers or for euv lithography masks
DE102022116177A1 (en) 2022-06-29 2024-01-04 Gsec German Semiconductor Equipment Company Gmbh Device for cleaning cup-shaped hollow bodies, in particular transport containers for semiconductor wafers or lithography masks
KR102582532B1 (en) * 2023-01-31 2023-09-26 주식회사 위드텍 Wafer sampling solution retrieving and cleaning system and wafer sampling solution retrieving and cleaning method using the same

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US1799525A (en) 1928-08-15 1931-04-07 Armenl Company Jar washer
US2788008A (en) 1954-06-10 1957-04-09 Laval Separator Co De Method and apparatus for washing discs
US3073325A (en) 1960-02-23 1963-01-15 Rebizzo Victor Drum washer
US3092120A (en) 1960-04-01 1963-06-04 Harry B Hilger Washer for cups and the like
US3734109A (en) * 1971-03-08 1973-05-22 P Hebner Spray cleaning system
GB1498795A (en) 1974-03-21 1978-01-25 Jackson J Method and apparatus for cleaning containers
US4015615A (en) 1975-06-13 1977-04-05 International Business Machines Corporation Fluid application system
US4133340A (en) 1977-04-18 1979-01-09 Ballard Thomas B Cleaning machine for simultaneously cleaning the interior and exterior of hollow articles
JPS53136358A (en) * 1977-05-02 1978-11-28 Hitachi Ltd Draft device with shutters for preventing interference between treating liquid
US4381016A (en) 1981-07-07 1983-04-26 Douglas Robin S Cleaning fluid distribution head
US4437479A (en) 1981-12-30 1984-03-20 Atcor Decontamination apparatus for semiconductor wafer handling equipment
DE3815018A1 (en) 1987-05-06 1988-12-01 Dan Science Co CARRIER CLEANING AND DRYING DEVICE
US4785836A (en) 1987-07-17 1988-11-22 Soichiro Yamamoto Spray washer
US4957129A (en) * 1989-01-06 1990-09-18 George Koch Sons, Inc. Fluid removing apparatus
DE69017949D1 (en) 1989-05-17 1995-04-27 Fujitsu Ltd Method of manufacturing semiconductor devices.
US5238503A (en) 1991-04-09 1993-08-24 International Business Machines Corporation Device for decontaminating a semiconductor wafer container
US5137043A (en) 1991-05-02 1992-08-11 Wickham Iii Ward E Vehicle for cleaning intermediate bulk containers
US5363867A (en) 1992-01-21 1994-11-15 Shinko Electric Co., Ltd. Article storage house in a clean room
US5301700A (en) 1992-03-05 1994-04-12 Tokyo Electron Limited Washing system
US5313965A (en) * 1992-06-01 1994-05-24 Hughes Aircraft Company Continuous operation supercritical fluid treatment process and system
US5224503A (en) 1992-06-15 1993-07-06 Semitool, Inc. Centrifugal wafer carrier cleaning apparatus
JPH06134411A (en) * 1992-10-29 1994-05-17 Hisao Izumi Washing machine
US5409545A (en) 1993-03-04 1995-04-25 Environmental Sampling Supply, Inc. Apparatus and method for cleaning containers
US5616208A (en) 1993-09-17 1997-04-01 Tokyo Electron Limited Vacuum processing apparatus, vacuum processing method, and method for cleaning the vacuum processing apparatus
KR0144949B1 (en) 1994-07-26 1998-08-17 김광호 Wafer cassette and cleaning apparatus using it
US5522410A (en) 1994-12-22 1996-06-04 Meilleur; Michel Portable single-cup washer
US5603342A (en) 1995-06-29 1997-02-18 Coulter Corporation Apparatus for cleaning a fluid sample probe
DE19623766A1 (en) 1996-06-14 1997-12-18 Itt Ind Gmbh Deutsche Device for dry cleaning of dust-soiled auxiliary objects for the handling and storage of semiconductor wafers
JPH11274282A (en) 1998-03-23 1999-10-08 Toshiba Corp Substrate housing vessel, substrate housing vessel cleaner, substrate housing cleaning method and substrate treating apparatus
US6216710B1 (en) 1999-02-05 2001-04-17 Caterpillar Inc. Method and apparatus for removing quench oil from a permeable metal part
US6322633B1 (en) 1999-07-28 2001-11-27 Semitool, Inc. Wafer container cleaning system
US6276373B1 (en) 1999-12-16 2001-08-21 Bradley L. Gotfried Glass washer and chiller

Also Published As

Publication number Publication date
WO2002005316A3 (en) 2002-04-04
US20020046760A1 (en) 2002-04-25
KR20030026313A (en) 2003-03-31
CN1452522A (en) 2003-10-29
US6926017B2 (en) 2005-08-09
JP2004503105A (en) 2004-01-29
WO2002005316B1 (en) 2002-07-11
EP1332008A2 (en) 2003-08-06
WO2002005316A2 (en) 2002-01-17

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