ATE455360T1 - Rasterelektronenmikroskop - Google Patents

Rasterelektronenmikroskop

Info

Publication number
ATE455360T1
ATE455360T1 AT97912354T AT97912354T ATE455360T1 AT E455360 T1 ATE455360 T1 AT E455360T1 AT 97912354 T AT97912354 T AT 97912354T AT 97912354 T AT97912354 T AT 97912354T AT E455360 T1 ATE455360 T1 AT E455360T1
Authority
AT
Austria
Prior art keywords
specimen
electron microscope
scanning electron
collisions
holder
Prior art date
Application number
AT97912354T
Other languages
English (en)
Inventor
Pierre Sudraud
Antoine Corbin
Rainer Sailer
David Bate
Original Assignee
Zeiss Carl Smt Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ltd filed Critical Zeiss Carl Smt Ltd
Application granted granted Critical
Publication of ATE455360T1 publication Critical patent/ATE455360T1/de

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04Means for controlling the discharge
    • H01J2237/047Changing particle velocity
    • H01J2237/0473Changing particle velocity accelerating
    • H01J2237/04735Changing particle velocity accelerating with electrostatic means
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/18Vacuum control means
    • H01J2237/188Differential pressure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/20Positioning, supporting, modifying or maintaining the physical state of objects being observed or treated
    • H01J2237/2002Controlling environment of sample
    • H01J2237/2003Environmental cells
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2444Electron Multiplier
    • H01J2237/24445Electron Multiplier using avalanche in a gas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/244Detection characterized by the detecting means
    • H01J2237/2445Photon detectors for X-rays, light, e.g. photomultipliers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/26Electron or ion microscopes
    • H01J2237/2602Details
    • H01J2237/2605Details operating at elevated pressures, e.g. atmosphere
    • H01J2237/2608Details operating at elevated pressures, e.g. atmosphere with environmental specimen chamber

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Electron Sources, Ion Sources (AREA)
AT97912354T 1996-11-15 1997-11-14 Rasterelektronenmikroskop ATE455360T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
GBGB9623768.0A GB9623768D0 (en) 1996-11-15 1996-11-15 Scanning electron microscope
PCT/GB1997/003136 WO1998022971A2 (en) 1996-11-15 1997-11-14 Scanning electron microscope

Publications (1)

Publication Number Publication Date
ATE455360T1 true ATE455360T1 (de) 2010-01-15

Family

ID=10802979

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97912354T ATE455360T1 (de) 1996-11-15 1997-11-14 Rasterelektronenmikroskop

Country Status (9)

Country Link
US (1) US6365898B1 (de)
EP (1) EP0939969B1 (de)
KR (1) KR20000068981A (de)
AT (1) ATE455360T1 (de)
AU (1) AU4958797A (de)
BR (1) BR9713032A (de)
DE (1) DE69739739D1 (de)
GB (2) GB9623768D0 (de)
WO (1) WO1998022971A2 (de)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6327491B1 (en) 1998-07-06 2001-12-04 Neutar, Llc Customized surgical fixture
US7462839B2 (en) 2000-07-07 2008-12-09 Carl Zeiss Nts Gmbh Detector for variable pressure areas and an electron microscope comprising a corresponding detector
GB2367686B (en) * 2000-08-10 2002-12-11 Leo Electron Microscopy Ltd Improvements in or relating to particle detectors
JP2002289129A (ja) 2001-03-26 2002-10-04 Jeol Ltd 低真空走査電子顕微鏡
US20050103272A1 (en) 2002-02-25 2005-05-19 Leo Elektronenmikroskopie Gmbh Material processing system and method
WO2003104846A2 (en) * 2002-06-05 2003-12-18 Quantomix Ltd. A sample enclosure for a scanning electron microscope and methods of use thereof
IL150056A0 (en) 2002-06-05 2002-12-01 Yeda Res & Dev Low-pressure chamber for scanning electron microscopy in a wet environment
CZ20022105A3 (cs) * 2002-06-17 2004-02-18 Tescan, S. R. O. Detektor sekundárních elektronů, zejména v rastrovacím elektronovém mikroskopu
GB0300474D0 (en) * 2003-01-09 2003-02-12 Univ Cambridge Tech Detector for enviromental scanning electron microscope
US20070125947A1 (en) * 2003-02-20 2007-06-07 David Sprinzak Sample enclosure for a scanning electron microscope and methods of use thereof
KR100994516B1 (ko) * 2006-02-02 2010-11-15 전자빔기술센터 주식회사 전자 칼럼용 진공 차등 유지 기구
WO2008098084A1 (en) * 2007-02-06 2008-08-14 Fei Company High pressure charged particle beam system
EP2061067A3 (de) 2007-11-13 2010-04-07 Carl Zeiss SMT Limited Strahlenvorrichtung und Verfahren mit einer Partikelstrahlenvorrichtung und optischem Mikroskop
US8299432B2 (en) * 2008-11-04 2012-10-30 Fei Company Scanning transmission electron microscope using gas amplification
US8481962B2 (en) * 2010-08-10 2013-07-09 Fei Company Distributed potential charged particle detector
GB2484517B (en) 2010-10-14 2016-03-30 Carl Zeiss Nts Ltd Improvements in and relating to charged particle beam devices
US9679741B2 (en) 2010-11-09 2017-06-13 Fei Company Environmental cell for charged particle beam system
CN104508791B (zh) * 2012-07-30 2017-03-01 Fei 公司 环境扫描电子显微镜气体喷射系统
US9123506B2 (en) * 2013-06-10 2015-09-01 Fei Company Electron beam-induced etching
EP3176808B1 (de) 2015-12-03 2019-10-16 Carl Zeiss Microscopy Ltd. Verfahren zur detektion geladener partikel und partikelstrahlvorrichtung zur durchführung des verfahrens

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7902963A (nl) * 1979-04-13 1980-10-15 Philips Nv Detektor voor elektronenmikroskoop.
US4596929A (en) * 1983-11-21 1986-06-24 Nanometrics Incorporated Three-stage secondary emission electron detection in electron microscopes
EP0275306B1 (de) * 1986-08-01 1990-10-24 Electro-Scan Corporation Mehrzwecksgasdetektoranordnung fuer elektronmikroskopen
US4823006A (en) * 1987-05-21 1989-04-18 Electroscan Corporation Integrated electron optical/differential pumping/imaging signal detection system for an environmental scanning electron microscope
US4785182A (en) * 1987-05-21 1988-11-15 Electroscan Corporation Secondary electron detector for use in a gaseous atmosphere
DE3729846A1 (de) * 1987-09-05 1989-03-23 Zeiss Carl Fa Kathodolumineszenzdetektor
US5396067A (en) * 1992-06-11 1995-03-07 Nikon Corporation Scan type electron microscope
JP2927627B2 (ja) * 1992-10-20 1999-07-28 株式会社日立製作所 走査電子顕微鏡
EP0958590B1 (de) * 1997-12-08 2003-06-11 Fei Company Rasterelektronenmikroskop unter kontrollierter umgebung mit mehrpolfelder zur erhöter sekundärelektronenerfassung

Also Published As

Publication number Publication date
WO1998022971A3 (en) 1998-07-23
EP0939969B1 (de) 2010-01-13
KR20000068981A (ko) 2000-11-25
AU4958797A (en) 1998-06-10
GB9910896D0 (en) 1999-07-07
WO1998022971A2 (en) 1998-05-28
DE69739739D1 (de) 2010-03-04
EP0939969A1 (de) 1999-09-08
GB9623768D0 (en) 1997-01-08
BR9713032A (pt) 2000-04-11
GB2334373A (en) 1999-08-18
GB2334373B (en) 2001-10-17
US6365898B1 (en) 2002-04-02

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Legal Events

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RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties