ATE510936T1 - Vorrichtung zum eintragen von vorläufern in eine kammer in gepulstem modus mit messung und regelung der strömungsrate - Google Patents

Vorrichtung zum eintragen von vorläufern in eine kammer in gepulstem modus mit messung und regelung der strömungsrate

Info

Publication number
ATE510936T1
ATE510936T1 AT05796061T AT05796061T ATE510936T1 AT E510936 T1 ATE510936 T1 AT E510936T1 AT 05796061 T AT05796061 T AT 05796061T AT 05796061 T AT05796061 T AT 05796061T AT E510936 T1 ATE510936 T1 AT E510936T1
Authority
AT
Austria
Prior art keywords
chamber
tank
injector
control
measurement
Prior art date
Application number
AT05796061T
Other languages
English (en)
Inventor
Frederic Poignant
Samuel Bonnafous
Jean-Manuel Decams
Herve Guillon
Original Assignee
Qualiflow Therm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Qualiflow Therm filed Critical Qualiflow Therm
Application granted granted Critical
Publication of ATE510936T1 publication Critical patent/ATE510936T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45557—Pulsed pressure or control pressure
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00—Control of fluid pressure
    • G05D16/20—Control of fluid pressure characterised by the use of electric means
    • G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/2013—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means
    • G05D16/2026—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means
    • G05D16/2046—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means the plurality of throttling means being arranged for the control of a single pressure from a plurality of converging pressures
    • G05D16/2053—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using throttling means as controlling means with a plurality of throttling means the plurality of throttling means being arranged for the control of a single pressure from a plurality of converging pressures the plurality of throttling means comprising only a first throttling means acting on a higher pressure and a second throttling means acting on a lower pressure, e.g. the atmosphere
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0688—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by combined action on throttling means and flow sources

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Fluid Mechanics (AREA)
  • Materials Engineering (AREA)
  • Automation & Control Theory (AREA)
  • Metallurgy (AREA)
  • Dispersion Chemistry (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Flow Control (AREA)
  • Automatic Analysis And Handling Materials Therefor (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
AT05796061T 2004-08-06 2005-08-05 Vorrichtung zum eintragen von vorläufern in eine kammer in gepulstem modus mit messung und regelung der strömungsrate ATE510936T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0408704A FR2874028B1 (fr) 2004-08-06 2004-08-06 Dispositif d'introduction dans une enceinte de precurseurs liquides en mode pulse avec mesure et controle du debit
PCT/FR2005/002049 WO2006021670A2 (fr) 2004-08-06 2005-08-05 Dispositif d'introduction dans une enceinte de precurseurs liquides en mode pulse avec mesure et controle du debit

Publications (1)

Publication Number Publication Date
ATE510936T1 true ATE510936T1 (de) 2011-06-15

Family

ID=34947520

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05796061T ATE510936T1 (de) 2004-08-06 2005-08-05 Vorrichtung zum eintragen von vorläufern in eine kammer in gepulstem modus mit messung und regelung der strömungsrate

Country Status (5)

Country Link
US (1) US20100012027A1 (de)
EP (1) EP1786950B1 (de)
AT (1) ATE510936T1 (de)
FR (1) FR2874028B1 (de)
WO (1) WO2006021670A2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2900070B1 (fr) 2006-04-19 2008-07-11 Kemstream Soc Par Actions Simp Dispositif d'introduction ou d'injection ou de pulverisation d'un melange de gaz vecteur et de composes liquides et procede de mise en oeuvre dudit dispositif.
TWI506391B (zh) * 2010-04-15 2015-11-01 Novellus Systems Inc 氣體及液體注射系統
JP6158111B2 (ja) * 2014-02-12 2017-07-05 東京エレクトロン株式会社 ガス供給方法及び半導体製造装置
CN106125775B (zh) * 2016-07-05 2018-12-04 中国核动力研究设计院 基于对蒸汽流量进行蒸发、计量及控制的方法
CN106125776B (zh) * 2016-07-05 2018-10-30 中国核动力研究设计院 对蒸汽流量进行蒸发、计量及自动控制的方法
DE102019106682B4 (de) * 2019-03-15 2022-07-07 Bürkert Werke GmbH & Co. KG Druckregler
US11459654B2 (en) * 2020-11-19 2022-10-04 Eugenus, Inc. Liquid precursor injection for thin film deposition

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3347418A (en) * 1965-10-23 1967-10-17 Polaroid Corp Liquid dispenser utilizing controlled gas pressure
DE3222425A1 (de) * 1982-06-15 1983-12-22 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Generator zum antrieb eines piezoresonators
JPS61175565A (ja) * 1985-01-30 1986-08-07 Shimadzu Corp 高速液体クロマトグラフ
FR2586307B1 (fr) * 1985-08-19 1988-09-16 Sfr Sa Robinetterie Ensemble de prelevement et de regulation du debit et de la pression d'un liquide
JPH05215738A (ja) * 1992-02-06 1993-08-24 Shimadzu Corp 高速液体クロマトグラフ装置
FR2707671B1 (fr) * 1993-07-12 1995-09-15 Centre Nat Rech Scient Procédé et dispositif d'introduction de précurseurs dans une enceinte de dépôt chimique en phase vapeur.
US5450743A (en) * 1994-01-10 1995-09-19 Zymark Corporation Method for providing constant flow in liquid chromatography system
US5620524A (en) * 1995-02-27 1997-04-15 Fan; Chiko Apparatus for fluid delivery in chemical vapor deposition systems
US5806716A (en) * 1996-08-29 1998-09-15 Optima Corporation Mass flow, fluid measuring and dispensing system
WO1998010116A1 (en) * 1996-09-05 1998-03-12 Talison Research Ultrasonic nozzle feed for plasma deposited film networks
US6176930B1 (en) * 1999-03-04 2001-01-23 Applied Materials, Inc. Apparatus and method for controlling a flow of process material to a deposition chamber
DE10061188A1 (de) * 2000-12-08 2002-07-11 Knf Flodos Ag Sursee Pulsationsdämpfer
US6630028B2 (en) * 2000-12-08 2003-10-07 Glass Equipment Development, Inc. Controlled dispensing of material
US20030098069A1 (en) * 2001-11-26 2003-05-29 Sund Wesley E. High purity fluid delivery system

Also Published As

Publication number Publication date
EP1786950A2 (de) 2007-05-23
FR2874028B1 (fr) 2006-10-27
WO2006021670A2 (fr) 2006-03-02
EP1786950B1 (de) 2011-05-25
FR2874028A1 (fr) 2006-02-10
US20100012027A1 (en) 2010-01-21
WO2006021670A3 (fr) 2006-05-04

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