AU2001244872A1 - Solid imaging compositions for preparing polypropylene-like articles - Google Patents
Solid imaging compositions for preparing polypropylene-like articlesInfo
- Publication number
- AU2001244872A1 AU2001244872A1 AU2001244872A AU4487201A AU2001244872A1 AU 2001244872 A1 AU2001244872 A1 AU 2001244872A1 AU 2001244872 A AU2001244872 A AU 2001244872A AU 4487201 A AU4487201 A AU 4487201A AU 2001244872 A1 AU2001244872 A1 AU 2001244872A1
- Authority
- AU
- Australia
- Prior art keywords
- articles
- solid imaging
- imaging compositions
- preparing polypropylene
- objects
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0037—Production of three-dimensional images
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B33—ADDITIVE MANUFACTURING TECHNOLOGY
- B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3-D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3-D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
- B33Y70/00—Materials specially adapted for additive manufacturing
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
Abstract
This invention discloses compositions adapted to produce, through solid imaging means, excellent quality objects having material properties that simulate the look and feel of polypropylene articles. The objects show the following properties:
a tensile modulus in the range of 1000 to 2000 N/mm 2 , an average elongation at break of at least 10% and a yield stress of 24 to 40 kN/mm 2 .
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09538940 | 2000-03-31 | ||
US09/538,940 US6379866B2 (en) | 2000-03-31 | 2000-03-31 | Solid imaging compositions for preparing polypropylene-like articles |
PCT/NL2001/000261 WO2001075524A2 (en) | 2000-03-31 | 2001-03-29 | Solid imaging compositions for preparing polypropylene-like articles |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2001244872A1 true AU2001244872A1 (en) | 2001-10-15 |
Family
ID=24149086
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2001244872A Abandoned AU2001244872A1 (en) | 2000-03-31 | 2001-03-29 | Solid imaging compositions for preparing polypropylene-like articles |
Country Status (11)
Country | Link |
---|---|
US (3) | US6379866B2 (en) |
EP (2) | EP1269261B1 (en) |
JP (1) | JP2003529674A (en) |
KR (1) | KR100796409B1 (en) |
CN (1) | CN1322371C (en) |
AT (1) | ATE271698T1 (en) |
AU (1) | AU2001244872A1 (en) |
DE (1) | DE60104408T2 (en) |
ES (1) | ES2223811T3 (en) |
HK (1) | HK1057260A1 (en) |
WO (1) | WO2001075524A2 (en) |
Families Citing this family (47)
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TW311923B (en) * | 1992-01-27 | 1997-08-01 | Ciba Sc Holding Ag | |
US6287748B1 (en) * | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
US6379866B2 (en) | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
US20060154175A9 (en) * | 1998-07-10 | 2006-07-13 | Lawton John A | Solid imaging compositions for preparing polypropylene-like articles |
US6762002B2 (en) * | 1998-07-10 | 2004-07-13 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
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US7399590B2 (en) * | 2002-02-21 | 2008-07-15 | Asm Scientific, Inc. | Recombinase polymerase amplification |
GB0212977D0 (en) * | 2002-06-06 | 2002-07-17 | Vantico Ag | Actinic radiation curable compositions and their use |
US6989225B2 (en) * | 2002-07-18 | 2006-01-24 | 3D Systems, Inc. | Stereolithographic resins with high temperature and high impact resistance |
US7235195B2 (en) * | 2002-09-06 | 2007-06-26 | Novartis Ag | Method for making opthalmic devices |
US20040077745A1 (en) * | 2002-10-18 | 2004-04-22 | Jigeng Xu | Curable compositions and rapid prototyping process using the same |
US20040087687A1 (en) * | 2002-10-30 | 2004-05-06 | Vantico A&T Us Inc. | Photocurable compositions with phosphite viscosity stabilizers |
US20040137368A1 (en) * | 2003-01-13 | 2004-07-15 | 3D Systems, Inc. | Stereolithographic resins containing selected oxetane compounds |
DE112004001165T5 (en) * | 2003-06-25 | 2006-05-04 | Cmet Inc., Yokohama | An actinic radiation-curable stereolithographic resin composition having improved stability |
US7232850B2 (en) | 2003-10-03 | 2007-06-19 | Huntsman Advanced Materials Americas Inc. | Photocurable compositions for articles having stable tensile properties |
US7820275B2 (en) * | 2003-11-06 | 2010-10-26 | Huntsman Advanced Materials Americas Llc | Photocurable composition for producing cured articles having high clarity and improved mechanical properties |
US20050165127A1 (en) * | 2003-12-31 | 2005-07-28 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polyethylene-like articles |
US20050158660A1 (en) * | 2004-01-20 | 2005-07-21 | Dsm Desotech, Inc. | Solid imaging compositions for preparing polypropylene-like articles |
SE529306C2 (en) * | 2005-03-18 | 2007-06-26 | Perstorp Specialty Chem Ab | Ultraviolet-curing resin composition |
KR101291891B1 (en) * | 2005-09-13 | 2013-07-31 | 3디 시스템즈 인코오퍼레이티드 | Photocurable compositions for preparing ABS-like articles |
JP4926505B2 (en) * | 2006-03-13 | 2012-05-09 | 株式会社ダイセル | Optical three-dimensional resin composition |
US8786613B2 (en) | 2006-04-08 | 2014-07-22 | Alan Millman | Method and system for interactive simulation of materials and models |
WO2007117586A2 (en) * | 2006-04-08 | 2007-10-18 | Allan Millman | Method and system for interactive simulation of materials |
US9676899B2 (en) | 2006-05-01 | 2017-06-13 | Dsm Ip Assets B.V. | Radiation curable resin composition and rapid three dimensional imaging process using the same |
US20080103226A1 (en) * | 2006-10-31 | 2008-05-01 | Dsm Ip Assets B.V. | Photo-curable resin composition |
EP2406318B1 (en) | 2009-03-13 | 2021-04-21 | DSM IP Assets B.V. | Radiation curable resin composition and rapid three-dimensional imaging process using the same |
US8764869B2 (en) | 2009-07-10 | 2014-07-01 | Alfa Laval Corporate Ab | Gas cleaning separator |
US8673038B2 (en) | 2009-07-10 | 2014-03-18 | Alfa Laval Corporate Ab | Gas cleaning separator |
US8679214B2 (en) | 2009-07-10 | 2014-03-25 | Alfa Laval Corporate Ab | Gas cleaning separator |
EP2520372B1 (en) | 2009-07-10 | 2017-10-04 | Alfa Laval Corporate AB | Gas cleaning separator |
US9056319B2 (en) | 2009-07-10 | 2015-06-16 | Alfa Laval Corporate Ab | Gas cleaning separator |
US8657913B2 (en) | 2009-07-10 | 2014-02-25 | Alfa Laval Corporate Ab | Gas cleaning separator |
US8657909B2 (en) | 2009-07-10 | 2014-02-25 | Alfa Laval Corporate Ab | Gas cleaning separator |
US8657908B2 (en) | 2009-07-10 | 2014-02-25 | Alfa Laval Corporate Ab | Gas cleaning separator |
US9061291B2 (en) | 2009-07-10 | 2015-06-23 | Alfa Laval Corporate Ab | Gas cleaning separator |
WO2011102287A1 (en) * | 2010-02-16 | 2011-08-25 | ダイセル化学工業株式会社 | Curable composition and cured material |
JP6414411B2 (en) | 2013-08-09 | 2018-10-31 | ディーエスエム アイピー アセッツ ビー.ブイ.Dsm Ip Assets B.V. | Low viscosity liquid radiation curable dental aligner mold resin composition for additive manufacturing |
WO2016019568A1 (en) * | 2014-08-08 | 2016-02-11 | Honeywell International Inc. | 3d organic-inorganic hybridized compositions and methods |
US10683381B2 (en) | 2014-12-23 | 2020-06-16 | Bridgestone Americas Tire Operations, Llc | Actinic radiation curable polymeric mixtures, cured polymeric mixtures and related processes |
US11097531B2 (en) | 2015-12-17 | 2021-08-24 | Bridgestone Americas Tire Operations, Llc | Additive manufacturing cartridges and processes for producing cured polymeric products by additive manufacturing |
CN107300831B (en) * | 2016-04-15 | 2021-01-15 | 常州强力电子新材料股份有限公司 | Curable composition applied to LED photocuring |
US11453161B2 (en) | 2016-10-27 | 2022-09-27 | Bridgestone Americas Tire Operations, Llc | Processes for producing cured polymeric products by additive manufacturing |
CN107236096B (en) * | 2017-07-19 | 2020-05-26 | 中山大简科技有限公司 | Transparent SLA photosensitive resin composition |
CN112384188A (en) | 2018-06-29 | 2021-02-19 | 3M创新有限公司 | Orthodontic articles made using polycarbonate diols, polymerizable compositions, and methods of making articles |
US11104758B2 (en) | 2018-06-29 | 2021-08-31 | 3M Innovative Properties Company | Orthodontic articles prepared using a polycarbonate diol, and methods of making same |
EP3813763A1 (en) | 2018-06-29 | 2021-05-05 | 3M Innovative Properties Company | Orthodontic articles comprising cured free-radically polymerizable composition with improved strength in aqueous environment |
WO2020005411A1 (en) | 2018-06-29 | 2020-01-02 | 3M Innovative Properties Company | Photopolymerizable compositions including a polyurethane methacrylate polymer prepared using a polycarbonate diol, articles, and methods |
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US3803466A (en) * | 1972-02-28 | 1974-04-09 | Rockwell International Corp | Linear motor propulsion system |
CA1312040C (en) * | 1985-12-19 | 1992-12-29 | Joseph Victor Koleske | Conformal coatings cured with actinic radiation |
US4844144A (en) | 1988-08-08 | 1989-07-04 | Desoto, Inc. | Investment casting utilizing patterns produced by stereolithography |
JPH07103218B2 (en) | 1988-09-13 | 1995-11-08 | 旭電化工業株式会社 | Resin composition for optical modeling |
EP0376890A3 (en) * | 1988-12-29 | 1991-04-10 | Ciba-Geigy Ag | Silane-containing oxazolidines |
US5176188A (en) | 1991-02-14 | 1993-01-05 | E. I. Du Pont De Nemours And Company | Investment casting method and pattern material comprising thermally-collapsible expanded microspheres |
US5136682A (en) * | 1991-04-15 | 1992-08-04 | Raychem Corporation | Curable compositions and methods for use in forming optical waveguide structures |
TW269017B (en) * | 1992-12-21 | 1996-01-21 | Ciba Geigy Ag | |
US5418112A (en) * | 1993-11-10 | 1995-05-23 | W. R. Grace & Co.-Conn. | Photosensitive compositions useful in three-dimensional part-building and having improved photospeed |
JP3000189B2 (en) * | 1994-05-31 | 2000-01-17 | 株式会社サクラクレパス | UV-curable thermochromic ink composition |
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WO1996035756A1 (en) * | 1995-05-12 | 1996-11-14 | Asahi Denka Kogyo Kabushiki Kaisha | Stereolithographic resin composition and stereolithographic method |
US5707780A (en) | 1995-06-07 | 1998-01-13 | E. I. Du Pont De Nemours And Company | Photohardenable epoxy composition |
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EP0897558B1 (en) * | 1996-05-09 | 2000-09-27 | Dsm N.V. | Photosensitive resin composition for rapid prototyping and a process for the manufacture of 3-dimensional objects |
ATE191090T1 (en) | 1996-07-29 | 2000-04-15 | Ciba Sc Holding Ag | LIQUID, RADIATION-CURED COMPOSITION, PARTICULARLY FOR STEREOLITHOGRAPHY |
JP3786480B2 (en) * | 1996-10-14 | 2006-06-14 | Jsr株式会社 | Photocurable resin composition |
JP3626302B2 (en) * | 1996-12-10 | 2005-03-09 | Jsr株式会社 | Photocurable resin composition |
JP3650238B2 (en) * | 1996-12-10 | 2005-05-18 | Jsr株式会社 | Photocurable resin composition |
US5955218A (en) * | 1996-12-18 | 1999-09-21 | Medtronic, Inc. | Heat-treated silver vanadium oxide for use in batteries for implantable medical devices |
WO1998036323A1 (en) * | 1997-02-14 | 1998-08-20 | Alliedsignal Inc. | High temperature performance polymers for stereolithography |
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JP4204113B2 (en) | 1997-12-04 | 2009-01-07 | 株式会社Adeka | Novel aromatic sulfonium compound, photoacid generator comprising the same, photopolymerizable composition containing the same, resin composition for optical modeling, and optical three-dimensional modeling method |
EP0938026B1 (en) | 1998-02-18 | 2009-05-27 | DSM IP Assets B.V. | Photocurable liquid resin composition |
JP3824286B2 (en) * | 1998-02-18 | 2006-09-20 | Jsr株式会社 | Photocurable resin composition |
US6136497A (en) | 1998-03-30 | 2000-10-24 | Vantico, Inc. | Liquid, radiation-curable composition, especially for producing flexible cured articles by stereolithography |
US6100007A (en) * | 1998-04-06 | 2000-08-08 | Ciba Specialty Chemicals Corp. | Liquid radiation-curable composition especially for producing cured articles by stereolithography having high heat deflection temperatures |
US6187836B1 (en) * | 1998-06-05 | 2001-02-13 | 3M Innovative Properties Company | Compositions featuring cationically active and free radically active functional groups, and methods for polymerizing such compositions |
DE19828727A1 (en) | 1998-06-29 | 1999-12-30 | Dolmar Gmbh | Motorized chain saw |
US6379866B2 (en) * | 2000-03-31 | 2002-04-30 | Dsm Desotech Inc | Solid imaging compositions for preparing polypropylene-like articles |
US6287748B1 (en) | 1998-07-10 | 2001-09-11 | Dsm N.V. | Solid imaging compositions for preparing polyethylene-like articles |
-
2000
- 2000-03-31 US US09/538,940 patent/US6379866B2/en not_active Expired - Lifetime
-
2001
- 2001-03-29 US US10/240,399 patent/US20040091799A1/en not_active Abandoned
- 2001-03-29 AU AU2001244872A patent/AU2001244872A1/en not_active Abandoned
- 2001-03-29 ES ES01918000T patent/ES2223811T3/en not_active Expired - Lifetime
- 2001-03-29 JP JP2001573140A patent/JP2003529674A/en not_active Withdrawn
- 2001-03-29 KR KR1020027013049A patent/KR100796409B1/en active IP Right Grant
- 2001-03-29 AT AT01918000T patent/ATE271698T1/en not_active IP Right Cessation
- 2001-03-29 WO PCT/NL2001/000261 patent/WO2001075524A2/en active IP Right Grant
- 2001-03-29 CN CNB018103995A patent/CN1322371C/en not_active Expired - Lifetime
- 2001-03-29 DE DE60104408T patent/DE60104408T2/en not_active Revoked
- 2001-03-29 EP EP01918000A patent/EP1269261B1/en not_active Revoked
- 2001-03-29 EP EP04016585.4A patent/EP1473593B1/en not_active Expired - Lifetime
-
2002
- 2002-01-04 US US10/035,230 patent/US6749976B2/en not_active Expired - Lifetime
-
2004
- 2004-01-09 HK HK04100153A patent/HK1057260A1/en not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR100796409B1 (en) | 2008-01-21 |
US6749976B2 (en) | 2004-06-15 |
ES2223811T3 (en) | 2005-03-01 |
EP1473593B1 (en) | 2017-07-05 |
EP1269261B1 (en) | 2004-07-21 |
CN1432140A (en) | 2003-07-23 |
US20040091799A1 (en) | 2004-05-13 |
CN1322371C (en) | 2007-06-20 |
HK1057260A1 (en) | 2004-03-19 |
JP2003529674A (en) | 2003-10-07 |
US6379866B2 (en) | 2002-04-30 |
DE60104408T2 (en) | 2005-08-25 |
US20020081505A1 (en) | 2002-06-27 |
WO2001075524A2 (en) | 2001-10-11 |
DE60104408D1 (en) | 2004-08-26 |
EP1269261A2 (en) | 2003-01-02 |
EP1473593A3 (en) | 2009-09-23 |
ATE271698T1 (en) | 2004-08-15 |
KR20030051420A (en) | 2003-06-25 |
WO2001075524A3 (en) | 2002-03-14 |
EP1473593A2 (en) | 2004-11-03 |
US20020018959A1 (en) | 2002-02-14 |
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