AU2000268980A1 - Methods of making wire grid optical elements by preferential deposition of material on a substrate - Google Patents
Methods of making wire grid optical elements by preferential deposition of material on a substrateInfo
- Publication number
- AU2000268980A1 AU2000268980A1 AU2000268980A AU6898000A AU2000268980A1 AU 2000268980 A1 AU2000268980 A1 AU 2000268980A1 AU 2000268980 A AU2000268980 A AU 2000268980A AU 6898000 A AU6898000 A AU 6898000A AU 2000268980 A1 AU2000268980 A1 AU 2000268980A1
- Authority
- AU
- Australia
- Prior art keywords
- substrate
- methods
- optical elements
- wire grid
- making wire
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
- 230000008021 deposition Effects 0.000 title 1
- 239000000463 material Substances 0.000 title 1
- 230000003287 optical effect Effects 0.000 title 1
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3058—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state comprising electrically conductive elements, e.g. wire grids, conductive particles
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03H—HOLOGRAPHIC PROCESSES OR APPARATUS
- G03H1/00—Holographic processes or apparatus using light, infrared or ultraviolet waves for obtaining holograms or for obtaining an image from them; Details peculiar thereto
- G03H1/02—Details of features involved during the holographic process; Replication of holograms without interference recording
- G03H2001/026—Recording materials or recording processes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Polarising Elements (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/542,256 US6391528B1 (en) | 2000-04-03 | 2000-04-03 | Methods of making wire grid optical elements by preferential deposition of material on a substrate |
US09542256 | 2000-04-03 | ||
PCT/US2000/021712 WO2001075489A1 (en) | 2000-04-03 | 2000-08-09 | Methods of making wire grid optical elements by preferential deposition of material on a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2000268980A1 true AU2000268980A1 (en) | 2001-10-15 |
Family
ID=24162997
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2000268980A Abandoned AU2000268980A1 (en) | 2000-04-03 | 2000-08-09 | Methods of making wire grid optical elements by preferential deposition of material on a substrate |
Country Status (4)
Country | Link |
---|---|
US (2) | US6391528B1 (en) |
KR (1) | KR20020092416A (en) |
AU (1) | AU2000268980A1 (en) |
WO (1) | WO2001075489A1 (en) |
Families Citing this family (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002052305A2 (en) * | 2000-12-27 | 2002-07-04 | Technion Research And Development Foundation Ltd. | Space-variant subwavelength polarization grating and applications thereof |
US6813077B2 (en) * | 2001-06-19 | 2004-11-02 | Corning Incorporated | Method for fabricating an integrated optical isolator and a novel wire grid structure |
US7372630B2 (en) * | 2001-08-17 | 2008-05-13 | Semiconductor Energy Laboratory Co., Ltd. | Laser, irradiation apparatus, laser irradiation method, and method for manufacturing semiconductor device |
US20040027670A1 (en) * | 2001-12-18 | 2004-02-12 | Erez Hasman | Space-variant subwavelength polarization grating and applications thereof |
US6891502B2 (en) * | 2002-01-10 | 2005-05-10 | Mems Optical, Inc. | Variable shape antenna etching system and antenna formed thereby |
US7190521B2 (en) * | 2002-09-13 | 2007-03-13 | Technion Research And Development Foundation Ltd. | Space-variant subwavelength dielectric grating and applications thereof |
US7113336B2 (en) * | 2002-12-30 | 2006-09-26 | Ian Crosby | Microlens including wire-grid polarizer and methods of manufacture |
US7759609B2 (en) * | 2003-03-06 | 2010-07-20 | Yissum Research Development Company Of The Hebrew University Of Jerusalem | Method for manufacturing a patterned structure |
DE10355599B4 (en) * | 2003-11-28 | 2009-05-14 | Qimonda Ag | Method of performing lithographic exposure using polarized electromagnetic radiation in a lithographic exposure apparatus |
DE10358937A1 (en) * | 2003-12-15 | 2005-07-14 | Universität Kassel | Grid panel, for large visible surface areas, is composed of micro-structured diffraction units to give a two-dimensional diffraction of light rays for a variety of design effects |
DE102004006148A1 (en) * | 2004-02-04 | 2005-09-08 | Bausenwein, Bernhard, Dr. | Device and method for reciprocal polarization with complementary Cartesian polarization layers (cross polarizer) |
WO2005083512A2 (en) * | 2004-02-26 | 2005-09-09 | Carl Zeiss Smt Ag | Illumination system for a microlithography projection exposure installation |
JP2005294715A (en) * | 2004-04-05 | 2005-10-20 | Fuji Photo Film Co Ltd | Imaging element and imaging method |
KR100632510B1 (en) * | 2004-04-30 | 2006-10-09 | 엘지전자 주식회사 | Wire grid polarizer and its manufacturing method |
US7820937B2 (en) * | 2004-10-27 | 2010-10-26 | Boston Scientific Scimed, Inc. | Method of applying one or more electromagnetic beams to form a fusion bond on a workpiece such as a medical device |
US7561332B2 (en) * | 2004-11-30 | 2009-07-14 | Agoura Technologies, Inc. | Applications and fabrication techniques for large scale wire grid polarizers |
US7351346B2 (en) * | 2004-11-30 | 2008-04-01 | Agoura Technologies, Inc. | Non-photolithographic method for forming a wire grid polarizer for optical and infrared wavelengths |
KR100661241B1 (en) * | 2005-05-16 | 2006-12-22 | 엘지전자 주식회사 | Fabrication method of optical sheet |
JP4889239B2 (en) * | 2005-05-18 | 2012-03-07 | チェイル インダストリーズ インコーポレイテッド | Backlight unit and liquid crystal display device |
US20080129930A1 (en) * | 2006-12-01 | 2008-06-05 | Agoura Technologies | Reflective polarizer configuration for liquid crystal displays |
RU2009143680A (en) * | 2007-04-26 | 2011-06-10 | Хелиантос Б.В. (Nl) | PHOTOELECTRIC MODULE CONTAINING A LAYER WITH ELECTRIC WIRED SPOTS |
US8541066B2 (en) * | 2007-11-26 | 2013-09-24 | University Of North Carolina At Charlotte | Light-induced directed self-assembly of periodic sub-wavelength nanostructures |
US7771045B2 (en) * | 2008-04-03 | 2010-08-10 | Sol-Grid, Llc | Polarized eyewear |
US8802580B2 (en) * | 2008-11-14 | 2014-08-12 | The Trustees Of Columbia University In The City Of New York | Systems and methods for the crystallization of thin films |
JP5732348B2 (en) * | 2011-08-12 | 2015-06-10 | 株式会社ジャパンディスプレイ | Display device |
US8795788B2 (en) * | 2012-11-14 | 2014-08-05 | Eastman Kodak Company | Method for functional printing system |
CN108369760B (en) | 2015-10-08 | 2021-10-29 | 马德里理工大学 | Optical element with multiple latent images for document security and method of manufacture |
JP6458174B1 (en) * | 2018-01-12 | 2019-01-23 | デクセリアルズ株式会社 | Pattern forming method and manufacturing method of polarizing plate |
Family Cites Families (35)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3833383A (en) * | 1972-08-18 | 1974-09-03 | Rca Corp | Holographic recording medium |
US4049944A (en) | 1973-02-28 | 1977-09-20 | Hughes Aircraft Company | Process for fabricating small geometry semiconductive devices including integrated components |
JPS5590931A (en) | 1978-12-29 | 1980-07-10 | Canon Inc | Production of micro structure element array |
US4289381A (en) | 1979-07-02 | 1981-09-15 | Hughes Aircraft Company | High selectivity thin film polarizer |
US4340617A (en) * | 1980-05-19 | 1982-07-20 | Massachusetts Institute Of Technology | Method and apparatus for depositing a material on a surface |
US4514479A (en) | 1980-07-01 | 1985-04-30 | The United States Of America As Represented By The Secretary Of The Navy | Method of making near infrared polarizers |
US4512638A (en) | 1982-08-31 | 1985-04-23 | Westinghouse Electric Corp. | Wire grid polarizer |
FR2542327B1 (en) | 1983-03-07 | 1986-03-07 | Bensoussan Marcel | |
US4489102A (en) * | 1983-04-04 | 1984-12-18 | At&T Technologies, Inc. | Radiation-stimulated deposition of aluminum |
JPS60230102A (en) | 1984-04-28 | 1985-11-15 | Japan Spectroscopic Co | Infrared wire grating polarizer for vapor deposition in both ways and its manufacture |
US4859548A (en) * | 1985-11-04 | 1989-08-22 | Gerhard Heise | Method for generating a lattice structure with a phase shift on the surface of a substrate |
GB8615908D0 (en) | 1986-06-30 | 1986-08-06 | Hugle W B | Integrated circuits |
US4746934A (en) | 1986-07-07 | 1988-05-24 | Tektronix, Inc. | Color image copying system using a cathode-ray tube with diffraction grating face plate |
JPS6360587A (en) * | 1986-09-01 | 1988-03-16 | Fujitsu Ltd | Manufacture of semiconductor laser |
US4859496A (en) | 1986-09-02 | 1989-08-22 | Matsushita Electric Industrial Co., Ltd. | Method of producing an electrically-conductive transparent film |
US4778744A (en) * | 1986-11-21 | 1988-10-18 | Corning Glass Works | Method for providing high-intensity optical patterns in glass |
US4843031A (en) * | 1987-03-17 | 1989-06-27 | Matsushita Electric Industrial Co., Ltd. | Method of fabricating compound semiconductor laser using selective irradiation |
US4818661A (en) * | 1987-07-21 | 1989-04-04 | The United States Of America As Represented By The Secretary Of The Navy | Method for fabricating thin film metallic meshes for use as Fabry-Perot interferometer elements, filters and other devices |
US5250329A (en) | 1989-04-06 | 1993-10-05 | Microelectronics And Computer Technology Corporation | Method of depositing conductive lines on a dielectric |
US5543251A (en) * | 1990-06-29 | 1996-08-06 | E. I. Du Pont De Nemours And Company | Method of recording plural holographic images into a holographic recording material by temporal interleaving |
JP3257807B2 (en) | 1991-05-17 | 2002-02-18 | 理化学研究所 | Method for forming periodic microstructure on solid surface |
US5415835A (en) * | 1992-09-16 | 1995-05-16 | University Of New Mexico | Method for fine-line interferometric lithography |
DE4315959C2 (en) | 1993-05-12 | 1997-09-11 | Max Planck Gesellschaft | Method for producing a structured layer of a semiconductor material and a doping structure in a semiconductor material under the action of laser radiation |
JPH0720766A (en) | 1993-06-29 | 1995-01-24 | Canon Inc | Production of hologram and display device |
JPH08184711A (en) | 1994-12-29 | 1996-07-16 | Sony Corp | Polarization optical element |
US5771098A (en) | 1996-09-27 | 1998-06-23 | Fed Corporation | Laser interferometric lithographic system providing automatic change of fringe spacing |
JP3704843B2 (en) | 1995-10-24 | 2005-10-12 | 凸版印刷株式会社 | Non-contact non-destructive material evaluation method and apparatus, elastic wave excitation method and elastic wave excitation apparatus |
CA2188705A1 (en) * | 1995-10-24 | 1997-04-25 | Noritaka Nakaso | Method and apparatus for exciting bulk acoustic wave |
JP3624561B2 (en) | 1996-03-12 | 2005-03-02 | 旭硝子株式会社 | Optical modulation element and optical head device |
DE69736022T2 (en) | 1996-03-18 | 2006-10-26 | Matsushita Electric Industrial Co., Ltd., Kadoma | exposure apparatus |
US5991075A (en) | 1996-11-25 | 1999-11-23 | Ricoh Company, Ltd. | Light polarizer and method of producing the light polarizer |
GB2329484A (en) | 1997-09-22 | 1999-03-24 | Northern Telecom Ltd | Writing Bragg reflection gratings in optical waveguides |
US5955221A (en) | 1997-11-21 | 1999-09-21 | The Regents Of The University Of California | Method and apparatus for fabrication of high gradient insulators with parallel surface conductors spaced less than one millimeter apart |
JP3639840B2 (en) | 1998-01-12 | 2005-04-20 | 学校法人立命館 | Manufacturing method of ultrafine periodic structure |
JP3430224B2 (en) | 1998-06-02 | 2003-07-28 | 学校法人立命館 | Manufacturing method of ultrafine periodic structure |
-
2000
- 2000-04-03 US US09/542,256 patent/US6391528B1/en not_active Expired - Fee Related
- 2000-08-09 WO PCT/US2000/021712 patent/WO2001075489A1/en active Application Filing
- 2000-08-09 AU AU2000268980A patent/AU2000268980A1/en not_active Abandoned
-
2001
- 2001-03-28 US US09/820,299 patent/US20010028925A1/en not_active Abandoned
- 2001-04-02 KR KR1020027013186A patent/KR20020092416A/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR20020092416A (en) | 2002-12-11 |
US6391528B1 (en) | 2002-05-21 |
US20010028925A1 (en) | 2001-10-11 |
WO2001075489A1 (en) | 2001-10-11 |
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