AU2001248851A1 - Semiconductor device inspection system - Google Patents

Semiconductor device inspection system

Info

Publication number
AU2001248851A1
AU2001248851A1 AU2001248851A AU4885101A AU2001248851A1 AU 2001248851 A1 AU2001248851 A1 AU 2001248851A1 AU 2001248851 A AU2001248851 A AU 2001248851A AU 4885101 A AU4885101 A AU 4885101A AU 2001248851 A1 AU2001248851 A1 AU 2001248851A1
Authority
AU
Australia
Prior art keywords
semiconductor device
inspection system
device inspection
semiconductor
inspection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001248851A
Inventor
Wataru Karasawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2001248851A1 publication Critical patent/AU2001248851A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/20Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
    • G01N2021/888Marking defects
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • H01L22/10Measuring as part of the manufacturing process
    • H01L22/12Measuring as part of the manufacturing process for structural parameters, e.g. thickness, line width, refractive index, temperature, warp, bond strength, defects, optical inspection, electrical measurement of structural dimensions, metallurgic measurement of diffusions

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Biochemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Tests Of Electronic Circuits (AREA)
AU2001248851A 2000-04-25 2001-04-24 Semiconductor device inspection system Abandoned AU2001248851A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000-124875 2000-04-25
JP2000124875 2000-04-25
PCT/JP2001/003525 WO2001082364A1 (en) 2000-04-25 2001-04-24 Semiconductor device inspection system

Publications (1)

Publication Number Publication Date
AU2001248851A1 true AU2001248851A1 (en) 2001-11-07

Family

ID=18634934

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001248851A Abandoned AU2001248851A1 (en) 2000-04-25 2001-04-24 Semiconductor device inspection system

Country Status (8)

Country Link
US (1) US6969620B2 (en)
EP (1) EP1290726A4 (en)
JP (1) JP2003535460A (en)
KR (1) KR100779922B1 (en)
CN (1) CN1211851C (en)
AU (1) AU2001248851A1 (en)
TW (1) TW586170B (en)
WO (1) WO2001082364A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9037280B2 (en) * 2005-06-06 2015-05-19 Kla-Tencor Technologies Corp. Computer-implemented methods for performing one or more defect-related functions
CN100403508C (en) * 2005-06-29 2008-07-16 联华电子股份有限公司 Defect detection component and detecting and producing method thereof
JP5581835B2 (en) * 2010-06-15 2014-09-03 セイコーエプソン株式会社 Semiconductor device inspection method and semiconductor device inspection system
CN103886113A (en) * 2014-04-04 2014-06-25 东莞铭丰集团有限公司 Method and device for collecting and processing data of wafers in wafer boxes
CN104949996A (en) * 2015-06-29 2015-09-30 广东溢达纺织有限公司 Non-stop method and system for automatically identifying defects of textile fabrics

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0480939A (en) 1990-07-24 1992-03-13 Hitachi Ltd Manufacture of semiconductor integrated circuit device
US5219765A (en) 1990-09-12 1993-06-15 Hitachi, Ltd. Method for manufacturing a semiconductor device including wafer aging, probe inspection, and feeding back the results of the inspection to the device fabrication process
JPH07176575A (en) * 1993-12-21 1995-07-14 Fujitsu Ltd Method and apparatus for testing semiconductor device
JPH07302819A (en) 1994-04-28 1995-11-14 Kokusai Electric Co Ltd Inspection method for semiconductor element
JP2755195B2 (en) 1994-12-08 1998-05-20 日本電気株式会社 Semiconductor device manufacturing method and device
JPH10173021A (en) * 1996-12-12 1998-06-26 Mitsubishi Electric Corp Method and apparatus for analyzing manufacturing line
KR100216066B1 (en) * 1997-05-20 1999-08-16 윤종용 Control system and control method for ic test process
US6408219B2 (en) 1998-05-11 2002-06-18 Applied Materials, Inc. FAB yield enhancement system
JPH11330184A (en) 1998-05-13 1999-11-30 Mitsubishi Electric Corp Wafer testing method
WO2000014790A1 (en) 1998-09-03 2000-03-16 Hitachi, Ltd. Inspection system and method for producing electronic device by using the same

Also Published As

Publication number Publication date
US20030155280A1 (en) 2003-08-21
WO2001082364A1 (en) 2001-11-01
CN1434981A (en) 2003-08-06
KR100779922B1 (en) 2007-11-28
KR20020088001A (en) 2002-11-23
TW586170B (en) 2004-05-01
EP1290726A4 (en) 2005-04-13
CN1211851C (en) 2005-07-20
EP1290726A1 (en) 2003-03-12
US6969620B2 (en) 2005-11-29
JP2003535460A (en) 2003-11-25

Similar Documents

Publication Publication Date Title
AU2000224587A1 (en) Semiconductor device
AU2001236028A1 (en) Semiconductor device
AU2222101A (en) Semiconductor device
AU2459200A (en) Semiconductor device
AU2002228807A1 (en) Inspection system
EP1102327A3 (en) Field effect semiconductor device
AU2001234973A1 (en) Semiconductor devices
SG99939A1 (en) Semiconductor device
EP1231640A4 (en) Semiconductor device
GB2373634B (en) Semiconductor device
AU2002316979A1 (en) Semiconductor device
AU1685300A (en) Semiconductor device
AU3837200A (en) Semiconductor device
AU5998699A (en) Semiconductor device
AU1648801A (en) Semiconductor device
GB2370916B (en) Semiconductor device
EP1215780A3 (en) Semiconductor optical device
AU2001241521A1 (en) Wafer processing system
GB2365621B (en) Semiconductor device
EP1109010B8 (en) Inspection device
AU2001236025A1 (en) Semiconductor laser device
AU2000274531A1 (en) Semiconductor device
AU2001264305A1 (en) Illumination device for inspection
SG109474A1 (en) Semiconductor device
AU2001248851A1 (en) Semiconductor device inspection system