AU2001232934A1 - High pressure lift valve for use in semiconductor processing environment - Google Patents

High pressure lift valve for use in semiconductor processing environment

Info

Publication number
AU2001232934A1
AU2001232934A1 AU2001232934A AU3293401A AU2001232934A1 AU 2001232934 A1 AU2001232934 A1 AU 2001232934A1 AU 2001232934 A AU2001232934 A AU 2001232934A AU 3293401 A AU3293401 A AU 3293401A AU 2001232934 A1 AU2001232934 A1 AU 2001232934A1
Authority
AU
Australia
Prior art keywords
high pressure
semiconductor processing
processing environment
lift valve
pressure lift
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2001232934A
Inventor
Maximillian A. Biberger
Frederick P. Layman
Thomas R. Sutton
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Publication of AU2001232934A1 publication Critical patent/AU2001232934A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K51/00—Other details not peculiar to particular types of valves or cut-off apparatus
    • F16K51/02—Other details not peculiar to particular types of valves or cut-off apparatus specially adapted for high-vacuum installations
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K1/00—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces
    • F16K1/02—Lift valves or globe valves, i.e. cut-off apparatus with closure members having at least a component of their opening and closing motion perpendicular to the closing faces with screw-spindle
    • F16K1/06—Special arrangements for improving the flow, e.g. special shape of passages or casings
    • F16K1/10—Special arrangements for improving the flow, e.g. special shape of passages or casings in which the spindle is inclined to the general direction of flow
AU2001232934A 2000-01-26 2001-01-23 High pressure lift valve for use in semiconductor processing environment Abandoned AU2001232934A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US17830400P 2000-01-26 2000-01-26
US60178304 2000-01-26
PCT/US2001/002257 WO2001055628A1 (en) 2000-01-26 2001-01-23 High pressure lift valve for use in semiconductor processing environment

Publications (1)

Publication Number Publication Date
AU2001232934A1 true AU2001232934A1 (en) 2001-08-07

Family

ID=22652016

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2001232934A Abandoned AU2001232934A1 (en) 2000-01-26 2001-01-23 High pressure lift valve for use in semiconductor processing environment

Country Status (3)

Country Link
AU (1) AU2001232934A1 (en)
TW (1) TW466313B (en)
WO (1) WO2001055628A1 (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6748960B1 (en) 1999-11-02 2004-06-15 Tokyo Electron Limited Apparatus for supercritical processing of multiple workpieces
US7105061B1 (en) 2001-11-07 2006-09-12 Novellus Systems, Inc. Method and apparatus for sealing substrate load port in a high pressure reactor
US6764265B2 (en) 2002-01-07 2004-07-20 Applied Materials Inc. Erosion resistant slit valve
US6880560B2 (en) 2002-11-18 2005-04-19 Techsonic Substrate processing apparatus for processing substrates using dense phase gas and sonic waves
US7767145B2 (en) 2005-03-28 2010-08-03 Toyko Electron Limited High pressure fourier transform infrared cell
US7789971B2 (en) 2005-05-13 2010-09-07 Tokyo Electron Limited Treatment of substrate using functionalizing agent in supercritical carbon dioxide
US8877001B2 (en) * 2009-05-07 2014-11-04 Applied Materials, Inc. Shuttered gate valve

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1499491A (en) * 1966-09-30 1967-10-27 Albert Handtmann Metallgiesser Pass-through and shut-off valve, in particular for drinks
DE69103316T2 (en) * 1990-04-20 1995-04-27 Applied Materials Inc Device and method for slit valve.

Also Published As

Publication number Publication date
WO2001055628A1 (en) 2001-08-02
TW466313B (en) 2001-12-01

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