ATE527754T1 - Akustischer volumenwellenresonator und herstellungsverfahren dafür - Google Patents
Akustischer volumenwellenresonator und herstellungsverfahren dafürInfo
- Publication number
- ATE527754T1 ATE527754T1 AT10158033T AT10158033T ATE527754T1 AT E527754 T1 ATE527754 T1 AT E527754T1 AT 10158033 T AT10158033 T AT 10158033T AT 10158033 T AT10158033 T AT 10158033T AT E527754 T1 ATE527754 T1 AT E527754T1
- Authority
- AT
- Austria
- Prior art keywords
- region
- value
- production method
- wave resonator
- stack
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000000758 substrate Substances 0.000 abstract 3
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract 2
- 229910052710 silicon Inorganic materials 0.000 abstract 2
- 239000010703 silicon Substances 0.000 abstract 2
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/15—Constructional features of resonators consisting of piezoelectric or electrostrictive material
- H03H9/17—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator
- H03H9/171—Constructional features of resonators consisting of piezoelectric or electrostrictive material having a single resonator implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
- H03H9/172—Means for mounting on a substrate, i.e. means constituting the material interface confining the waves to a volume
- H03H9/173—Air-gaps
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
- H03H2003/021—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks the resonators or networks being of the air-gap type
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0953373 | 2009-05-20 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE527754T1 true ATE527754T1 (de) | 2011-10-15 |
Family
ID=41449965
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT10158033T ATE527754T1 (de) | 2009-05-20 | 2010-03-26 | Akustischer volumenwellenresonator und herstellungsverfahren dafür |
Country Status (3)
Country | Link |
---|---|
US (1) | US8456258B2 (de) |
EP (1) | EP2254243B1 (de) |
AT (1) | ATE527754T1 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9479139B2 (en) | 2010-04-29 | 2016-10-25 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Resonator device including electrode with buried temperature compensating layer |
US9197185B2 (en) | 2010-04-29 | 2015-11-24 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Resonator device including electrodes with buried temperature compensating layers |
JP5904591B2 (ja) * | 2012-03-15 | 2016-04-13 | 太陽誘電株式会社 | 弾性波デバイス |
US9246467B2 (en) | 2012-05-31 | 2016-01-26 | Texas Instruments Incorporated | Integrated resonator with a mass bias |
CN111082777B (zh) * | 2019-12-31 | 2021-03-12 | 诺思(天津)微系统有限责任公司 | 底电极为空隙电极的体声波谐振器、滤波器及电子设备 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4074493B2 (ja) * | 2001-08-31 | 2008-04-09 | 日本碍子株式会社 | セラミック素子 |
JP3830843B2 (ja) * | 2002-03-28 | 2006-10-11 | 株式会社東芝 | 薄膜圧電共振子 |
US20060017352A1 (en) * | 2004-07-20 | 2006-01-26 | Aram Tanielian | Thin device and method of fabrication |
-
2010
- 2010-03-26 EP EP10158033A patent/EP2254243B1/de not_active Not-in-force
- 2010-03-26 AT AT10158033T patent/ATE527754T1/de not_active IP Right Cessation
- 2010-05-19 US US12/783,095 patent/US8456258B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
US8456258B2 (en) | 2013-06-04 |
US20100295631A1 (en) | 2010-11-25 |
EP2254243B1 (de) | 2011-10-05 |
EP2254243A1 (de) | 2010-11-24 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |