AU2001249977A1 - Device and method for coupling two circuit components which have different impedances - Google Patents

Device and method for coupling two circuit components which have different impedances

Info

Publication number
AU2001249977A1
AU2001249977A1 AU2001249977A AU4997701A AU2001249977A1 AU 2001249977 A1 AU2001249977 A1 AU 2001249977A1 AU 2001249977 A AU2001249977 A AU 2001249977A AU 4997701 A AU4997701 A AU 4997701A AU 2001249977 A1 AU2001249977 A1 AU 2001249977A1
Authority
AU
Australia
Prior art keywords
coupling
circuit components
different impedances
impedances
different
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001249977A
Inventor
Wayne L. Johnson
Andrej S. Mitrovic
Thomas H. Windhorn
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2001249977A1 publication Critical patent/AU2001249977A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00—Coupling devices of the waveguide type
    • H01P5/02—Coupling devices of the waveguide type with invariable factor of coupling
    • H01P5/022—Transitions between lines of the same kind and shape, but with different dimensions
    • H01P5/024—Transitions between lines of the same kind and shape, but with different dimensions between hollow waveguides

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Drying Of Semiconductors (AREA)
  • Coupling Device And Connection With Printed Circuit (AREA)
  • ing And Chemical Polishing (AREA)
AU2001249977A 2000-02-14 2001-02-09 Device and method for coupling two circuit components which have different impedances Abandoned AU2001249977A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US18218800P 2000-02-14 2000-02-14
US60182188 2000-02-14
PCT/US2001/040073 WO2001059804A2 (en) 2000-02-14 2001-02-09 Device and method for coupling two circuit components which have different impedances

Publications (1)

Publication Number Publication Date
AU2001249977A1 true AU2001249977A1 (en) 2001-08-20

Family

ID=22667387

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001249977A Abandoned AU2001249977A1 (en) 2000-02-14 2001-02-09 Device and method for coupling two circuit components which have different impedances

Country Status (5)

Country Link
US (1) US6700458B2 (en)
JP (1) JP2003523116A (en)
AU (1) AU2001249977A1 (en)
TW (1) TW492040B (en)
WO (1) WO2001059804A2 (en)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100626192B1 (en) * 2001-09-27 2006-09-21 동경 엘렉트론 주식회사 Electromagnetic field supply device and plasma processing device
TW200300951A (en) * 2001-12-10 2003-06-16 Tokyo Electron Ltd Method and device for removing harmonics in semiconductor plasma processing systems
US7326872B2 (en) * 2004-04-28 2008-02-05 Applied Materials, Inc. Multi-frequency dynamic dummy load and method for testing plasma reactor multi-frequency impedance match networks
JP4862375B2 (en) * 2005-12-06 2012-01-25 株式会社エーイーティー Traveling waveform microwave plasma generator
JP5161086B2 (en) * 2006-07-28 2013-03-13 東京エレクトロン株式会社 Microwave plasma source and plasma processing apparatus
JP5376816B2 (en) * 2008-03-14 2013-12-25 東京エレクトロン株式会社 Microwave introduction mechanism, microwave plasma source, and microwave plasma processing apparatus
DE112009001422T5 (en) * 2008-06-11 2011-06-01 Tohoku University, Sendai Plasma processing device and plasma device method
JP5324137B2 (en) * 2008-06-11 2013-10-23 東京エレクトロン株式会社 Plasma processing apparatus and plasma processing method
JP5324138B2 (en) * 2008-06-11 2013-10-23 東京エレクトロン株式会社 Plasma processing apparatus and plasma processing method
JP5222744B2 (en) 2009-01-21 2013-06-26 国立大学法人東北大学 Plasma processing equipment
US8578879B2 (en) * 2009-07-29 2013-11-12 Applied Materials, Inc. Apparatus for VHF impedance match tuning
DE102011006983A1 (en) * 2011-04-07 2012-10-11 Siemens Aktiengesellschaft RF generator
WO2013022077A1 (en) * 2011-08-10 2013-02-14 国立大学法人 滋賀医科大学 Microwave surgical instrument
US20130340940A1 (en) * 2012-06-21 2013-12-26 Tel Solar Ag Rf feed line
US9773587B1 (en) * 2012-10-22 2017-09-26 Hrl Laboratories, Llc Tunable cavity for material measurement
DE102013207328A1 (en) * 2013-04-23 2014-10-23 Siemens Aktiengesellschaft Apparatus and method for generating high voltage pulses

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1932448A (en) * 1931-12-15 1933-10-31 Int Communications Lab Inc Conical adapter for microray transmission lines
US2453759A (en) * 1943-12-20 1948-11-16 Bell Telephone Labor Inc Tapered union for concentric conductor lines
US2776368A (en) * 1955-09-28 1957-01-01 Harvey M Owren Coaxial tube coupling
FR2619253B1 (en) * 1987-08-03 1990-01-19 Aerospatiale DEVICE FOR JOINING TWO STRUCTURES FOR MICROWAVE, COAXIAL AND DIFFERENT DIAMETERS
DE4122802C1 (en) * 1991-07-10 1992-12-17 Schott Glaswerke, 6500 Mainz, De
EP0725164A3 (en) * 1992-01-30 1996-10-09 Hitachi Ltd Method and apparatus for generating plasma, and semiconductor processing methods
US5815047A (en) 1993-10-29 1998-09-29 Applied Materials, Inc. Fast transition RF impedance matching network for plasma reactor ignition
US5585766A (en) 1994-10-27 1996-12-17 Applied Materials, Inc. Electrically tuned matching networks using adjustable inductance elements
SE506329C2 (en) * 1995-06-20 1997-12-01 Saab Ericsson Space Ab Antenna element, conical helix format, for polarization purity in wide frequency range
US5580387A (en) * 1995-06-28 1996-12-03 Electronics Research & Service Organization Corrugated waveguide for a microwave plasma applicator
US5793162A (en) 1995-12-29 1998-08-11 Lam Research Corporation Apparatus for controlling matching network of a vacuum plasma processor and memory for same
US5689215A (en) 1996-05-23 1997-11-18 Lam Research Corporation Method of and apparatus for controlling reactive impedances of a matching network connected between an RF source and an RF plasma processor
US5654679A (en) 1996-06-13 1997-08-05 Rf Power Products, Inc. Apparatus for matching a variable load impedance with an RF power generator impedance
US5866985A (en) 1996-12-03 1999-02-02 International Business Machines Corporation Stable matching networks for plasma tools
US5889252A (en) 1996-12-19 1999-03-30 Lam Research Corporation Method of and apparatus for independently controlling electric parameters of an impedance matching network

Also Published As

Publication number Publication date
WO2001059804A2 (en) 2001-08-16
WO2001059804A3 (en) 2002-05-30
US20030038688A1 (en) 2003-02-27
TW492040B (en) 2002-06-21
US6700458B2 (en) 2004-03-02
JP2003523116A (en) 2003-07-29

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