AU2001245898A1 - Scanning framing blade apparatus - Google Patents

Scanning framing blade apparatus

Info

Publication number
AU2001245898A1
AU2001245898A1 AU2001245898A AU4589801A AU2001245898A1 AU 2001245898 A1 AU2001245898 A1 AU 2001245898A1 AU 2001245898 A AU2001245898 A AU 2001245898A AU 4589801 A AU4589801 A AU 4589801A AU 2001245898 A1 AU2001245898 A1 AU 2001245898A1
Authority
AU
Australia
Prior art keywords
blade apparatus
framing blade
scanning framing
scanning
framing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001245898A
Other languages
English (en)
Inventor
Daniel N. Galburt
Waiming Tam
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ASML US Inc
Original Assignee
ASML US Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ASML US Inc filed Critical ASML US Inc
Publication of AU2001245898A1 publication Critical patent/AU2001245898A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70358—Scanning exposure, i.e. relative movement of patterned beam and workpiece during imaging
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H02K41/031—Synchronous motors; Motors moving step by step; Reluctance motors of the permanent magnet type
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K7/00—Arrangements for handling mechanical energy structurally associated with dynamo-electric machines, e.g. structural association with mechanical driving motors or auxiliary dynamo-electric machines
    • H02K7/08—Structural association with bearings

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Combustion & Propulsion (AREA)
  • Electromagnetism (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2001245898A 2000-03-23 2001-03-22 Scanning framing blade apparatus Abandoned AU2001245898A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09534127 2000-03-23
US09/534,127 US6307619B1 (en) 2000-03-23 2000-03-23 Scanning framing blade apparatus
PCT/US2001/008973 WO2001071422A1 (fr) 2000-03-23 2001-03-22 Appareil a lame d'encadrement pour balayage

Publications (1)

Publication Number Publication Date
AU2001245898A1 true AU2001245898A1 (en) 2001-10-03

Family

ID=24128788

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001245898A Abandoned AU2001245898A1 (en) 2000-03-23 2001-03-22 Scanning framing blade apparatus

Country Status (6)

Country Link
US (1) US6307619B1 (fr)
EP (1) EP1275029A4 (fr)
JP (1) JP2003528453A (fr)
KR (1) KR100772148B1 (fr)
AU (1) AU2001245898A1 (fr)
WO (1) WO2001071422A1 (fr)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4689058B2 (ja) * 2001-02-16 2011-05-25 キヤノン株式会社 リニアモータ、ステージ装置および露光装置ならびにデバイス製造方法
US6538720B2 (en) 2001-02-28 2003-03-25 Silicon Valley Group, Inc. Lithographic tool with dual isolation system and method for configuring the same
US6784978B2 (en) * 2002-03-12 2004-08-31 Asml Holding N.V. Method, system, and apparatus for management of reaction loads in a lithography system
US6757110B2 (en) 2002-05-29 2004-06-29 Asml Holding N.V. Catadioptric lithography system and method with reticle stage orthogonal to wafer stage
JP2004132435A (ja) * 2002-10-09 2004-04-30 Canon Inc 軸受装置
US7423730B2 (en) * 2003-05-28 2008-09-09 Asml Netherlands B.V. Lithographic apparatus
EP1482363A1 (fr) * 2003-05-30 2004-12-01 ASML Netherlands B.V. Appareil lithographique
EP1491960B1 (fr) * 2003-05-30 2012-04-25 ASML Netherlands B.V. Appareil lithographique
US6906789B2 (en) * 2003-06-02 2005-06-14 Asml Holding N.V. Magnetically levitated and driven reticle-masking blade stage mechanism having six degrees freedom of motion
US6950175B2 (en) * 2003-06-02 2005-09-27 Asml Holding N.V. System, method, and apparatus for a magnetically levitated and driven reticle-masking blade stage mechanism
US20060087634A1 (en) * 2004-10-25 2006-04-27 Brown Jay M Dynamic illumination uniformity and shape control for lithography
US7518268B2 (en) * 2005-11-21 2009-04-14 Bookham Technology Plc Linear stage including an integrated actuator and associated methods
JP4498272B2 (ja) * 2005-12-28 2010-07-07 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置、リソグラフィ装置のレチクルマスキングデバイス、気体軸受け、およびこのような気体軸受けを有する装置
CN103163738B (zh) * 2011-12-14 2015-03-25 上海微电子装备有限公司 用于补偿照明扫描向刀口驱动反力的装置及光刻设备

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4472824A (en) 1982-08-04 1984-09-18 The Perkin-Elmer Corporation Apparatus for effecting alignment and spacing control of a mask and wafer for use in X-ray lithography
US4507597A (en) 1983-06-10 1985-03-26 The Perkin-Elmer Corporation Electro-magnetic alignment assemblies
US4907035A (en) 1984-03-30 1990-03-06 The Perkin-Elmer Corporation Universal edged-based wafer alignment apparatus
US4719705A (en) 1986-06-24 1988-01-19 The Perkin-Elmer Corporation Reticle transporter
US4986007A (en) 1987-03-25 1991-01-22 Svg Lithography Systems, Inc. Reticle frame assembly
US5285142A (en) 1993-02-09 1994-02-08 Svg Lithography Systems, Inc. Wafer stage with reference surface
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
JPH09106941A (ja) * 1995-10-11 1997-04-22 Nikon Corp 走査型露光装置及び露光方法
US5727685A (en) 1995-10-19 1998-03-17 Svg Lithography Systems, Inc. Reticle container with corner holding
JP3286184B2 (ja) * 1996-09-25 2002-05-27 キヤノン株式会社 走査露光装置および方法
US5920396A (en) 1996-10-16 1999-07-06 Svg Lithography Systems, Inc. Line width insensitive wafer target detection
US5966202A (en) 1997-03-31 1999-10-12 Svg Lithography Systems, Inc. Adjustable slit
JPH10284371A (ja) * 1997-04-03 1998-10-23 Nikon Corp 露光方法及び装置
US5767523A (en) 1997-04-09 1998-06-16 Svg Lithography Systems, Inc. Multiple detector alignment system for photolithography
AU4057999A (en) * 1998-06-02 1999-12-20 Nikon Corporation Scanning aligner, method of manufacture thereof, and method of manufacturing device
US6727981B2 (en) * 1999-07-19 2004-04-27 Nikon Corporation Illuminating optical apparatus and making method thereof, exposure apparatus and making method thereof, and device manufacturing method
JP2001035772A (ja) * 1999-07-19 2001-02-09 Nikon Corp 露光装置

Also Published As

Publication number Publication date
EP1275029A4 (fr) 2006-10-18
KR20020086661A (ko) 2002-11-18
WO2001071422A1 (fr) 2001-09-27
EP1275029A1 (fr) 2003-01-15
JP2003528453A (ja) 2003-09-24
US6307619B1 (en) 2001-10-23
KR100772148B1 (ko) 2007-10-31

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