AU2001244849A1 - Method for the electrolytic polishing of a metal in the presence of an electrolyte composition, as well as a moulded element obtained by using such a method - Google Patents

Method for the electrolytic polishing of a metal in the presence of an electrolyte composition, as well as a moulded element obtained by using such a method

Info

Publication number
AU2001244849A1
AU2001244849A1 AU2001244849A AU4484901A AU2001244849A1 AU 2001244849 A1 AU2001244849 A1 AU 2001244849A1 AU 2001244849 A AU2001244849 A AU 2001244849A AU 4484901 A AU4484901 A AU 4484901A AU 2001244849 A1 AU2001244849 A1 AU 2001244849A1
Authority
AU
Australia
Prior art keywords
metal
well
electrolyte composition
electrolytic polishing
element obtained
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001244849A
Inventor
Dr. Leonard Johannes Joseph Janssen
Richard Johannes Van Der Net
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eindhoven Technical University
Original Assignee
Eindhoven Technical University
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eindhoven Technical University filed Critical Eindhoven Technical University
Publication of AU2001244849A1 publication Critical patent/AU2001244849A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing
    • C25F3/22—Polishing of heavy metals
    • C25F3/26—Polishing of heavy metals of refractory metals
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
    • C25F3/00—Electrolytic etching or polishing
    • C25F3/16—Polishing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • ing And Chemical Polishing (AREA)
AU2001244849A 2000-03-23 2001-03-16 Method for the electrolytic polishing of a metal in the presence of an electrolyte composition, as well as a moulded element obtained by using such a method Abandoned AU2001244849A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
NL1014727A NL1014727C2 (en) 2000-03-23 2000-03-23 A method for electrolytically polishing a metal in the presence of an electrolyte composition, as well as a molded article obtained by such a method.
NL1014727 2000-03-23
PCT/NL2001/000220 WO2001071068A1 (en) 2000-03-23 2001-03-16 Method for the electrolytic polishing of a metal in the presence of an electrolyte composition, as well as a moulded element obtained by using such a method

Publications (1)

Publication Number Publication Date
AU2001244849A1 true AU2001244849A1 (en) 2001-10-03

Family

ID=19771059

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001244849A Abandoned AU2001244849A1 (en) 2000-03-23 2001-03-16 Method for the electrolytic polishing of a metal in the presence of an electrolyte composition, as well as a moulded element obtained by using such a method

Country Status (3)

Country Link
AU (1) AU2001244849A1 (en)
NL (1) NL1014727C2 (en)
WO (1) WO2001071068A1 (en)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6722950B1 (en) 2000-11-07 2004-04-20 Planar Labs Corporation Method and apparatus for electrodialytic chemical mechanical polishing and deposition
US6773337B1 (en) 2000-11-07 2004-08-10 Planar Labs Corporation Method and apparatus to recondition an ion exchange polish pad
US6905526B1 (en) 2000-11-07 2005-06-14 Planar Labs Corporation Fabrication of an ion exchange polish pad
DE102006047713B3 (en) * 2006-10-09 2008-03-27 Poligrat Gmbh Electrolyte for electro-polishing surfaces of metal and metal alloys used in the production of gas turbines contains methane sulfonic acid and ammonium difluoride
DE102006053586B3 (en) * 2006-11-14 2008-04-17 Poligrat Gmbh Electropolishing the surface of metals comprises using an electrolye comprising methanesulfonic acid and an alkanediol or cycloalkanol
US8647496B2 (en) 2009-01-16 2014-02-11 Abbott Laboratories Vascular Enterprises Limited Method, apparatus, and electrolytic solution for electropolishing metallic stents
AU2010205768C1 (en) * 2009-01-16 2014-06-05 Abbott Laboratories Vascular Enterprises Limited Method and solution for electropolishing stents made of high strength medical alloys
CN103938262A (en) * 2013-01-23 2014-07-23 汉达精密电子(昆山)有限公司 Magnesium alloy electrochemical polishing solution and method of processing magnesium alloy with the polishing solution
CN112229833B (en) * 2020-10-12 2023-12-29 宁波江丰电子材料股份有限公司 Method for dissolving molybdenum-niobium alloy sample

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SU670607A1 (en) * 1976-01-29 1979-06-30 Уральский ордена Трудового Красного Знамени политехнический институт им. С.М.Кирова Solution for electric polishing of metals
GB1556778A (en) * 1977-03-11 1979-11-28 Post Office Preparation of semiconductor surfaces
FR2467248A1 (en) * 1979-10-10 1981-04-17 Ural I Trubnoi Promys Electrolyte for electrochemical polishing of titanium (alloy) - contains sulphuric, nitric and hydrofluoric acids and surfactant based on L-sulpho:carboxylic acid
DE3302011C1 (en) * 1983-01-21 1984-06-20 Kraftwerk Union AG, 4330 Mülheim Process for electrolytically polishing the surfaces of finished parts made of zirconium and/or zirconium alloys
JPS6092500A (en) * 1983-10-26 1985-05-24 Mitsubishi Heavy Ind Ltd Liquid composition for electropolishing niobium material and its preparation
JPS6176699A (en) * 1984-09-22 1986-04-19 Nippon Light Metal Co Ltd Manufacture of alumite substrate for high density magnetic recording material
JPH0353099A (en) * 1989-07-19 1991-03-07 Matsushita Electric Ind Co Ltd Method for processing ta base material
JP3648255B2 (en) * 1997-06-30 2005-05-18 キャンデセント・インテレクチュアル・プロパティ・サービシーズ・インコーポレイテッド Impedance-based electrochemical techniques and methods for removing materials, particularly excess emitter material, in electron-emitting devices

Also Published As

Publication number Publication date
WO2001071068A1 (en) 2001-09-27
NL1014727C2 (en) 2001-09-25

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