AU2003276032A1 - Hydride vpe reactor - Google Patents

Hydride vpe reactor

Info

Publication number
AU2003276032A1
AU2003276032A1 AU2003276032A AU2003276032A AU2003276032A1 AU 2003276032 A1 AU2003276032 A1 AU 2003276032A1 AU 2003276032 A AU2003276032 A AU 2003276032A AU 2003276032 A AU2003276032 A AU 2003276032A AU 2003276032 A1 AU2003276032 A1 AU 2003276032A1
Authority
AU
Australia
Prior art keywords
hydride vpe
vpe reactor
reactor
hydride
vpe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003276032A
Inventor
Johannes Kappeler
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Aixtron SE
Original Assignee
Aixtron SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Aixtron SE filed Critical Aixtron SE
Publication of AU2003276032A1 publication Critical patent/AU2003276032A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/301—AIII BV compounds, where A is Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45563—Gas nozzles
    • C23C16/45574—Nozzles for more than one gas
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/08—Reaction chambers; Selection of materials therefor
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/14—Feed and outlet means for the gases; Modifying the flow of the reactive gases
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/40—AIIIBV compounds wherein A is B, Al, Ga, In or Tl and B is N, P, As, Sb or Bi
    • C30B29/403—AIII-nitrides

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Chemical Vapour Deposition (AREA)
AU2003276032A 2002-10-10 2003-10-02 Hydride vpe reactor Abandoned AU2003276032A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2002147921 DE10247921A1 (en) 2002-10-10 2002-10-10 Hydride vapor phase epitaxy reactor, to produce pseudo-substrates for electronic components, deposits layers of crystalline substrates from a gas phase with increased growth rates
DE10247921.6 2002-10-10
PCT/EP2003/010953 WO2004035878A1 (en) 2002-10-10 2003-10-02 Hydride vpe reactor

Publications (1)

Publication Number Publication Date
AU2003276032A1 true AU2003276032A1 (en) 2004-05-04

Family

ID=32038683

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003276032A Abandoned AU2003276032A1 (en) 2002-10-10 2003-10-02 Hydride vpe reactor

Country Status (5)

Country Link
EP (1) EP1554417B1 (en)
AU (1) AU2003276032A1 (en)
DE (2) DE10247921A1 (en)
TW (1) TWI330671B (en)
WO (1) WO2004035878A1 (en)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002024985A1 (en) * 2000-09-22 2002-03-28 Aixtron Ag Gas inlet mechanism for cvd-method and device
DE102004009130A1 (en) * 2004-02-25 2005-09-15 Aixtron Ag Inlet system for a MOCVD reactor
US7132128B2 (en) * 2005-03-31 2006-11-07 Tokyo Electron Limited Method and system for depositing material on a substrate using a solid precursor
DE102005055468A1 (en) * 2005-11-22 2007-05-24 Aixtron Ag Coating one or more substrates comprises supplying gases to process chamber via chambers with gas outlet openings
DE102005056320A1 (en) * 2005-11-25 2007-06-06 Aixtron Ag CVD reactor with a gas inlet member
DE102006022534A1 (en) * 2006-05-15 2007-11-22 Aixtron Ag Source container one VPE reactor
DE102007009145A1 (en) * 2007-02-24 2008-08-28 Aixtron Ag Device for depositing crystalline layers optionally by means of MOCVD or HVPE
DE102007024798A1 (en) 2007-05-25 2008-11-27 Aixtron Ag Device for depositing nitrogen and gallium, indium or aluminum containing semiconductor layers on substrate, comprises process chamber, first inlet for gallium chloride-containing process gas, and second inlet for ammonia-containing gas
DE102008055582A1 (en) * 2008-12-23 2010-06-24 Aixtron Ag MOCVD reactor with cylindrical gas inlet member
DE102010000554A1 (en) 2009-03-16 2010-09-30 Aixtron Ag MOCVD reactor with a locally different to a Wärmeableitorgan coupled ceiling plate
CN102465280B (en) * 2010-11-04 2013-11-27 上海蓝光科技有限公司 Double-side growth type MOCVD reactor
CN102485935B (en) * 2010-12-06 2013-11-13 北京北方微电子基地设备工艺研究中心有限责任公司 Vapor chamber and substrate processing equipment applied with the vapor chamber
FR2970977A1 (en) * 2011-01-27 2012-08-03 Acerde Reactor for depositing silicon carbide/boron nitride ceramic material obtained from the decomposition of gas on face of substrate, comprises preparation chamber including unit to contain solid material, and intermediate chamber
DE102011002145B4 (en) 2011-04-18 2023-02-09 Aixtron Se Device and method for large-area deposition of semiconductor layers with gas-separated HCl feed
DE102011002146B4 (en) 2011-04-18 2023-03-09 Aixtron Se Apparatus and method for depositing semiconductor layers with HCI addition to suppress parasitic growth
DE102011056538A1 (en) 2011-12-16 2013-06-20 Aixtron Se Method for removing unwanted residues of process chamber of chemical vapor deposition reactor, involves forming non-volatile intermediate, so that surface coverage degree of residue is increased/decreased at respective phases of cycle
CN103074608A (en) * 2012-03-16 2013-05-01 光达光电设备科技（嘉兴）有限公司 Method for arranging substrates in graphite plate, and graphite plate
DE102014100092A1 (en) 2013-01-25 2014-07-31 Aixtron Se CVD system with particle separator
DE102018121854A1 (en) 2018-09-07 2020-03-12 Aixtron Se Process for setting up or operating a CVD reactor
DE102018130140A1 (en) 2018-11-28 2020-05-28 Aixtron Se Process for making a component of a CVD reactor
DE102018130139A1 (en) 2018-11-28 2020-05-28 Aixtron Se Gas inlet device for a CVD reactor
DE102019133023A1 (en) * 2019-12-04 2021-06-10 Aixtron Se Gas inlet device for a CVD reactor

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4942351B1 (en) * 1970-08-12 1974-11-14
DE2743909A1 (en) * 1977-09-29 1979-04-12 Siemens Ag Device for epitaxial growth from gaseous phase - has inner tube for waste gas extn. and annulus for flushing gas
DE2743836A1 (en) * 1977-09-29 1979-04-12 Siemens Ag Device for epitaxial growth - with sealed three-chamber gas feed module incorporating chamber for melt
WO1985003727A1 (en) * 1984-02-17 1985-08-29 American Telephone & Telegraph Company Deposition technique
DE10043601A1 (en) * 2000-09-01 2002-03-14 Aixtron Ag Device and method for depositing, in particular, crystalline layers on, in particular, crystalline substrates
DE10118130A1 (en) * 2001-04-11 2002-10-17 Aixtron Ag Device for depositing crystalline layers on crystalline substrates in the gas phase comprises a heated reaction chamber with substrate holders arranged in a circular manner on a support, heated sources, and a hydride feed line

Also Published As

Publication number Publication date
DE50310291D1 (en) 2008-09-18
WO2004035878A1 (en) 2004-04-29
DE10247921A1 (en) 2004-04-22
TW200405909A (en) 2004-04-16
EP1554417A1 (en) 2005-07-20
TWI330671B (en) 2010-09-21
EP1554417B1 (en) 2008-08-06

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase