ATE409891T1 - Neuartiges resistmaterial und verfahren zur bildung einer strukturierten resistschicht auf einem substrat - Google Patents
Neuartiges resistmaterial und verfahren zur bildung einer strukturierten resistschicht auf einem substratInfo
- Publication number
- ATE409891T1 ATE409891T1 AT05783896T AT05783896T ATE409891T1 AT E409891 T1 ATE409891 T1 AT E409891T1 AT 05783896 T AT05783896 T AT 05783896T AT 05783896 T AT05783896 T AT 05783896T AT E409891 T1 ATE409891 T1 AT E409891T1
- Authority
- AT
- Austria
- Prior art keywords
- cross
- resist material
- layer
- actinic radiation
- coating layer
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0382—Macromolecular compounds which are rendered insoluble or differentially wettable the macromolecular compound being present in a chemically amplified negative photoresist composition
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0420704A GB0420704D0 (en) | 2004-09-17 | 2004-09-17 | Novel resist material and method for forming a patterned resist layer on a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE409891T1 true ATE409891T1 (de) | 2008-10-15 |
Family
ID=33306755
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT05783896T ATE409891T1 (de) | 2004-09-17 | 2005-09-19 | Neuartiges resistmaterial und verfahren zur bildung einer strukturierten resistschicht auf einem substrat |
Country Status (7)
Country | Link |
---|---|
US (1) | US7670749B2 (de) |
EP (1) | EP1789850B1 (de) |
JP (1) | JP4768740B2 (de) |
AT (1) | ATE409891T1 (de) |
DE (1) | DE602005010099D1 (de) |
GB (1) | GB0420704D0 (de) |
WO (1) | WO2006030239A2 (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9256126B2 (en) | 2012-11-14 | 2016-02-09 | Irresistible Materials Ltd | Methanofullerenes |
JP6157160B2 (ja) * | 2013-03-15 | 2017-07-05 | アーゼッド・エレクトロニック・マテリアルズ(ルクセンブルグ)ソシエテ・ア・レスポンサビリテ・リミテ | 上層膜形成用組成物およびそれを用いたレジストパターン形成方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2599007B2 (ja) * | 1989-11-13 | 1997-04-09 | 富士写真フイルム株式会社 | ポジ型感光性組成物 |
WO2000010056A1 (en) * | 1998-08-14 | 2000-02-24 | Shipley Company, L.L.C. | Photoacid generators and photoresists comprising same |
GB9827798D0 (en) * | 1998-12-17 | 1999-02-10 | Agency Ind Science Techn | Electron beam resist |
JP2004061945A (ja) * | 2002-07-30 | 2004-02-26 | Fuji Photo Film Co Ltd | 画像記録材料 |
JP4084622B2 (ja) * | 2002-09-25 | 2008-04-30 | 富士フイルム株式会社 | 平版印刷版原版 |
-
2004
- 2004-09-17 GB GB0420704A patent/GB0420704D0/en not_active Ceased
-
2005
- 2005-09-19 WO PCT/GB2005/003605 patent/WO2006030239A2/en active IP Right Grant
- 2005-09-19 EP EP05783896A patent/EP1789850B1/de not_active Not-in-force
- 2005-09-19 JP JP2007531836A patent/JP4768740B2/ja not_active Expired - Fee Related
- 2005-09-19 DE DE602005010099T patent/DE602005010099D1/de active Active
- 2005-09-19 AT AT05783896T patent/ATE409891T1/de not_active IP Right Cessation
- 2005-09-19 US US11/663,017 patent/US7670749B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
GB0420704D0 (en) | 2004-10-20 |
JP4768740B2 (ja) | 2011-09-07 |
US20070298328A1 (en) | 2007-12-27 |
WO2006030239A3 (en) | 2006-05-11 |
US7670749B2 (en) | 2010-03-02 |
JP2008513821A (ja) | 2008-05-01 |
EP1789850B1 (de) | 2008-10-01 |
WO2006030239A2 (en) | 2006-03-23 |
EP1789850A2 (de) | 2007-05-30 |
DE602005010099D1 (de) | 2008-11-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ATE430952T1 (de) | Verwendung von methanofullerenderivaten als resistmaterialien und verfahren zur bildung einer resistschicht | |
TWI665238B (zh) | 含有聚矽氧骨架的高分子化合物、負型光阻材料、光硬化性乾膜、圖型形成方法及電氣.電子零件保護用皮膜 | |
DE60230838D1 (de) | Verfahren zur Herstellung einer Microstruktur | |
DK1504113T3 (da) | Fremgangsmåde til fremstilling af polymerlag | |
DE60307045D1 (de) | Verfahren zum erzeugen eines bildes unter verwendung von einer antireflexunterschichtzusammensetzung | |
DE60314610D1 (de) | Verfahren zur herstellung von organischen optoelektronischen und elektronischen bauteilen sowie dadurch erhaltene bauteile | |
DE602004017917D1 (de) | Verfahren zur herstellung eines gehärteten produkts aus lichtempfindlichem harz | |
EP1594004A3 (de) | Material für eine Sperrschicht sowie Methode zur Erzeugung eines Musters unter Einsatz dieses Materials | |
EP2413195A3 (de) | Strukturbildungsverfahren | |
TW200739146A (en) | Method for producing complex phase retarder and complex optical member | |
DE602005022594D1 (de) | Verfahren zur Herstellung einer Lithografiedruckform | |
ATE461756T1 (de) | Verfahren zur herstellung farb- und/oder effektgebender mehrschichtlackierungen | |
ATE434203T1 (de) | Lithographiedruckplattenvorläufer und verfahren zur herstellung einer lithographiedruckplatte | |
ATE409891T1 (de) | Neuartiges resistmaterial und verfahren zur bildung einer strukturierten resistschicht auf einem substrat | |
ATE377825T1 (de) | Verfahren zur herstellung eines optischen datenträgers, optischer datenträger und gerät zur ausführung besagten verfahrens | |
EP1975701A3 (de) | Farbfilter und Herstellungsverfahren dafür | |
JP2009185255A5 (de) | ||
ATE429699T1 (de) | Verfahren zur herstellung einer matrize für optisches informationsaufzeichnungsmedium | |
ATE521915T1 (de) | Verfahren zur erzeugung einer strukturierten schicht auf einem substrat | |
DE602005022918D1 (de) | Optischer datenträger und verfahren zur herstellung eines optischen datenträgers | |
Mizui et al. | Reduction of defect for imprinted UV curable resin including volatile solvents using gas permeable mold derived from cellulose | |
ATE408223T1 (de) | Verfahren zur herstellung eines mehrstufigen optischen aufzeichnungsmediums und auf diese weise hergestelltes medium | |
TW201913091A (zh) | 紙基生物感測器圖案的製作方法 | |
SG11201901883TA (en) | Pattern forming method, method for manufacturing electronic device, and actinic ray-sensitive or radiation-sensitive composition | |
JPS6048023B2 (ja) | ポジ型レジスト |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |