ATE526692T1 - PROZEß FÜR DIE HERSTELLUNG EINES ORGANISCHEN HALBLEITERFILMS - Google Patents
PROZEß FÜR DIE HERSTELLUNG EINES ORGANISCHEN HALBLEITERFILMSInfo
- Publication number
- ATE526692T1 ATE526692T1 AT02794455T AT02794455T ATE526692T1 AT E526692 T1 ATE526692 T1 AT E526692T1 AT 02794455 T AT02794455 T AT 02794455T AT 02794455 T AT02794455 T AT 02794455T AT E526692 T1 ATE526692 T1 AT E526692T1
- Authority
- AT
- Austria
- Prior art keywords
- blend
- making
- semiconductor film
- organic semiconductor
- present
- Prior art date
Links
- 239000004065 semiconductor Substances 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 3
- 239000000203 mixture Substances 0.000 abstract 3
- 239000002904 solvent Substances 0.000 abstract 2
- 239000000463 material Substances 0.000 abstract 1
- 239000011368 organic material Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/13—Deposition of organic active material using liquid deposition, e.g. spin coating using printing techniques, e.g. ink-jet printing or screen printing
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
- H10K71/10—Deposition of organic active material
- H10K71/12—Deposition of organic active material using liquid deposition, e.g. spin coating
- H10K71/15—Deposition of organic active material using liquid deposition, e.g. spin coating characterised by the solvent used
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
- H10K10/40—Organic transistors
- H10K10/46—Field-effect transistors, e.g. organic thin-film transistors [OTFT]
- H10K10/462—Insulated gate field-effect transistors [IGFETs]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
- H10K85/10—Organic polymers or oligomers
- H10K85/111—Organic polymers or oligomers comprising aromatic, heteroaromatic, or aryl chains, e.g. polyaniline, polyphenylene or polyphenylene vinylene
- H10K85/113—Heteroaromatic compounds comprising sulfur or selene, e.g. polythiophene
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/058,704 US6541300B1 (en) | 2002-01-28 | 2002-01-28 | Semiconductor film and process for its preparation |
| PCT/US2002/041765 WO2003065409A2 (en) | 2002-01-28 | 2002-12-31 | Semiconductor film and process for its preparation |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE526692T1 true ATE526692T1 (de) | 2011-10-15 |
Family
ID=22018399
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT02794455T ATE526692T1 (de) | 2002-01-28 | 2002-12-31 | PROZEß FÜR DIE HERSTELLUNG EINES ORGANISCHEN HALBLEITERFILMS |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US6541300B1 (de) |
| EP (1) | EP1472718B1 (de) |
| CN (1) | CN1618135B (de) |
| AT (1) | ATE526692T1 (de) |
| WO (1) | WO2003065409A2 (de) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4736324B2 (ja) * | 2002-04-22 | 2011-07-27 | コニカミノルタホールディングス株式会社 | 半導体素子及びその製造方法 |
| DE102005039528A1 (de) * | 2005-08-18 | 2007-02-22 | Merck Patent Gmbh | Lösungen organischer Halbleiter |
| KR100730223B1 (ko) | 2006-07-21 | 2007-06-19 | 삼성에스디아이 주식회사 | 유기 박막 트랜지스터의 제조방법 |
| KR20080025525A (ko) * | 2006-09-18 | 2008-03-21 | 삼성전자주식회사 | 용매 효과를 이용한 유기박막 형성방법, 그에 의해 제조된유기박막 및 이를 포함하는 유기 전자 소자 |
| US7892454B2 (en) * | 2006-11-17 | 2011-02-22 | Polyera Corporation | Acene-based organic semiconductor materials and methods of preparing and using the same |
| WO2009109273A1 (en) * | 2008-03-06 | 2009-09-11 | Merck Patent Gmbh | Organic semiconductor formulation |
| JP5480510B2 (ja) * | 2008-03-31 | 2014-04-23 | 住友化学株式会社 | 有機半導体組成物、並びに有機薄膜及びこれを備える有機薄膜素子 |
| FR2950366A1 (fr) * | 2009-09-23 | 2011-03-25 | Commissariat Energie Atomique | Procede de cristallisation de materiaux |
| EP2559078A1 (de) | 2010-04-12 | 2013-02-20 | Merck Patent GmbH | Zusammensetzung mit verbesserter leistungsfähigkeit |
| CN101879795B (zh) * | 2010-06-08 | 2012-11-07 | 黑龙江大学 | 酞菁/TiO2有序薄膜及其制备方法 |
| TWI551604B (zh) | 2010-07-13 | 2016-10-01 | 住友化學股份有限公司 | 有機半導體組成物、有機薄膜及具備該有機薄膜之有機薄膜電晶體 |
| CN108117563B (zh) * | 2017-11-28 | 2019-12-03 | 华南协同创新研究院 | 一种含蒽并二噻吩的有机小分子半导体材料及其制备方法和应用 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6114088A (en) * | 1999-01-15 | 2000-09-05 | 3M Innovative Properties Company | Thermal transfer element for forming multilayer devices |
| WO2000059267A1 (fr) * | 1999-03-29 | 2000-10-05 | Seiko Epson Corporation | Composition, procede de preparation d'un film, et element fonctionnel et son procede de preparation |
| GB9920543D0 (en) | 1999-08-31 | 1999-11-03 | Cambridge Display Tech Ltd | A formulation for depositing a light-emitting polymer layer |
-
2002
- 2002-01-28 US US10/058,704 patent/US6541300B1/en not_active Expired - Fee Related
- 2002-12-31 CN CN02827690.6A patent/CN1618135B/zh not_active Expired - Fee Related
- 2002-12-31 WO PCT/US2002/041765 patent/WO2003065409A2/en not_active Application Discontinuation
- 2002-12-31 EP EP02794455A patent/EP1472718B1/de not_active Expired - Lifetime
- 2002-12-31 AT AT02794455T patent/ATE526692T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1472718B1 (de) | 2011-09-28 |
| CN1618135A (zh) | 2005-05-18 |
| WO2003065409A2 (en) | 2003-08-07 |
| EP1472718A4 (de) | 2007-08-29 |
| WO2003065409A3 (en) | 2003-10-16 |
| US6541300B1 (en) | 2003-04-01 |
| EP1472718A2 (de) | 2004-11-03 |
| CN1618135B (zh) | 2010-05-26 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| ATE526692T1 (de) | PROZEß FÜR DIE HERSTELLUNG EINES ORGANISCHEN HALBLEITERFILMS | |
| ATE442673T1 (de) | Verfahren zur herstellung von tansistoren | |
| ATE537554T1 (de) | Vorläufer für die filmbildung und verfahren zur bildung eines rutheniumhaltigen films | |
| EA200970222A1 (ru) | Подложка с нанесенным экструзионным способом покрытием | |
| ATE486277T1 (de) | Feldeffektransistor mit funktionalisierter kohlenstoffnanoröhre und dessen herstellungsfervahren | |
| DE60239297D1 (de) | Polyolefin mit verbesserter kratzfestigkeit und verfahren zu seiner herstelung | |
| AU2001252982A1 (en) | Assembly of free-standing films using a layer-by-layer process | |
| DE60125819D1 (de) | Feldeffekttransistoren und materialien und verfahren zu ihrer herstellung | |
| DE60141706D1 (de) | Verbindungen mit fungizider wirkung und verfahren zur ihrer herstellung und verwendung | |
| TW200606592A (en) | Sublayer coating-forming composition containing naphthalene ring having halogen atom for lithography | |
| DK0537657T3 (da) | Fremgangsmåde til forbedring af de mekaniske egenskaber ved et- og flerlagsfolier | |
| DE60332638D1 (de) | Verfahren zur Herstellung eines optischen Gerätes | |
| ATE271095T1 (de) | Antiblockierungszusammensetzungen und verfahren zur herstellung | |
| TW200702910A (en) | Underlayer coating forming composition for lithography containing polysilane compound | |
| BR9907839B1 (pt) | filme de polipropileno multicamada biaxialmente orientado, possuindo propriedades de barreira aperfeiÇoadas, processo para a sua produÇço, e, utilizaÇço do filme. | |
| ATE502970T1 (de) | Verfahren zur herstellung von regioregulären polymeren | |
| ATE502969T1 (de) | Verfahren zur herstellung von regioregulären polymeren | |
| TW200704681A (en) | Film roll of polyamide-based blend resin and process for producing the same | |
| ATE490036T1 (de) | Bearbeitungseinrichtung und verwendung derselben zur herstellung von deckeln mit aufreissfolie | |
| HK1049491A1 (en) | Inorganic coating composition, a method for producing same and the use thereof | |
| DE69901886D1 (de) | Verfahren zur herstellung eines sicherheitsgegenstands | |
| NO20011988L (no) | Resinsammensetninger, fremgangsmåte for fremstilling av resinsammensetninger og fyllstoffblanding for resinsammensetninger | |
| DE50205517D1 (de) | Polyorganosiloxan-zusammensetzung | |
| ATE312772T1 (de) | Folien, verpackungen und verfahren zu ihrer herstellung | |
| HUP0100974A2 (hu) | Integrált additív készítmény, eljárás előállítására és alkalmazására |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |