ATE477217T1 - Mikro-entladungsvorrichtungen und anwendungen - Google Patents

Mikro-entladungsvorrichtungen und anwendungen

Info

Publication number
ATE477217T1
ATE477217T1 AT03800335T AT03800335T ATE477217T1 AT E477217 T1 ATE477217 T1 AT E477217T1 AT 03800335 T AT03800335 T AT 03800335T AT 03800335 T AT03800335 T AT 03800335T AT E477217 T1 ATE477217 T1 AT E477217T1
Authority
AT
Austria
Prior art keywords
applications
cathode
discharge devices
gas discharge
micro discharge
Prior art date
Application number
AT03800335T
Other languages
English (en)
Inventor
James Cooper
Karl Schoenbach
Original Assignee
Ultraviolet Sciences Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ultraviolet Sciences Inc filed Critical Ultraviolet Sciences Inc
Application granted granted Critical
Publication of ATE477217T1 publication Critical patent/ATE477217T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C02F1/325—Irradiation devices or lamp constructions
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/04—Electrodes; Screens; Shields
    • H01J61/06—Main electrodes
    • H01J61/09—Hollow cathodes
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/02—Non-contaminated water, e.g. for industrial water supply
    • C02F2103/04—Non-contaminated water, e.g. for industrial water supply for obtaining ultra-pure water
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/322—Lamp arrangement
    • C02F2201/3226—Units using UV-light emitting lasers
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/32—Details relating to UV-irradiation devices
    • C02F2201/326—Lamp control systems

Landscapes

  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Water Supply & Treatment (AREA)
  • Toxicology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Discharge Lamp (AREA)
  • Physical Water Treatments (AREA)
  • Gas-Filled Discharge Tubes (AREA)
  • Treatment Of Water By Oxidation Or Reduction (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Saccharide Compounds (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
AT03800335T 2003-01-02 2003-12-29 Mikro-entladungsvorrichtungen und anwendungen ATE477217T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US43827003P 2003-01-02 2003-01-02
PCT/US2003/041584 WO2004060813A1 (en) 2003-01-02 2003-12-29 Micro-discharge devices and applications

Publications (1)

Publication Number Publication Date
ATE477217T1 true ATE477217T1 (de) 2010-08-15

Family

ID=32713308

Family Applications (1)

Application Number Title Priority Date Filing Date
AT03800335T ATE477217T1 (de) 2003-01-02 2003-12-29 Mikro-entladungsvorrichtungen und anwendungen

Country Status (8)

Country Link
US (2) US7439663B2 (de)
EP (1) EP1581458B1 (de)
JP (1) JP5025903B2 (de)
AT (1) ATE477217T1 (de)
AU (1) AU2003300077A1 (de)
CA (1) CA2511554C (de)
DE (1) DE60333792D1 (de)
WO (1) WO2004060813A1 (de)

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7226542B2 (en) * 2003-08-22 2007-06-05 Anvik Corporation Fluid treatment apparatus
US8471171B2 (en) * 2004-05-28 2013-06-25 Robert O. Price Cold air atmospheric pressure micro plasma jet application method and device
US8502108B2 (en) * 2004-05-28 2013-08-06 Old Dominion University Research Foundation Method and device for creating a micro plasma jet
US7573202B2 (en) * 2004-10-04 2009-08-11 The Board Of Trustees Of The University Of Illinois Metal/dielectric multilayer microdischarge devices and arrays
US7477017B2 (en) 2005-01-25 2009-01-13 The Board Of Trustees Of The University Of Illinois AC-excited microcavity discharge device and method
US9083392B2 (en) * 2005-05-17 2015-07-14 The Regents Of The University Of Michigan Wireless sensing and communication utilizing RF transmissions from microdischarges
US9808544B2 (en) * 2005-08-31 2017-11-07 Ultraviolet Sciences, Inc. Ultraviolet light treatment chamber
US7511281B2 (en) * 2005-08-31 2009-03-31 Ultraviolet Sciences, Inc. Ultraviolet light treatment chamber
US9511344B2 (en) 2007-12-18 2016-12-06 Ultraviolet Sciences, Inc. Ultraviolet light treatment chamber
JP2007250284A (ja) * 2006-03-14 2007-09-27 National Univ Corp Shizuoka Univ プラズマ電極
WO2007146279A2 (en) * 2006-06-12 2007-12-21 The Board Of Trustees Of The University Of Illinois Low voltage microcavity plasma device and addressable arrays
US20080284335A1 (en) * 2007-05-16 2008-11-20 Ultraviolet Sciences, Inc. Discharge lamp
US8029105B2 (en) * 2007-10-17 2011-10-04 Eastman Kodak Company Ambient plasma treatment of printer components
US8196449B2 (en) * 2007-11-27 2012-06-12 Honeywell International Inc. Micro discharge device capable of low voltage discharges in a variety of carrier gases for detection and/or ionization
EP2511007A1 (de) * 2007-11-29 2012-10-17 Corning Incorporated Vorrichtung und Verfahren zur strahlungsunterstützten chemischen Verarbeitung
US8220753B2 (en) * 2008-01-04 2012-07-17 The Boeing Company Systems and methods for controlling flows with pulsed discharges
US8609203B2 (en) * 2008-06-06 2013-12-17 Fujifilm Manufacturing Europe B.V. Method and apparatus for plasma surface treatment of moving substrate
US9446840B2 (en) * 2008-07-01 2016-09-20 The Boeing Company Systems and methods for alleviating aircraft loads with plasma actuators
US7910896B2 (en) * 2008-07-25 2011-03-22 Honeywell International Inc. Micro discharge device ionizer and method of fabricating the same
RU2396092C1 (ru) * 2009-05-20 2010-08-10 Яков Абраммерович Гольдштейн Установка для обеззараживания воздуха
DE102009041132B4 (de) 2009-09-14 2014-08-14 Schott Ag Verfahren zur Herstellung einer Gleitschicht und pharmazeutisches Packmittel mit Gleitschicht
CA2812947C (en) 2010-09-29 2021-06-29 Ultraviolet Sciences, Inc. Excimer light source
DE102011009057B4 (de) 2011-01-20 2015-12-10 Schott Ag Plasma-Behandlungsvorrichtung zur Herstellung von Beschichtungen und Verfahren zur innenseitigen Plasmabehandlung von Behältern
TWI510142B (zh) * 2013-06-06 2015-11-21 Univ Tamkang Micro plasma device
KR101355187B1 (ko) * 2012-03-22 2014-01-27 (주)지니아텍 공기 청정기용 플라즈마 발생모듈 및 플라즈마 발생모듈 제조방법
US9153427B2 (en) * 2012-12-18 2015-10-06 Agilent Technologies, Inc. Vacuum ultraviolet photon source, ionization apparatus, and related methods
US20150022075A1 (en) * 2013-07-22 2015-01-22 Anderson Remplex, Inc. Dielectric Barrier Discharge Apparatus
TWI569690B (zh) * 2015-01-23 2017-02-01 國立臺灣大學 一種電漿產生裝置與其製備方法
US10271415B2 (en) * 2016-04-30 2019-04-23 The Boeing Company Semiconductor micro-hollow cathode discharge device for plasma jet generation
CN106430429B (zh) * 2016-12-01 2019-06-21 潘敏 一种偶氮类染料化学废液成份分析装置
US20220221799A1 (en) * 2019-05-22 2022-07-14 The Board of Tristees of th University of Illinois Photoresist-free deposition and patterning with vacuum ultraviolet lamps

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5686789A (en) * 1995-03-14 1997-11-11 Osram Sylvania Inc. Discharge device having cathode with micro hollow array
US5561348A (en) * 1995-04-10 1996-10-01 Old Dominion University Field controlled plasma discharge device
US6194821B1 (en) * 1997-02-12 2001-02-27 Quark Systems Co., Ltd. Decomposition apparatus of organic compound, decomposition method thereof, excimer UV lamp and excimer emission apparatus
US6016027A (en) * 1997-05-19 2000-01-18 The Board Of Trustees Of The University Of Illinois Microdischarge lamp
DE19919169A1 (de) * 1999-04-28 2000-11-02 Philips Corp Intellectual Pty Vorrichtung zur Desinfektion von Wasser mit einer UV-C-Gasentladungslampe
US6433480B1 (en) * 1999-05-28 2002-08-13 Old Dominion University Direct current high-pressure glow discharges
US6201355B1 (en) * 1999-11-08 2001-03-13 Triton Thalassic Technologies, Inc. Lamp for generating high power ultraviolet radiation
US6703771B2 (en) * 2000-06-08 2004-03-09 Trustees Of Stevens Institute Of Technology Monochromatic vacuum ultraviolet light source for photolithography applications based on a high-pressure microhollow cathode discharge
US6633109B2 (en) * 2001-01-08 2003-10-14 Ushio America, Inc. Dielectric barrier discharge-driven (V)UV light source for fluid treatment
US6695664B2 (en) * 2001-10-26 2004-02-24 Board Of Trustees Of The University Of Illinois Microdischarge devices and arrays
US7349663B1 (en) * 2003-04-24 2008-03-25 Leave A Little Room Foundation Internet radio station and disc jockey system

Also Published As

Publication number Publication date
EP1581458A1 (de) 2005-10-05
DE60333792D1 (de) 2010-09-23
CA2511554C (en) 2013-07-09
CA2511554A1 (en) 2004-07-22
US20080174241A1 (en) 2008-07-24
US20040144733A1 (en) 2004-07-29
US7439663B2 (en) 2008-10-21
JP2006512201A (ja) 2006-04-13
WO2004060813A1 (en) 2004-07-22
AU2003300077A1 (en) 2004-07-29
JP5025903B2 (ja) 2012-09-12
EP1581458B1 (de) 2010-08-11

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties