ATE419573T1 - Drucksteuerverfahren - Google Patents

Drucksteuerverfahren

Info

Publication number
ATE419573T1
ATE419573T1 AT05701892T AT05701892T ATE419573T1 AT E419573 T1 ATE419573 T1 AT E419573T1 AT 05701892 T AT05701892 T AT 05701892T AT 05701892 T AT05701892 T AT 05701892T AT E419573 T1 ATE419573 T1 AT E419573T1
Authority
AT
Austria
Prior art keywords
pressure
chamber
flow
setting
print control
Prior art date
Application number
AT05701892T
Other languages
English (en)
Inventor
Martin Ernst Tollner
Original Assignee
Edwards Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Edwards Ltd filed Critical Edwards Ltd
Application granted granted Critical
Publication of ATE419573T1 publication Critical patent/ATE419573T1/de

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00—Control of fluid pressure
    • G05D16/20—Control of fluid pressure characterised by the use of electric means
    • G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/208—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using a combination of controlling means as defined in G05D16/2013 and G05D16/2066

Landscapes

  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Control Of Fluid Pressure (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
  • Flow Control (AREA)
AT05701892T 2004-01-22 2005-01-14 Drucksteuerverfahren ATE419573T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GBGB0401396.7A GB0401396D0 (en) 2004-01-22 2004-01-22 Pressure control method

Publications (1)

Publication Number Publication Date
ATE419573T1 true ATE419573T1 (de) 2009-01-15

Family

ID=31971282

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05701892T ATE419573T1 (de) 2004-01-22 2005-01-14 Drucksteuerverfahren

Country Status (8)

Country Link
US (1) US8070459B2 (de)
EP (1) EP1706803B1 (de)
JP (1) JP2007519112A (de)
AT (1) ATE419573T1 (de)
DE (1) DE602005012050D1 (de)
GB (1) GB0401396D0 (de)
TW (1) TWI358620B (de)
WO (1) WO2005071509A1 (de)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8161998B2 (en) * 2007-06-04 2012-04-24 Matos Jeffrey A Frozen/chilled fluid for pipelines and for storage facilities
US8135529B2 (en) * 2008-09-23 2012-03-13 Delta Electronics, Inc. Method for controlling constant-pressure fluid
DE102009017887A1 (de) * 2009-04-17 2010-10-21 Oerlikon Leybold Vacuum Gmbh Grobpumpverfahren für eine Verdrängerpumpe
US9267605B2 (en) 2011-11-07 2016-02-23 Lam Research Corporation Pressure control valve assembly of plasma processing chamber and rapid alternating process
FR2993614B1 (fr) * 2012-07-19 2018-06-15 Pfeiffer Vacuum Procede et dispositif de pompage d'une chambre de procedes
JP6996289B2 (ja) 2016-12-26 2022-01-17 株式会社島津製作所 バルブ装置

Family Cites Families (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4850806A (en) * 1988-05-24 1989-07-25 The Boc Group, Inc. Controlled by-pass for a booster pump
FR2640697B1 (fr) * 1988-12-16 1993-01-08 Cit Alcatel Ensemble de pompage pour l'obtention de vides eleves
JPH02271185A (ja) * 1989-04-13 1990-11-06 Fujitsu Ltd バルブ機構
US6008133A (en) * 1991-04-04 1999-12-28 Hitachi, Ltd. Method and apparatus for dry etching
JPH04326943A (ja) * 1991-04-25 1992-11-16 Hitachi Ltd 真空排気システム及び排気方法
JPH06259144A (ja) 1993-03-05 1994-09-16 Kokusai Electric Co Ltd 高速圧力制御方法
JP3847357B2 (ja) * 1994-06-28 2006-11-22 株式会社荏原製作所 真空系の排気装置
DE19524609A1 (de) * 1995-07-06 1997-01-09 Leybold Ag Vorrichtung zum raschen Evakuieren einer Vakuumkammer
US6142163A (en) * 1996-03-29 2000-11-07 Lam Research Corporation Method and apparatus for pressure control in vacuum processors
US5758680A (en) * 1996-03-29 1998-06-02 Lam Research Corporation Method and apparatus for pressure control in vacuum processors
US5803107A (en) * 1996-03-29 1998-09-08 Lam Research Corporation Method and apparatus for pressure control in vacuum processors
DE19704234B4 (de) * 1997-02-05 2006-05-11 Pfeiffer Vacuum Gmbh Verfahren und Vorrichtung zur Regelung des Saugvermögens von Vakuumpumpen
US5944049A (en) * 1997-07-15 1999-08-31 Applied Materials, Inc. Apparatus and method for regulating a pressure in a chamber
GB9717400D0 (en) * 1997-08-15 1997-10-22 Boc Group Plc Vacuum pumping systems
JPH11312640A (ja) * 1998-02-25 1999-11-09 Canon Inc 処理装置および該処理装置を用いたデバイス製造方法
JP3929185B2 (ja) * 1998-05-20 2007-06-13 株式会社荏原製作所 真空排気装置及び方法
JP4708516B2 (ja) 1998-06-01 2011-06-22 財団法人国際科学振興財団 半導体又は液晶製造用装置並びに液体材料ガスの気化方法
JP2000020138A (ja) * 1998-07-07 2000-01-21 Ckd Corp 真空圧力制御システム
US7077159B1 (en) * 1998-12-23 2006-07-18 Applied Materials, Inc. Processing apparatus having integrated pumping system
EP1043645B1 (de) * 1999-04-07 2004-10-20 Alcatel Druckregelvorrichtung für eine Vakuumkammer, und eine mit einer solchen Vorrichtung versehenen Vakuumpumpeinheit
JP2001051723A (ja) 1999-08-11 2001-02-23 Matsushita Electronics Industry Corp 流量制御装置および方法
JP2002091573A (ja) * 2000-09-19 2002-03-29 Toshiba Corp 圧力制御方法、処理装置および処理方法
JP4335469B2 (ja) * 2001-03-22 2009-09-30 株式会社荏原製作所 真空排気装置のガス循環量調整方法及び装置
US6739840B2 (en) * 2002-05-22 2004-05-25 Applied Materials Inc Speed control of variable speed pump
GB0212757D0 (en) * 2002-05-31 2002-07-10 Boc Group Plc A vacuum pumping system and method of controlling the same
GB0214273D0 (en) * 2002-06-20 2002-07-31 Boc Group Plc Apparatus for controlling the pressure in a process chamber and method of operating same
US7472581B2 (en) * 2005-03-16 2009-01-06 Tokyo Electron Limited Vacuum apparatus

Also Published As

Publication number Publication date
GB0401396D0 (en) 2004-02-25
EP1706803A1 (de) 2006-10-04
EP1706803B1 (de) 2008-12-31
JP2007519112A (ja) 2007-07-12
US8070459B2 (en) 2011-12-06
TW200532411A (en) 2005-10-01
DE602005012050D1 (de) 2009-02-12
WO2005071509A1 (en) 2005-08-04
TWI358620B (en) 2012-02-21
US20070163330A1 (en) 2007-07-19

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Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties