AU2001263321A1 - Flexible piezoelectric chuck - Google Patents

Flexible piezoelectric chuck

Info

Publication number
AU2001263321A1
AU2001263321A1 AU2001263321A AU6332101A AU2001263321A1 AU 2001263321 A1 AU2001263321 A1 AU 2001263321A1 AU 2001263321 A AU2001263321 A AU 2001263321A AU 6332101 A AU6332101 A AU 6332101A AU 2001263321 A1 AU2001263321 A1 AU 2001263321A1
Authority
AU
Australia
Prior art keywords
flexible piezoelectric
piezoelectric chuck
chuck
flexible
piezoelectric
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001263321A
Inventor
Pradeep Kumar Govil
Jorge S. Ivaldi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML US Inc
Original Assignee
ASML US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML US Inc filed Critical ASML US Inc
Publication of AU2001263321A1 publication Critical patent/AU2001263321A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G03F7/70708—Chucks, e.g. chucking or un-chucking operations or structural details being electrostatic; Electrostatically deformable vacuum chucks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2014—Contact or film exposure of light sensitive plates such as lithographic plates or circuit boards, e.g. in a vacuum frame
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70783—Handling stress or warp of chucks, masks or workpieces, e.g. to compensate for imaging errors or considerations related to warpage of masks or workpieces due to their own weight
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
    • G03F7/70841—Constructional issues related to vacuum environment, e.g. load-lock chamber
AU2001263321A 2000-05-23 2001-05-22 Flexible piezoelectric chuck Abandoned AU2001263321A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/575,998 US6556281B1 (en) 2000-05-23 2000-05-23 Flexible piezoelectric chuck and method of using the same
US09/575,998 2000-05-23
PCT/US2001/016308 WO2001090820A1 (en) 2000-05-23 2001-05-22 Flexible piezoelectric chuck

Publications (1)

Publication Number Publication Date
AU2001263321A1 true AU2001263321A1 (en) 2001-12-03

Family

ID=24302562

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001263321A Abandoned AU2001263321A1 (en) 2000-05-23 2001-05-22 Flexible piezoelectric chuck

Country Status (6)

Country Link
US (1) US6556281B1 (en)
EP (1) EP1203266A1 (en)
JP (2) JP2003534653A (en)
KR (1) KR100699402B1 (en)
AU (1) AU2001263321A1 (en)
WO (1) WO2001090820A1 (en)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6556281B1 (en) 2000-05-23 2003-04-29 Asml Us, Inc. Flexible piezoelectric chuck and method of using the same
US6847433B2 (en) * 2001-06-01 2005-01-25 Agere Systems, Inc. Holder, system, and process for improving overlay in lithography
TWI227752B (en) * 2002-07-01 2005-02-11 Macronix Int Co Ltd Method for decreasing number of particles during etching process and the etching process
SG108996A1 (en) 2003-07-23 2005-02-28 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US7224504B2 (en) 2003-07-30 2007-05-29 Asml Holding N. V. Deformable mirror using piezoelectric actuators formed as an integrated circuit and method of use
EP1507173B1 (en) * 2003-08-12 2011-05-25 ASML Netherlands B.V. Lithographic apparatus and apparatus adjustment method
EP1507172A1 (en) 2003-08-12 2005-02-16 ASML Netherlands B.V. Lithographic apparatus and apparatus adjustment method
EP2267535A1 (en) * 2003-11-05 2010-12-29 ASML Netherlands BV Lithographic apparatus and device manufacturing method
JP4583141B2 (en) * 2004-11-05 2010-11-17 株式会社アルバック Split electrostatic chuck structure
CN101084471B (en) * 2004-12-23 2012-08-29 Asml荷兰有限公司 Support structure and lithographic apparatus
US7508494B2 (en) * 2006-12-22 2009-03-24 Asml Netherlands B.V. Lithographic apparatus and a subtrate table for exciting a shockwave in a substrate
US7678458B2 (en) * 2007-01-24 2010-03-16 Asml Holding N.V. Bonding silicon silicon carbide to glass ceramics
US7875528B2 (en) * 2007-02-07 2011-01-25 International Business Machines Corporation Method, system, program product for bonding two circuitry-including substrates and related stage
DE102008052100B4 (en) 2008-10-08 2015-10-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Flexibly deformable holding element for substrates
DE102008054072B4 (en) * 2008-10-31 2017-06-08 Globalfoundries Dresden Module One Limited Liability Company & Co. Kg Self-correcting substrate holding system for focus control in exposure systems, exposure system and method of exposing a substrate
JP2010182866A (en) * 2009-02-05 2010-08-19 Nikon Corp Electrostatic attraction holding device, aligner, exposure method, and method of manufacturing device
DE102009018434B4 (en) * 2009-04-22 2023-11-30 Ev Group Gmbh Receiving device for holding semiconductor substrates
US20120026480A1 (en) * 2010-07-26 2012-02-02 Asml Netherlands B.V. Image-Compensating Addressable Electrostatic Chuck System
DE102010048620B4 (en) * 2010-10-15 2013-03-28 Epcos Ag Electrode, microacoustic component and method of manufacturing an electrode
KR20140065376A (en) * 2011-02-25 2014-05-29 가부시키가이샤 니콘 Observation device, inspection device, method for manufacturing semiconductor device, and substrate support member
EP3886149A1 (en) * 2011-08-12 2021-09-29 EV Group E. Thallner GmbH Method and device for bonding substrates
WO2013023708A1 (en) * 2011-08-12 2013-02-21 Ev Group E. Thallner Gmbh Apparatus and method for bonding substrates
US9195150B2 (en) 2012-02-06 2015-11-24 Asml Netherlands B.V. Lithographic apparatus comprising a support for holding an object, and a support for use therein
JP5912654B2 (en) * 2012-02-24 2016-04-27 株式会社東芝 Substrate holding device, pattern transfer device, and pattern transfer method
CN108604568B (en) * 2016-01-19 2023-10-10 因特瓦克公司 Patterning chuck for substrate processing
EP3611770A1 (en) * 2018-08-16 2020-02-19 ASML Netherlands B.V. Piezoelectric actuator, actuator system, substrate support and lithographic apparatus including the actuator
JP7108585B2 (en) * 2019-08-16 2022-07-28 日本特殊陶業株式会社 holding device
US11728203B2 (en) 2020-10-13 2023-08-15 Canon Kabushiki Kaisha Chuck assembly, planarization process, apparatus and method of manufacturing an article

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3110341C2 (en) 1980-03-19 1983-11-17 Hitachi, Ltd., Tokyo Method and apparatus for aligning a thin substrate in the image plane of a copier
JPS57204547A (en) * 1981-06-12 1982-12-15 Hitachi Ltd Exposing method
JPS5867026A (en) 1981-10-19 1983-04-21 Hitachi Ltd Thin plate metamorphosis device
US4504144A (en) 1982-07-06 1985-03-12 The Perkin-Elmer Corporation Simple electromechanical tilt and focus device
US4530635A (en) 1983-06-15 1985-07-23 The Perkin-Elmer Corporation Wafer transferring chuck assembly
JPS60177834A (en) * 1984-01-10 1985-09-11 ヒューレット・パッカード・カンパニー Deformable chuck driven by piezoelectric means
KR900001241B1 (en) * 1985-04-17 1990-03-05 가부시기가이샤 히다찌세이사꾸쇼 Light exposure apparatus
US4846626A (en) 1987-02-09 1989-07-11 The Perkin-Elmer Corporation Wafer handling system
US4973217A (en) 1987-02-09 1990-11-27 Svg Lithography Systems, Inc. Wafer handling system
US5094536A (en) 1990-11-05 1992-03-10 Litel Instruments Deformable wafer chuck
JPH04255245A (en) * 1991-02-06 1992-09-10 Toto Ltd Piezoelectric stage
JPH04255244A (en) 1991-02-06 1992-09-10 Toto Ltd Piezoelectric stage
JPH04336928A (en) 1991-05-14 1992-11-25 Toto Ltd Piezoelectric stage
US5202748A (en) 1991-06-07 1993-04-13 Litel Instruments In situ process control system for steppers
JP3012069B2 (en) 1991-12-04 2000-02-21 キヤノン株式会社 X-ray exposure mask structure and X-ray exposure apparatus using the same
US5563684A (en) 1994-11-30 1996-10-08 Sgs-Thomson Microelectronics, Inc. Adaptive wafer modulator for placing a selected pattern on a semiconductor wafer
JP3729425B2 (en) * 1996-03-05 2005-12-21 キヤノン株式会社 Stage device, substrate delivery method, and semiconductor manufacturing apparatus
JP3814359B2 (en) * 1996-03-12 2006-08-30 キヤノン株式会社 X-ray projection exposure apparatus and device manufacturing method
JP2821678B2 (en) * 1997-04-07 1998-11-05 株式会社ニコン Substrate suction device
US6556281B1 (en) 2000-05-23 2003-04-29 Asml Us, Inc. Flexible piezoelectric chuck and method of using the same

Also Published As

Publication number Publication date
JP2009158966A (en) 2009-07-16
EP1203266A1 (en) 2002-05-08
WO2001090820A1 (en) 2001-11-29
JP2003534653A (en) 2003-11-18
JP4734433B2 (en) 2011-07-27
KR100699402B1 (en) 2007-03-26
WO2001090820A9 (en) 2002-10-10
KR20020060685A (en) 2002-07-18
US6556281B1 (en) 2003-04-29

Similar Documents

Publication Publication Date Title
AU2001263321A1 (en) Flexible piezoelectric chuck
AU2002220129A1 (en) Piezoelectric generator
AU2001276278A1 (en) Piezoelectric sensor
AU2002222746A1 (en) An electro-motion toothbrush
AU2001285323A1 (en) Displacement transducer
AU2001243326A1 (en) Hand tool
AU4107001A (en) Toothbrush
AU2001296189A1 (en) Position transducer
AU2001249612A1 (en) Piezoelectric actuator
AU2001276987A1 (en) Microelectronic piezoelectric structure
AU2001247695A1 (en) Hand tool
AU2001245494A1 (en) Flexible laminations
AU2002309177A1 (en) Flexible piezoelectric films
AU2001287431A1 (en) Piezoelectric motor
SG80679A1 (en) Piezoelectric compinent
AU2001279521A1 (en) Piezoelectric motor
AU8642998A (en) Piezoelectric electro-motional devices
AU2002224048A1 (en) Manipulator
AU6625401A (en) Flexible narghile tube
AU2001210118A1 (en) Toothbrush
AU2001262206A1 (en) Toothbrush
AU2002219846A1 (en) Novel use
AU2002211324A1 (en) Oxidoreductases
AU1962000A (en) Piezoelectric transducer
AU6329000A (en) Piezoelectric transformer