ATE403176T1 - Homogenisierer - Google Patents

Homogenisierer

Info

Publication number
ATE403176T1
ATE403176T1 AT02793604T AT02793604T ATE403176T1 AT E403176 T1 ATE403176 T1 AT E403176T1 AT 02793604 T AT02793604 T AT 02793604T AT 02793604 T AT02793604 T AT 02793604T AT E403176 T1 ATE403176 T1 AT E403176T1
Authority
AT
Austria
Prior art keywords
array
beamlets
electromagnetic radiation
deflecting elements
homogenizing
Prior art date
Application number
AT02793604T
Other languages
English (en)
Inventor
Torbjoern Sandstroem
Original Assignee
Micronic Laser Systems Ab
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=26976518&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE403176(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Micronic Laser Systems Ab filed Critical Micronic Laser Systems Ab
Application granted granted Critical
Publication of ATE403176T1 publication Critical patent/ATE403176T1/de

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/09—Beam shaping, e.g. changing the cross-sectional area, not otherwise provided for
    • G02B27/0905—Dividing and/or superposing multiple light beams
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/10—Beam splitting or combining systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Recrystallisation Techniques (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Furan Compounds (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Elements Other Than Lenses (AREA)
AT02793604T 2001-12-07 2002-12-05 Homogenisierer ATE403176T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US33777301P 2001-12-07 2001-12-07
US10/308,917 US6903859B2 (en) 2001-12-07 2002-12-03 Homogenizer

Publications (1)

Publication Number Publication Date
ATE403176T1 true ATE403176T1 (de) 2008-08-15

Family

ID=26976518

Family Applications (1)

Application Number Title Priority Date Filing Date
AT02793604T ATE403176T1 (de) 2001-12-07 2002-12-05 Homogenisierer

Country Status (9)

Country Link
US (1) US6903859B2 (de)
EP (1) EP1451629B1 (de)
JP (1) JP4302526B2 (de)
KR (1) KR100922056B1 (de)
CN (1) CN1307460C (de)
AT (1) ATE403176T1 (de)
AU (1) AU2002359100A1 (de)
DE (1) DE60227982D1 (de)
WO (1) WO2003048839A1 (de)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004035489A1 (de) * 2004-07-19 2006-02-16 Jenoptik Laser, Optik, Systeme Gmbh Optisches System zur Umwandlung einer primären Intensitätsverteilung in eine vorgegebene, raumwinkelabhängige Intensitätsverteilung
DE102006047941B4 (de) 2006-10-10 2008-10-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zur Homogenisierung von Strahlung mit nicht regelmäßigen Mikrolinsenarrays
TWI393919B (zh) * 2008-11-27 2013-04-21 Ind Tech Res Inst 光束整形器
DE102012203716A1 (de) 2012-03-09 2013-09-12 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Projektionslithografie sowie optisches System mit einer derartigen Beleuchtungsoptik
JP6369906B2 (ja) 2012-03-09 2018-08-08 カール・ツァイス・エスエムティー・ゲーエムベーハー Ｅｕｖ投影リソグラフィのための照明光学ユニット及びそのような照明光学ユニットを含む光学系
KR20140124275A (ko) * 2013-04-16 2014-10-24 한국전자통신연구원 광학 렌즈와 이를 이용한 균일 빔 생성 장치
CN103279005B (zh) * 2013-05-13 2015-08-19 深圳市绎立锐光科技开发有限公司 激光光源、波长转换光源、合光光源及投影系统
DE102016102591A1 (de) * 2016-02-15 2017-08-17 Limo Patentverwaltung Gmbh & Co. Kg Vorrichtung zur Formung von Laserstrahlung
US12487119B2 (en) 2023-01-09 2025-12-02 Nanohmics, Inc. Integral field spectral imager

Family Cites Families (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3754814A (en) 1971-01-19 1973-08-28 Battelle Development Corp Coherent imaging with reduced speckle
DE2125889A1 (de) 1971-05-25 1972-11-30 Siemens Ag Kohärent-optischer Vielkanal-Korrelator
US4475027A (en) * 1981-11-17 1984-10-02 Allied Corporation Optical beam homogenizer
DE3213839A1 (de) 1982-04-15 1983-10-27 Philips Patentverwaltung Gmbh, 2000 Hamburg Optische wellenlaengen-multiplex- bzw. -demultiplexanordnung
JPS63110722A (ja) 1986-10-29 1988-05-16 Hitachi Ltd 露光照明装置
US5056039A (en) * 1988-07-14 1991-10-08 University Of Alabama In Huntsville Holographic interconnect system
US5303084A (en) * 1991-08-27 1994-04-12 Kaman Aerospace Corporation Laser light beam homogenizer and imaging lidar system incorporating same
JPH0770469B2 (ja) 1991-10-30 1995-07-31 フラウンホファー・ゲゼルシャフト・ツール・フォルデルング・デル・アンゲバンテン・フォルシュング・アインゲトラーゲネル・フェライン 照明装置
DE4220705C2 (de) * 1992-06-24 2003-03-13 Lambda Physik Ag Vorrichtung zum Aufteilen eines Lichtstrahles in homogene Teilstrahlen
US6002520A (en) 1997-04-25 1999-12-14 Hewlett-Packard Company Illumination system for creating a desired irradiance profile using diffractive optical elements
US6067306A (en) 1997-08-08 2000-05-23 Cymer, Inc. Laser-illuminated stepper or scanner with energy sensor feedback
SE9800665D0 (sv) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US6169634B1 (en) 1998-06-08 2001-01-02 Optimet, Optical Metrology Ltd Illumination techniques for overcoming speckle artifacts in metrology applications
US6069739A (en) 1998-06-30 2000-05-30 Intel Corporation Method and lens arrangement to improve imaging performance of microlithography exposure tool
US6163403A (en) * 1998-07-30 2000-12-19 Litton Systems, Inc. High output reflective optical correlator having a folded optical axis using grayscale spatial light modulators
DE19915000C2 (de) * 1999-04-01 2002-05-08 Microlas Lasersystem Gmbh Vorrichtung und Verfahren zum Steuern der Intensitätsverteilung eines Laserstrahls
US6624880B2 (en) 2001-01-18 2003-09-23 Micronic Laser Systems Ab Method and apparatus for microlithography
US20020159044A1 (en) 2001-04-30 2002-10-31 Ball Semiconductor, Inc. High resolution maskless lithography field lens for telecentric system
DE10136611C1 (de) * 2001-07-23 2002-11-21 Jenoptik Laserdiode Gmbh Optische Anordnung zur Formung und Homogenisierung eines von einer Laserdiodenanordnung ausgehenden Laserstrahls

Also Published As

Publication number Publication date
AU2002359100A1 (en) 2003-06-17
DE60227982D1 (de) 2008-09-11
EP1451629A1 (de) 2004-09-01
WO2003048839A1 (en) 2003-06-12
US6903859B2 (en) 2005-06-07
US20030123152A1 (en) 2003-07-03
KR100922056B1 (ko) 2009-10-19
KR20050044502A (ko) 2005-05-12
JP4302526B2 (ja) 2009-07-29
CN1599874A (zh) 2005-03-23
JP2005512120A (ja) 2005-04-28
EP1451629B1 (de) 2008-07-30
CN1307460C (zh) 2007-03-28

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Legal Events

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