AU2001271478A1 - Lithographic plate having a conformal radiation-sensitive layer on a rough substrate - Google Patents
Lithographic plate having a conformal radiation-sensitive layer on a rough substrateInfo
- Publication number
- AU2001271478A1 AU2001271478A1 AU2001271478A AU7147801A AU2001271478A1 AU 2001271478 A1 AU2001271478 A1 AU 2001271478A1 AU 2001271478 A AU2001271478 A AU 2001271478A AU 7147801 A AU7147801 A AU 7147801A AU 2001271478 A1 AU2001271478 A1 AU 2001271478A1
- Authority
- AU
- Australia
- Prior art keywords
- sensitive layer
- lithographic plate
- conformal radiation
- rough substrate
- rough
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
- B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
- B41C1/1033—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials by laser or spark ablation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
- B41C1/00—Forme preparation
- B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- General Physics & Mathematics (AREA)
- Printing Plates And Materials Therefor (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09605018 | 2000-06-28 | ||
US09/605,018 US6242156B1 (en) | 2000-06-28 | 2000-06-28 | Lithographic plate having a conformal radiation-sensitive layer on a rough substrate |
PCT/US2001/020305 WO2002001291A1 (en) | 2000-06-28 | 2001-06-26 | Lithographic plate having a conformal radiation-sensitive layer on a rough substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001271478A1 true AU2001271478A1 (en) | 2002-01-08 |
Family
ID=24421928
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001271478A Abandoned AU2001271478A1 (en) | 2000-06-28 | 2001-06-26 | Lithographic plate having a conformal radiation-sensitive layer on a rough substrate |
Country Status (3)
Country | Link |
---|---|
US (1) | US6242156B1 (en) |
AU (1) | AU2001271478A1 (en) |
WO (1) | WO2002001291A1 (en) |
Families Citing this family (58)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6558875B1 (en) * | 1999-07-27 | 2003-05-06 | Mitsubishi Chemical Corporation | Method for treating photosensitive lithographic printing plate |
US6361923B1 (en) * | 1999-08-17 | 2002-03-26 | International Business Machines Corporation | Laser ablatable material and its use |
JP2001166459A (en) * | 1999-12-06 | 2001-06-22 | Fuji Photo Film Co Ltd | Heat sensitive planographic printing original plate |
US6740464B2 (en) * | 2000-01-14 | 2004-05-25 | Fuji Photo Film Co., Ltd. | Lithographic printing plate precursor |
US6378432B1 (en) | 2000-05-03 | 2002-04-30 | Presstek, Inc. | Lithographic imaging with metal-based, non-ablative wet printing members |
CN1192906C (en) * | 2000-06-09 | 2005-03-16 | 富士胶片株式会社 | Printing plate support for lithographic printing and producing method thereof |
JP2002072462A (en) * | 2000-08-25 | 2002-03-12 | Fuji Photo Film Co Ltd | Original plate of planographic printing plate and photomechanical process for the same |
US6482571B1 (en) * | 2000-09-06 | 2002-11-19 | Gary Ganghui Teng | On-press development of thermosensitive lithographic plates |
US7089856B2 (en) | 2000-09-06 | 2006-08-15 | Gary Ganghui Teng | On-press development of thermosensitive lithographic printing member |
US6576401B2 (en) | 2001-09-14 | 2003-06-10 | Gary Ganghui Teng | On-press developable thermosensitive lithographic plates utilizing an onium or borate salt initiator |
US6548222B2 (en) | 2000-09-06 | 2003-04-15 | Gary Ganghui Teng | On-press developable thermosensitive lithographic printing plates |
US6495310B2 (en) | 2000-10-30 | 2002-12-17 | Gary Ganghui Teng | Lithographic plate having conformal overcoat and photosensitive layer on a rough substrate |
CA2407773C (en) | 2001-03-01 | 2007-05-22 | Presstek, Inc. | Lithographic imaging with printing members having multiphase laser-responsive layers |
US7592128B2 (en) * | 2001-04-04 | 2009-09-22 | Eastman Kodak Company | On-press developable negative-working imageable elements |
US6846614B2 (en) | 2002-02-04 | 2005-01-25 | Kodak Polychrome Graphics Llc | On-press developable IR sensitive printing plates |
US6723493B2 (en) | 2001-06-04 | 2004-04-20 | Gary Ganghui Teng | Negative lithographic printing plate comprising a specific compound in the photosensitive layer |
US6610458B2 (en) * | 2001-07-23 | 2003-08-26 | Kodak Polychrome Graphics Llc | Method and system for direct-to-press imaging |
US7056639B2 (en) * | 2001-08-21 | 2006-06-06 | Eastman Kodak Company | Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid |
US7659046B2 (en) * | 2002-04-10 | 2010-02-09 | Eastman Kodak Company | Water-developable infrared-sensitive printing plate |
JP3901565B2 (en) * | 2002-04-15 | 2007-04-04 | 富士フイルム株式会社 | Heat sensitive planographic printing plate |
US6566039B1 (en) * | 2002-06-04 | 2003-05-20 | Gary Ganghui Teng | Variable data lithographic printing device and method |
US7108956B2 (en) * | 2002-07-03 | 2006-09-19 | Fuji Photo Film Co., Ltd. | Thermosensitive lithographic printing plate |
US6902865B2 (en) | 2002-07-22 | 2005-06-07 | Gary Ganghui Teng | Non-alkaline aqueous development of thermosensitive lithographic printing plates |
EP1546811B1 (en) * | 2002-08-07 | 2008-04-09 | VIM Technologies Ltd. | Lithographic printing members and a method and a system for preparation of lithographic printing members |
DE60304528T2 (en) * | 2002-09-19 | 2006-12-07 | Fuji Photo Film Co., Ltd., Minami-Ashigara | Lithographic printing plate precursor |
JP3707481B2 (en) * | 2002-10-15 | 2005-10-19 | セイコーエプソン株式会社 | Manufacturing method of semiconductor device |
US7296884B2 (en) * | 2002-10-29 | 2007-11-20 | Hewlett-Packard Development Company, L.P. | Microwave curable inks for inkjet printing |
US6912956B2 (en) * | 2002-11-01 | 2005-07-05 | Konica Minolta Holdings, Inc. | Printing plate material |
US7230636B2 (en) * | 2003-03-10 | 2007-06-12 | Dainippon Screen Mfg. Co., Ltd. | Image recording apparatus with jet and suction |
CA2522551C (en) * | 2003-04-16 | 2009-12-22 | Digimarc Corporation | Three dimensional data storage |
CN100573318C (en) * | 2003-09-17 | 2009-12-23 | 富士胶片株式会社 | Photosensitive planographic plate and preparation method thereof |
WO2005058605A1 (en) | 2003-12-18 | 2005-06-30 | Agfa-Gevaert | Positive-working lithographic printing plate precursor |
US7247564B2 (en) * | 2004-06-28 | 2007-07-24 | Hewlett-Packard Development Company, L.P. | Electronic device |
JP2006062322A (en) * | 2004-08-30 | 2006-03-09 | Fuji Photo Film Co Ltd | Original plate for planographic printing plate, stacked body thereof, and plate making method |
GB2418628B (en) * | 2004-10-01 | 2006-12-13 | Acktar Ltd | Improved laminates and the manufacture thereof |
JP4473715B2 (en) * | 2004-11-29 | 2010-06-02 | 富士通株式会社 | LAMINATE CUTTING METHOD AND LAMINATE |
DE602006003856D1 (en) * | 2006-02-28 | 2009-01-08 | Agfa Graphics Nv | Method for producing a lithographic printing plate support |
EP1826021B1 (en) | 2006-02-28 | 2009-01-14 | Agfa Graphics N.V. | Positive working lithographic printing plates |
ATE441534T1 (en) | 2007-03-19 | 2009-09-15 | Agfa Graphics Nv | METHOD FOR PRODUCING A LITHOGRAPHIC PRINTING PLATE SUPPORT |
US20080305435A1 (en) * | 2007-06-05 | 2008-12-11 | Yasushi Miyamoto | Method of making lithographic printing plate substrate and imageable elements |
US20080311520A1 (en) * | 2007-06-13 | 2008-12-18 | Jianfei Yu | On-press developable negative-working imageable elements and methods of use |
US7795559B2 (en) * | 2007-10-26 | 2010-09-14 | Anvik Corporation | Vacuum debris removal system |
EP2254727A2 (en) * | 2008-02-18 | 2010-12-01 | The Technical University of Denmark (DTU) | Method of thermocleaving a polymer layer |
US20110188023A1 (en) | 2010-02-01 | 2011-08-04 | Presstek, Inc. | Lithographic imaging and printing without defects of electrostatic origin |
US8621749B2 (en) | 2010-03-12 | 2014-01-07 | Taiwan Green Point Enterprises Co., Ltd | Non-deleterious technique for creating continuous conductive circuits |
US8952919B2 (en) | 2011-02-25 | 2015-02-10 | Taiwan Green Point Enterprises Co., Ltd. | Capacitive touch sensitive housing and method for making the same |
US20120273261A1 (en) | 2010-10-20 | 2012-11-01 | Taiwan Green Point Enterprises Co., Ltd. | Circuit substrate having a circuit pattern and method for making the same |
US8557504B2 (en) * | 2010-06-18 | 2013-10-15 | Eastman Kodak Company | Thermally ablatable lithographic printing plate precursors |
US20120189770A1 (en) * | 2011-01-20 | 2012-07-26 | Moshe Nakash | Preparing lithographic printing plates by ablation imaging |
JP5889568B2 (en) | 2011-08-11 | 2016-03-22 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | Composition for forming tungsten oxide film and method for producing tungsten oxide film using the same |
US9315636B2 (en) | 2012-12-07 | 2016-04-19 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds, their compositions and methods |
US9201305B2 (en) | 2013-06-28 | 2015-12-01 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin-on compositions of soluble metal oxide carboxylates and methods of their use |
US9296922B2 (en) | 2013-08-30 | 2016-03-29 | Az Electronic Materials (Luxembourg) S.A.R.L. | Stable metal compounds as hardmasks and filling materials, their compositions and methods of use |
US9409793B2 (en) | 2014-01-14 | 2016-08-09 | Az Electronic Materials (Luxembourg) S.A.R.L. | Spin coatable metallic hard mask compositions and processes thereof |
US9418836B2 (en) | 2014-01-14 | 2016-08-16 | Az Electronic Materials (Luxembourg) S.A.R.L. | Polyoxometalate and heteropolyoxometalate compositions and methods for their use |
US10696081B2 (en) * | 2015-08-26 | 2020-06-30 | Lg Chem, Ltd. | Method for manufacturing cliché for offset printing, and cliché for offset printing |
US9779932B2 (en) * | 2015-12-11 | 2017-10-03 | Suss Microtec Photonic Systems Inc. | Sacrificial layer for post-laser debris removal systems |
CN111051570B (en) | 2017-09-06 | 2022-05-10 | 默克专利股份有限公司 | Spin-on inorganic oxide containing compositions and fill materials having improved thermal stability useful as hard masks |
Family Cites Families (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3511661A (en) | 1966-07-01 | 1970-05-12 | Eastman Kodak Co | Lithographic printing plate |
US4054094A (en) | 1972-08-25 | 1977-10-18 | E. I. Du Pont De Nemours And Company | Laser production of lithographic printing plates |
US3975197A (en) * | 1973-02-12 | 1976-08-17 | Minnesota Mining And Manufacturing Company | Coated aluminum substrates |
JPS5628893A (en) * | 1979-08-16 | 1981-03-23 | Fuji Photo Film Co Ltd | Carrier for lithography plate and manufacture of said carrier |
JPS589146A (en) | 1981-07-09 | 1983-01-19 | Nippon Paint Co Ltd | Plate meterial for lithography requiring no water |
DE3305067A1 (en) * | 1983-02-14 | 1984-08-16 | Hoechst Ag, 6230 Frankfurt | PLATE, FILM OR TAPE-SHAPED MATERIAL FROM MECHANICAL AND ELECTROCHEMICALLY Roughened ALUMINUM, A METHOD FOR THE PRODUCTION THEREOF AND ITS USE AS A CARRIER FOR OFFSET PRINTING PLATES |
US5187046A (en) * | 1991-03-18 | 1993-02-16 | Aluminum Company Of America | Arc-grained lithoplate |
US5258263A (en) | 1991-09-10 | 1993-11-02 | Polaroid Corporation | Printing plate and methods of making and use same |
US5516620A (en) | 1993-11-01 | 1996-05-14 | Polaroid Corporation | Method of on-press developing lithographic plates utilizing microencapsulated developers |
JPH07281423A (en) * | 1994-04-07 | 1995-10-27 | Konica Corp | Plate making method of printing plate |
WO1996002021A1 (en) | 1994-07-11 | 1996-01-25 | Konica Corporation | Original form for lithographic plate and process for preparing lithographic plate |
US5677108A (en) * | 1995-04-28 | 1997-10-14 | Polaroid Corporation | On-press removable quenching overcoat for lithographic plates |
US5728503A (en) * | 1995-12-04 | 1998-03-17 | Bayer Corporation | Lithographic printing plates having specific grained and anodized aluminum substrate |
US5879861A (en) * | 1996-04-23 | 1999-03-09 | Agfa-Gevaert, N.V. | Method for making a lithographic printing plate wherein an imaging element is used that comprises a thermosensitive mask |
US5922502A (en) | 1996-04-23 | 1999-07-13 | Agfa-Gevaert, N.V. | Imaging element for making a lithographic printing plate wherein that imaging element comprises a thermosensitive mask |
AU2561099A (en) * | 1998-01-23 | 1999-08-09 | Presstek, Inc. | Laser-imageable printing members and methods for wet lithographic printing |
US6014929A (en) | 1998-03-09 | 2000-01-18 | Teng; Gary Ganghui | Lithographic printing plates having a thin releasable interlayer overlying a rough substrate |
US6071675A (en) | 1999-06-05 | 2000-06-06 | Teng; Gary Ganghui | On-press development of a lithographic plate comprising dispersed solid particles |
-
2000
- 2000-06-28 US US09/605,018 patent/US6242156B1/en not_active Expired - Lifetime
-
2001
- 2001-06-26 WO PCT/US2001/020305 patent/WO2002001291A1/en active Application Filing
- 2001-06-26 AU AU2001271478A patent/AU2001271478A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
US6242156B1 (en) | 2001-06-05 |
WO2002001291A1 (en) | 2002-01-03 |
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