AU2001271478A1 - Lithographic plate having a conformal radiation-sensitive layer on a rough substrate - Google Patents

Lithographic plate having a conformal radiation-sensitive layer on a rough substrate

Info

Publication number
AU2001271478A1
AU2001271478A1 AU2001271478A AU7147801A AU2001271478A1 AU 2001271478 A1 AU2001271478 A1 AU 2001271478A1 AU 2001271478 A AU2001271478 A AU 2001271478A AU 7147801 A AU7147801 A AU 7147801A AU 2001271478 A1 AU2001271478 A1 AU 2001271478A1
Authority
AU
Australia
Prior art keywords
sensitive layer
lithographic plate
conformal radiation
rough substrate
rough
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001271478A
Inventor
Gary Ganghui Teng
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of AU2001271478A1 publication Critical patent/AU2001271478A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1033—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials by laser or spark ablation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
AU2001271478A 2000-06-28 2001-06-26 Lithographic plate having a conformal radiation-sensitive layer on a rough substrate Abandoned AU2001271478A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09605018 2000-06-28
US09/605,018 US6242156B1 (en) 2000-06-28 2000-06-28 Lithographic plate having a conformal radiation-sensitive layer on a rough substrate
PCT/US2001/020305 WO2002001291A1 (en) 2000-06-28 2001-06-26 Lithographic plate having a conformal radiation-sensitive layer on a rough substrate

Publications (1)

Publication Number Publication Date
AU2001271478A1 true AU2001271478A1 (en) 2002-01-08

Family

ID=24421928

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001271478A Abandoned AU2001271478A1 (en) 2000-06-28 2001-06-26 Lithographic plate having a conformal radiation-sensitive layer on a rough substrate

Country Status (3)

Country Link
US (1) US6242156B1 (en)
AU (1) AU2001271478A1 (en)
WO (1) WO2002001291A1 (en)

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US7089856B2 (en) 2000-09-06 2006-08-15 Gary Ganghui Teng On-press development of thermosensitive lithographic printing member
US6548222B2 (en) 2000-09-06 2003-04-15 Gary Ganghui Teng On-press developable thermosensitive lithographic printing plates
US6495310B2 (en) 2000-10-30 2002-12-17 Gary Ganghui Teng Lithographic plate having conformal overcoat and photosensitive layer on a rough substrate
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US7592128B2 (en) * 2001-04-04 2009-09-22 Eastman Kodak Company On-press developable negative-working imageable elements
US6846614B2 (en) 2002-02-04 2005-01-25 Kodak Polychrome Graphics Llc On-press developable IR sensitive printing plates
US6723493B2 (en) 2001-06-04 2004-04-20 Gary Ganghui Teng Negative lithographic printing plate comprising a specific compound in the photosensitive layer
US6610458B2 (en) * 2001-07-23 2003-08-26 Kodak Polychrome Graphics Llc Method and system for direct-to-press imaging
US7056639B2 (en) * 2001-08-21 2006-06-06 Eastman Kodak Company Imageable composition containing an infrared absorber with counter anion derived from a non-volatile acid
US7659046B2 (en) * 2002-04-10 2010-02-09 Eastman Kodak Company Water-developable infrared-sensitive printing plate
JP3901565B2 (en) * 2002-04-15 2007-04-04 富士フイルム株式会社 Heat sensitive planographic printing plate
US6566039B1 (en) * 2002-06-04 2003-05-20 Gary Ganghui Teng Variable data lithographic printing device and method
US7108956B2 (en) * 2002-07-03 2006-09-19 Fuji Photo Film Co., Ltd. Thermosensitive lithographic printing plate
US6902865B2 (en) 2002-07-22 2005-06-07 Gary Ganghui Teng Non-alkaline aqueous development of thermosensitive lithographic printing plates
AU2003249552A1 (en) * 2002-08-07 2004-02-25 Vim Technologies Ltd. Lithographic printing members and a method and a system for preparation of lithographic printing members
EP1400351B1 (en) * 2002-09-19 2006-04-12 Fuji Photo Film Co., Ltd. Lithographic printing plate precursor
JP3707481B2 (en) * 2002-10-15 2005-10-19 セイコーエプソン株式会社 Manufacturing method of semiconductor device
US7296884B2 (en) * 2002-10-29 2007-11-20 Hewlett-Packard Development Company, L.P. Microwave curable inks for inkjet printing
US6912956B2 (en) * 2002-11-01 2005-07-05 Konica Minolta Holdings, Inc. Printing plate material
US7230636B2 (en) * 2003-03-10 2007-06-12 Dainippon Screen Mfg. Co., Ltd. Image recording apparatus with jet and suction
DE602004030434D1 (en) * 2003-04-16 2011-01-20 L 1 Secure Credentialing Inc THREE-DIMENSIONAL DATA STORAGE
CN100573318C (en) 2003-09-17 2009-12-23 富士胶片株式会社 Photosensitive planographic plate and preparation method thereof
WO2005058605A1 (en) 2003-12-18 2005-06-30 Agfa-Gevaert Positive-working lithographic printing plate precursor
US7247564B2 (en) * 2004-06-28 2007-07-24 Hewlett-Packard Development Company, L.P. Electronic device
JP2006062322A (en) * 2004-08-30 2006-03-09 Fuji Photo Film Co Ltd Original plate for planographic printing plate, stacked body thereof, and plate making method
GB2418628B (en) * 2004-10-01 2006-12-13 Acktar Ltd Improved laminates and the manufacture thereof
JP4473715B2 (en) * 2004-11-29 2010-06-02 富士通株式会社 LAMINATE CUTTING METHOD AND LAMINATE
DE602006003856D1 (en) * 2006-02-28 2009-01-08 Agfa Graphics Nv Method for producing a lithographic printing plate support
EP1826021B1 (en) 2006-02-28 2009-01-14 Agfa Graphics N.V. Positive working lithographic printing plates
ATE441534T1 (en) 2007-03-19 2009-09-15 Agfa Graphics Nv METHOD FOR PRODUCING A LITHOGRAPHIC PRINTING PLATE SUPPORT
US20080305435A1 (en) * 2007-06-05 2008-12-11 Yasushi Miyamoto Method of making lithographic printing plate substrate and imageable elements
US20080311520A1 (en) * 2007-06-13 2008-12-18 Jianfei Yu On-press developable negative-working imageable elements and methods of use
US7795559B2 (en) * 2007-10-26 2010-09-14 Anvik Corporation Vacuum debris removal system
EP2254727A2 (en) * 2008-02-18 2010-12-01 The Technical University of Denmark (DTU) Method of thermocleaving a polymer layer
US20110188023A1 (en) * 2010-02-01 2011-08-04 Presstek, Inc. Lithographic imaging and printing without defects of electrostatic origin
US20120273261A1 (en) 2010-10-20 2012-11-01 Taiwan Green Point Enterprises Co., Ltd. Circuit substrate having a circuit pattern and method for making the same
US8621749B2 (en) 2010-03-12 2014-01-07 Taiwan Green Point Enterprises Co., Ltd Non-deleterious technique for creating continuous conductive circuits
US8952919B2 (en) 2011-02-25 2015-02-10 Taiwan Green Point Enterprises Co., Ltd. Capacitive touch sensitive housing and method for making the same
US8557504B2 (en) * 2010-06-18 2013-10-15 Eastman Kodak Company Thermally ablatable lithographic printing plate precursors
US20120189770A1 (en) * 2011-01-20 2012-07-26 Moshe Nakash Preparing lithographic printing plates by ablation imaging
JP5889568B2 (en) 2011-08-11 2016-03-22 メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングＭｅｒｃｋ Ｐａｔｅｎｔ ＧｍｂＨ Composition for forming tungsten oxide film and method for producing tungsten oxide film using the same
US9315636B2 (en) 2012-12-07 2016-04-19 Az Electronic Materials (Luxembourg) S.A.R.L. Stable metal compounds, their compositions and methods
US9201305B2 (en) * 2013-06-28 2015-12-01 Az Electronic Materials (Luxembourg) S.A.R.L. Spin-on compositions of soluble metal oxide carboxylates and methods of their use
US9296922B2 (en) 2013-08-30 2016-03-29 Az Electronic Materials (Luxembourg) S.A.R.L. Stable metal compounds as hardmasks and filling materials, their compositions and methods of use
US9409793B2 (en) 2014-01-14 2016-08-09 Az Electronic Materials (Luxembourg) S.A.R.L. Spin coatable metallic hard mask compositions and processes thereof
US9418836B2 (en) 2014-01-14 2016-08-16 Az Electronic Materials (Luxembourg) S.A.R.L. Polyoxometalate and heteropolyoxometalate compositions and methods for their use
JP6358488B2 (en) * 2015-08-26 2018-07-18 エルジー・ケム・リミテッド Method for producing offset printing cliché and offset printing cliché
US9779932B2 (en) * 2015-12-11 2017-10-03 Suss Microtec Photonic Systems Inc. Sacrificial layer for post-laser debris removal systems
WO2019048393A1 (en) 2017-09-06 2019-03-14 AZ Electronic Materials (Luxembourg) S.à.r.l. Spin-on inorganic oxide containing composition useful as hard masks and filling materials with improved thermal stability

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US5187046A (en) * 1991-03-18 1993-02-16 Aluminum Company Of America Arc-grained lithoplate
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JPH07281423A (en) * 1994-04-07 1995-10-27 Konica Corp Plate making method of printing plate
WO1996002021A1 (en) 1994-07-11 1996-01-25 Konica Corporation Original form for lithographic plate and process for preparing lithographic plate
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Also Published As

Publication number Publication date
WO2002001291A1 (en) 2002-01-03
US6242156B1 (en) 2001-06-05

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