ATE455360T1 - Rasterelektronenmikroskop - Google Patents
RasterelektronenmikroskopInfo
- Publication number
- ATE455360T1 ATE455360T1 AT97912354T AT97912354T ATE455360T1 AT E455360 T1 ATE455360 T1 AT E455360T1 AT 97912354 T AT97912354 T AT 97912354T AT 97912354 T AT97912354 T AT 97912354T AT E455360 T1 ATE455360 T1 AT E455360T1
- Authority
- AT
- Austria
- Prior art keywords
- specimen
- electron microscope
- scanning electron
- collisions
- holder
- Prior art date
Links
- 230000000694 effects Effects 0.000 abstract 1
- 230000005684 electric field Effects 0.000 abstract 1
- 230000000977 initiatory effect Effects 0.000 abstract 1
- 230000003993 interaction Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/04—Means for controlling the discharge
- H01J2237/047—Changing particle velocity
- H01J2237/0473—Changing particle velocity accelerating
- H01J2237/04735—Changing particle velocity accelerating with electrostatic means
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/18—Vacuum control means
- H01J2237/188—Differential pressure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/20—Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
- H01J2237/2002—Controlling environment of sample
- H01J2237/2003—Environmental cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2444—Electron Multiplier
- H01J2237/24445—Electron Multiplier using avalanche in a gas
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2445—Photon detectors for X-rays, light, e.g. photomultipliers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/26—Electron or ion microscopes
- H01J2237/2602—Details
- H01J2237/2605—Details operating at elevated pressures, e.g. atmosphere
- H01J2237/2608—Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB9623768.0A GB9623768D0 (en) | 1996-11-15 | 1996-11-15 | Scanning electron microscope |
| PCT/GB1997/003136 WO1998022971A2 (en) | 1996-11-15 | 1997-11-14 | Scanning electron microscope |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE455360T1 true ATE455360T1 (de) | 2010-01-15 |
Family
ID=10802979
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT97912354T ATE455360T1 (de) | 1996-11-15 | 1997-11-14 | Rasterelektronenmikroskop |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US6365898B1 (de) |
| EP (1) | EP0939969B1 (de) |
| KR (1) | KR20000068981A (de) |
| AT (1) | ATE455360T1 (de) |
| AU (1) | AU4958797A (de) |
| BR (1) | BR9713032A (de) |
| DE (1) | DE69739739D1 (de) |
| GB (2) | GB9623768D0 (de) |
| WO (1) | WO1998022971A2 (de) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6327491B1 (en) | 1998-07-06 | 2001-12-04 | Neutar, Llc | Customized surgical fixture |
| US7462839B2 (en) | 2000-07-07 | 2008-12-09 | Carl Zeiss Nts Gmbh | Detector for variable pressure areas and an electron microscope comprising a corresponding detector |
| GB2367686B (en) * | 2000-08-10 | 2002-12-11 | Leo Electron Microscopy Ltd | Improvements in or relating to particle detectors |
| JP2002289129A (ja) | 2001-03-26 | 2002-10-04 | Jeol Ltd | 低真空走査電子顕微鏡 |
| US20050103272A1 (en) | 2002-02-25 | 2005-05-19 | Leo Elektronenmikroskopie Gmbh | Material processing system and method |
| WO2003104846A2 (en) * | 2002-06-05 | 2003-12-18 | Quantomix Ltd. | A sample enclosure for a scanning electron microscope and methods of use thereof |
| IL150056A0 (en) | 2002-06-05 | 2002-12-01 | Yeda Res & Dev | Low-pressure chamber for scanning electron microscopy in a wet environment |
| CZ20022105A3 (cs) * | 2002-06-17 | 2004-02-18 | Tescan, S. R. O. | Detektor sekundárních elektronů, zejména v rastrovacím elektronovém mikroskopu |
| GB0300474D0 (en) * | 2003-01-09 | 2003-02-12 | Univ Cambridge Tech | Detector for enviromental scanning electron microscope |
| US20070125947A1 (en) * | 2003-02-20 | 2007-06-07 | David Sprinzak | Sample enclosure for a scanning electron microscope and methods of use thereof |
| KR100994516B1 (ko) * | 2006-02-02 | 2010-11-15 | 전자빔기술센터 주식회사 | 전자 칼럼용 진공 차등 유지 기구 |
| WO2008098084A1 (en) * | 2007-02-06 | 2008-08-14 | Fei Company | High pressure charged particle beam system |
| EP2061067A3 (de) | 2007-11-13 | 2010-04-07 | Carl Zeiss SMT Limited | Strahlenvorrichtung und Verfahren mit einer Partikelstrahlenvorrichtung und optischem Mikroskop |
| US8299432B2 (en) * | 2008-11-04 | 2012-10-30 | Fei Company | Scanning transmission electron microscope using gas amplification |
| US8481962B2 (en) * | 2010-08-10 | 2013-07-09 | Fei Company | Distributed potential charged particle detector |
| GB2484517B (en) | 2010-10-14 | 2016-03-30 | Carl Zeiss Nts Ltd | Improvements in and relating to charged particle beam devices |
| US9679741B2 (en) | 2010-11-09 | 2017-06-13 | Fei Company | Environmental cell for charged particle beam system |
| CN104508791B (zh) * | 2012-07-30 | 2017-03-01 | Fei 公司 | 环境扫描电子显微镜气体喷射系统 |
| US9123506B2 (en) * | 2013-06-10 | 2015-09-01 | Fei Company | Electron beam-induced etching |
| EP3176808B1 (de) | 2015-12-03 | 2019-10-16 | Carl Zeiss Microscopy Ltd. | Verfahren zur detektion geladener partikel und partikelstrahlvorrichtung zur durchführung des verfahrens |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL7902963A (nl) * | 1979-04-13 | 1980-10-15 | Philips Nv | Detektor voor elektronenmikroskoop. |
| US4596929A (en) * | 1983-11-21 | 1986-06-24 | Nanometrics Incorporated | Three-stage secondary emission electron detection in electron microscopes |
| EP0275306B1 (de) * | 1986-08-01 | 1990-10-24 | Electro-Scan Corporation | Mehrzwecksgasdetektoranordnung fuer elektronmikroskopen |
| US4823006A (en) * | 1987-05-21 | 1989-04-18 | Electroscan Corporation | Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope |
| US4785182A (en) * | 1987-05-21 | 1988-11-15 | Electroscan Corporation | Secondary electron detector for use in a gaseous atmosphere |
| DE3729846A1 (de) * | 1987-09-05 | 1989-03-23 | Zeiss Carl Fa | Kathodolumineszenzdetektor |
| US5396067A (en) * | 1992-06-11 | 1995-03-07 | Nikon Corporation | Scan type electron microscope |
| JP2927627B2 (ja) * | 1992-10-20 | 1999-07-28 | 株式会社日立製作所 | 走査電子顕微鏡 |
| EP0958590B1 (de) * | 1997-12-08 | 2003-06-11 | Fei Company | Rasterelektronenmikroskop unter kontrollierter umgebung mit mehrpolfelder zur erhöter sekundärelektronenerfassung |
-
1996
- 1996-11-15 GB GBGB9623768.0A patent/GB9623768D0/en active Pending
-
1997
- 1997-11-14 EP EP97912354A patent/EP0939969B1/de not_active Expired - Lifetime
- 1997-11-14 AT AT97912354T patent/ATE455360T1/de not_active IP Right Cessation
- 1997-11-14 AU AU49587/97A patent/AU4958797A/en not_active Abandoned
- 1997-11-14 GB GB9910896A patent/GB2334373B/en not_active Expired - Lifetime
- 1997-11-14 US US09/308,372 patent/US6365898B1/en not_active Expired - Lifetime
- 1997-11-14 WO PCT/GB1997/003136 patent/WO1998022971A2/en not_active Ceased
- 1997-11-14 KR KR1019997004290A patent/KR20000068981A/ko not_active Withdrawn
- 1997-11-14 DE DE69739739T patent/DE69739739D1/de not_active Expired - Lifetime
- 1997-11-14 BR BR9713032-0A patent/BR9713032A/pt unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO1998022971A3 (en) | 1998-07-23 |
| EP0939969B1 (de) | 2010-01-13 |
| KR20000068981A (ko) | 2000-11-25 |
| AU4958797A (en) | 1998-06-10 |
| GB9910896D0 (en) | 1999-07-07 |
| WO1998022971A2 (en) | 1998-05-28 |
| DE69739739D1 (de) | 2010-03-04 |
| EP0939969A1 (de) | 1999-09-08 |
| GB9623768D0 (en) | 1997-01-08 |
| BR9713032A (pt) | 2000-04-11 |
| GB2334373A (en) | 1999-08-18 |
| GB2334373B (en) | 2001-10-17 |
| US6365898B1 (en) | 2002-04-02 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |