AU2001268612A1 - Gas collector for epitaxial reactor - Google Patents

Gas collector for epitaxial reactor

Info

Publication number
AU2001268612A1
AU2001268612A1 AU2001268612A AU6861201A AU2001268612A1 AU 2001268612 A1 AU2001268612 A1 AU 2001268612A1 AU 2001268612 A AU2001268612 A AU 2001268612A AU 6861201 A AU6861201 A AU 6861201A AU 2001268612 A1 AU2001268612 A1 AU 2001268612A1
Authority
AU
Australia
Prior art keywords
gas collector
epitaxial reactor
epitaxial
reactor
collector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001268612A
Inventor
Khang V. Nguyen
Roger S. Sillmon
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ITT Manufacturing Enterprises LLC
Original Assignee
ITT Manufacturing Enterprises LLC
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ITT Manufacturing Enterprises LLC filed Critical ITT Manufacturing Enterprises LLC
Publication of AU2001268612A1 publication Critical patent/AU2001268612A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
AU2001268612A 2000-08-09 2001-06-21 Gas collector for epitaxial reactor Abandoned AU2001268612A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09635268 2000-08-09
US09/635,268 US6325855B1 (en) 2000-08-09 2000-08-09 Gas collector for epitaxial reactors
PCT/US2001/019722 WO2002012588A1 (en) 2000-08-09 2001-06-21 Gas collector for epitaxial reactor

Publications (1)

Publication Number Publication Date
AU2001268612A1 true AU2001268612A1 (en) 2002-02-18

Family

ID=24547109

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001268612A Abandoned AU2001268612A1 (en) 2000-08-09 2001-06-21 Gas collector for epitaxial reactor

Country Status (6)

Country Link
US (3) US6325855B1 (en)
JP (1) JP5124716B2 (en)
AU (1) AU2001268612A1 (en)
DE (1) DE10194628B4 (en)
TW (1) TWI265977B (en)
WO (1) WO2002012588A1 (en)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6803422B2 (en) * 1999-09-13 2004-10-12 Denki Kagaku Kogyo Kabushiki Kaisha Cross-copolymerized olefin/aromatic vinyl compound/diene copolymer and process for its production
US6666920B1 (en) * 2000-08-09 2003-12-23 Itt Manufacturing Enterprises, Inc. Gas collector for providing an even flow of gasses through a reaction chamber of an epitaxial reactor
US6325855B1 (en) * 2000-08-09 2001-12-04 Itt Manufacturing Enterprises, Inc. Gas collector for epitaxial reactors
US6716289B1 (en) * 2000-08-09 2004-04-06 Itt Manufacturing Enterprises, Inc. Rigid gas collector for providing an even flow of gasses
DE10043599A1 (en) * 2000-09-01 2002-03-14 Aixtron Ag Device for depositing, in particular, crystalline layers on one or more, in particular likewise, crystalline substrates
JP4659300B2 (en) * 2000-09-13 2011-03-30 浜松ホトニクス株式会社 Laser processing method and semiconductor chip manufacturing method
WO2002024985A1 (en) * 2000-09-22 2002-03-28 Aixtron Ag Gas inlet mechanism for cvd-method and device
US20030092278A1 (en) * 2001-11-13 2003-05-15 Fink Steven T. Plasma baffle assembly
TWI326626B (en) 2002-03-12 2010-07-01 Hamamatsu Photonics Kk Laser processing method
ATE534142T1 (en) 2002-03-12 2011-12-15 Hamamatsu Photonics Kk METHOD FOR SEPARATING A SUBSTRATE
EP2216128B1 (en) 2002-03-12 2016-01-27 Hamamatsu Photonics K.K. Method of cutting object to be processed
TWI520269B (en) 2002-12-03 2016-02-01 Hamamatsu Photonics Kk Cutting method of semiconductor substrate
US20050023260A1 (en) * 2003-01-10 2005-02-03 Shinya Takyu Semiconductor wafer dividing apparatus and semiconductor device manufacturing method
FR2852250B1 (en) 2003-03-11 2009-07-24 Jean Luc Jouvin PROTECTIVE SHEATH FOR CANNULA, AN INJECTION KIT COMPRISING SUCH ANKLE AND NEEDLE EQUIPPED WITH SUCH ANKLE
US8685838B2 (en) 2003-03-12 2014-04-01 Hamamatsu Photonics K.K. Laser beam machining method
JP4563097B2 (en) * 2003-09-10 2010-10-13 浜松ホトニクス株式会社 Semiconductor substrate cutting method
US7402678B2 (en) * 2004-12-17 2008-07-22 3M Innovative Properties Company Multifunctional amine capture agents
US9138913B2 (en) 2005-09-08 2015-09-22 Imra America, Inc. Transparent material processing with an ultrashort pulse laser
DE102006042280A1 (en) 2005-09-08 2007-06-06 IMRA America, Inc., Ann Arbor Transparent material scribing comprises using single scan of focused beam of ultrashort laser pulses to simultaneously create surface groove in material and modified region(s) within bulk of material
US8097120B2 (en) * 2006-02-21 2012-01-17 Lam Research Corporation Process tuning gas injection from the substrate edge
US8298338B2 (en) * 2007-12-26 2012-10-30 Samsung Electronics Co., Ltd. Chemical vapor deposition apparatus
KR101004822B1 (en) * 2008-04-18 2010-12-28 삼성엘이디 주식회사 Apparatus for chemical vapor deposition
KR100982987B1 (en) * 2008-04-18 2010-09-17 삼성엘이디 주식회사 Apparatus for chemical vapor deposition
KR200475462Y1 (en) * 2009-03-27 2014-12-03 램 리써치 코포레이션 Replaceable upper chamber section of plasma processing apparatus
WO2011031321A2 (en) * 2009-09-10 2011-03-17 Lam Research Corporation Replaceable upper chamber parts of plasma processing apparatus
US8163089B2 (en) 2009-12-16 2012-04-24 Primestar Solar, Inc. Vapor deposition apparatus and process for continuous deposition of a thin film layer on a substrate
US9234278B2 (en) * 2012-01-20 2016-01-12 Taiwan Semiconductor Manufacturing Co., Ltd. CVD conformal vacuum/pumping guiding design
KR20130115849A (en) * 2012-04-13 2013-10-22 삼성전자주식회사 Apparatus of fabricating semiconductor devices
KR102156795B1 (en) * 2013-05-15 2020-09-17 에이에스엠 아이피 홀딩 비.브이. Deposition apparatus
US11414759B2 (en) * 2013-11-29 2022-08-16 Taiwan Semiconductor Manufacturing Co., Ltd Mechanisms for supplying process gas into wafer process apparatus
JP5941491B2 (en) * 2014-03-26 2016-06-29 株式会社日立国際電気 Substrate processing apparatus, semiconductor device manufacturing method, and program
US20160033070A1 (en) * 2014-08-01 2016-02-04 Applied Materials, Inc. Recursive pumping member
CN114551206A (en) * 2015-12-04 2022-05-27 应用材料公司 Advanced coating method and material for preventing HDP-CVD chamber arcing
US10559451B2 (en) * 2017-02-15 2020-02-11 Applied Materials, Inc. Apparatus with concentric pumping for multiple pressure regimes
WO2020046567A1 (en) 2018-08-29 2020-03-05 Applied Materials, Inc. Chamber injector
CN112080733A (en) * 2019-06-14 2020-12-15 东泰高科装备科技有限公司 Tail gas discharging device and vacuum coating system

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1667036A1 (en) * 1967-01-02 1971-05-27 Bayer Ag Method and device for direct electrical heating of gases or gaseous substances
FR2628985B1 (en) * 1988-03-22 1990-12-28 Labo Electronique Physique EPITAXY REACTOR WITH WALL PROTECTION
FR2628984B1 (en) 1988-03-22 1990-12-28 Labo Electronique Physique PLANETARY EPITAXY REACTOR
FR2638020B1 (en) 1988-10-14 1990-12-28 Labo Electronique Physique EPITAXY REACTOR WITH IMPROVED GAS COLLECTOR
JP2745819B2 (en) * 1990-12-10 1998-04-28 日立電線株式会社 Vapor phase film growth equipment
JP2662365B2 (en) 1993-01-28 1997-10-08 アプライド マテリアルズ インコーポレイテッド Single-substrate vacuum processing apparatus with improved discharge system
US5441568A (en) * 1994-07-15 1995-08-15 Applied Materials, Inc. Exhaust baffle for uniform gas flow pattern
US5558717A (en) * 1994-11-30 1996-09-24 Applied Materials CVD Processing chamber
US5885356A (en) * 1994-11-30 1999-03-23 Applied Materials, Inc. Method of reducing residue accumulation in CVD chamber using ceramic lining
US5895530A (en) * 1996-02-26 1999-04-20 Applied Materials, Inc. Method and apparatus for directing fluid through a semiconductor processing chamber
US5846330A (en) 1997-06-26 1998-12-08 Celestech, Inc. Gas injection disc assembly for CVD applications
US6217937B1 (en) 1998-07-15 2001-04-17 Cornell Research Foundation, Inc. High throughput OMVPE apparatus
US6423949B1 (en) * 1999-05-19 2002-07-23 Applied Materials, Inc. Multi-zone resistive heater
US6530992B1 (en) * 1999-07-09 2003-03-11 Applied Materials, Inc. Method of forming a film in a chamber and positioning a substitute in a chamber
US6582522B2 (en) * 2000-07-21 2003-06-24 Applied Materials, Inc. Emissivity-change-free pumping plate kit in a single wafer chamber
US6325855B1 (en) * 2000-08-09 2001-12-04 Itt Manufacturing Enterprises, Inc. Gas collector for epitaxial reactors
DE50103530D1 (en) 2000-12-06 2004-10-14 Trepel Airport Equipment Gmbh roller unit

Also Published As

Publication number Publication date
JP5124716B2 (en) 2013-01-23
DE10194628T1 (en) 2003-07-03
US6478877B1 (en) 2002-11-12
US6676758B2 (en) 2004-01-13
WO2002012588A1 (en) 2002-02-14
DE10194628B4 (en) 2006-06-29
TWI265977B (en) 2006-11-11
US20020017244A1 (en) 2002-02-14
JP2004506316A (en) 2004-02-26
US6325855B1 (en) 2001-12-04

Similar Documents

Publication Publication Date Title
AU2001268612A1 (en) Gas collector for epitaxial reactor
AU6633401A (en) Gasket for fuel cell
AU2001223877A1 (en) Catalytic reactor
AU2763201A (en) System for hydrogen generation
AU2002230941A1 (en) Supported lattice for cell cultivation
AU2002226007A1 (en) Hydrogen gas indicator system
AU2001286793A1 (en) Process for generating hydrogen-rich gas
AU2002226882A1 (en) Improved cell carrier grids
AU2002215621A1 (en) Hydrogen recombination catalyst
AU2001225497A1 (en) Gas generator
AU2003276032A1 (en) Hydride vpe reactor
AU2001277257A1 (en) Hydrogen recombination catalyst
AU2001281460A1 (en) Gas generator
AU2001283875A1 (en) Sealing system for gas turbine
AU2001267921A1 (en) Fuel reforming reactor
AU2002217475A1 (en) Method for separating hydrogen gas
AU2001263053A1 (en) Autoignition for gas generators
AU2001275513A1 (en) Hydrogen gas generator
AU2001286192A1 (en) Gas generator
AU7135600A (en) Methanol process for natural gas conversion
AU4040700A (en) Hydride gas detecting tape
AU2001281854A1 (en) Hybrid solar collector
AU2001248738A1 (en) Gas generator
AUPP979099A0 (en) Ioniser for effluent gas
AU2001226639A1 (en) Gas analyser