ATE445652T1 - Photoresistharz und photoresistharzzusammensetzung - Google Patents

Photoresistharz und photoresistharzzusammensetzung

Info

Publication number
ATE445652T1
ATE445652T1 AT04746314T AT04746314T ATE445652T1 AT E445652 T1 ATE445652 T1 AT E445652T1 AT 04746314 T AT04746314 T AT 04746314T AT 04746314 T AT04746314 T AT 04746314T AT E445652 T1 ATE445652 T1 AT E445652T1
Authority
AT
Austria
Prior art keywords
photoresist resin
molecular weight
resin
repeating unit
weight
Prior art date
Application number
AT04746314T
Other languages
English (en)
Inventor
Shigeki Kambara
Masaaki Kishimura
Original Assignee
Daicel Chem
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Daicel Chem filed Critical Daicel Chem
Application granted granted Critical
Publication of ATE445652T1 publication Critical patent/ATE445652T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F22/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides or nitriles thereof
    • C08F22/10—Esters
    • C08F22/12—Esters of phenols or saturated alcohols
    • C08F22/20—Esters containing oxygen in addition to the carboxy oxygen
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
    • G03F7/0392—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition
    • G03F7/0397—Macromolecular compounds which are photodegradable, e.g. positive electron resists the macromolecular compound being present in a chemically amplified positive photoresist composition the macromolecular compound having an alicyclic moiety in a side chain
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10—Esters
    • C08F220/26—Esters containing oxygen in addition to the carboxy oxygen
    • C08F220/28—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety
    • C08F220/283—Esters containing oxygen in addition to the carboxy oxygen containing no aromatic rings in the alcohol moiety and containing one or more carboxylic moiety in the chain, e.g. acetoacetoxyethyl(meth)acrylate

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Polymerisation Methods In General (AREA)
AT04746314T 2003-10-14 2004-06-17 Photoresistharz und photoresistharzzusammensetzung ATE445652T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003354224A JP4033826B2 (ja) 2003-10-14 2003-10-14 フォトレジスト用樹脂及びフォトレジスト用樹脂組成物
PCT/JP2004/008845 WO2005035602A1 (ja) 2003-10-14 2004-06-17 フォトレジスト用樹脂及びフォトレジスト用樹脂組成物

Publications (1)

Publication Number Publication Date
ATE445652T1 true ATE445652T1 (de) 2009-10-15

Family

ID=34431182

Family Applications (1)

Application Number Title Priority Date Filing Date
AT04746314T ATE445652T1 (de) 2003-10-14 2004-06-17 Photoresistharz und photoresistharzzusammensetzung

Country Status (7)

Country Link
US (1) US20050238990A1 (de)
EP (1) EP1676869B1 (de)
JP (1) JP4033826B2 (de)
KR (1) KR101055915B1 (de)
AT (1) ATE445652T1 (de)
DE (1) DE602004023634D1 (de)
WO (1) WO2005035602A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4663456B2 (ja) * 2005-09-05 2011-04-06 東京応化工業株式会社 ポジ型レジスト組成物およびレジストパターン形成方法
JP5085057B2 (ja) * 2006-06-15 2012-11-28 株式会社ダイセル フォトレジスト用樹脂の製造方法およびフォトレジスト樹脂組成物の製造方法
EP2056628A1 (de) * 2007-10-30 2009-05-06 Nokia Siemens Networks Oy Kommunikationsnetzwerkelemente und Verfahren zum Schalten von Aktivitätszuständen
CN104379617A (zh) * 2012-06-29 2015-02-25 株式会社大赛璐 高分子化合物、光致抗蚀剂用树脂组合物、及半导体的制造方法
KR101530150B1 (ko) * 2013-08-02 2015-06-19 주식회사 엘지화학 고무강화 열가소성 수지의 제조방법
US20220372188A1 (en) * 2019-07-01 2022-11-24 Daicel Corporation Photoresist resin, method for producing photoresist resin, photoresist resin composition, and method for forming pattern

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0973137A (ja) 1995-09-05 1997-03-18 Copal Co Ltd 写真焼付装置
JP4187815B2 (ja) * 1996-12-09 2008-11-26 日本曹達株式会社 （メタ）アクリル酸エステル系共重合体及びその製造方法
WO1999050322A1 (fr) * 1998-03-27 1999-10-07 Mitsubishi Rayon Co., Ltd. Copolymere, son procede de preparation et composition de produit de reserve
JP3042618B2 (ja) 1998-07-03 2000-05-15 日本電気株式会社 ラクトン構造を有する（メタ）アクリレート誘導体、重合体、フォトレジスト組成物、及びパターン形成方法
JP2001278919A (ja) * 2000-03-30 2001-10-10 Daicel Chem Ind Ltd レジスト用高分子化合物及びレジスト組成物
US6749987B2 (en) * 2000-10-20 2004-06-15 Fuji Photo Film Co., Ltd. Positive photosensitive composition
JP4839522B2 (ja) 2001-04-12 2011-12-21 Ｊｓｒ株式会社 感放射線性樹脂組成物
JP4727092B2 (ja) * 2001-09-10 2011-07-20 東京応化工業株式会社 化学増幅型レジスト組成物
JP4025074B2 (ja) * 2001-09-19 2007-12-19 富士フイルム株式会社 ポジ型レジスト組成物
JP2003221403A (ja) * 2002-01-29 2003-08-05 Daicel Chem Ind Ltd フォトレジスト用高分子化合物の製造方法
TW200304042A (en) * 2002-02-22 2003-09-16 Jsr Corp Radiation-sensitive resin composition
TWI314943B (en) * 2002-08-29 2009-09-21 Radiation-sensitive resin composition
JP4188058B2 (ja) * 2002-11-05 2008-11-26 ダイセル化学工業株式会社 フォトレジスト用高分子化合物及びフォトレジスト用樹脂組成物

Also Published As

Publication number Publication date
EP1676869B1 (de) 2009-10-14
WO2005035602A1 (ja) 2005-04-21
KR20070017978A (ko) 2007-02-13
JP2005120157A (ja) 2005-05-12
EP1676869A4 (de) 2007-06-27
JP4033826B2 (ja) 2008-01-16
DE602004023634D1 (de) 2009-11-26
US20050238990A1 (en) 2005-10-27
KR101055915B1 (ko) 2011-08-09
EP1676869A1 (de) 2006-07-05

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