ATE378586T1 - Verfahren zur modifizierung von silber-elektroden mittels eines chlorplasmas - Google Patents
Verfahren zur modifizierung von silber-elektroden mittels eines chlorplasmasInfo
- Publication number
- ATE378586T1 ATE378586T1 AT01980648T AT01980648T ATE378586T1 AT E378586 T1 ATE378586 T1 AT E378586T1 AT 01980648 T AT01980648 T AT 01980648T AT 01980648 T AT01980648 T AT 01980648T AT E378586 T1 ATE378586 T1 AT E378586T1
- Authority
- AT
- Austria
- Prior art keywords
- silver
- silver electrodes
- plasma
- chlorine plasma
- electrodes
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/28—Electrolytic cell components
- G01N27/30—Electrodes, e.g. test electrodes; Half-cells
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/02—Pretreatment of the material to be coated
- C23C14/024—Deposition of sublayers, e.g. to promote adhesion of the coating
- C23C14/025—Metallic sublayers
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/18—Metallic material, boron or silicon on other inorganic substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5826—Treatment with charged particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/58—After-treatment
- C23C14/5846—Reactive treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/26—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating electrochemical variables; by using electrolysis or electrophoresis
- G01N27/28—Electrolytic cell components
- G01N27/30—Electrodes, e.g. test electrodes; Half-cells
- G01N27/301—Reference electrodes
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Pathology (AREA)
- Electrochemistry (AREA)
- Molecular Biology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Inorganic Chemistry (AREA)
- Electrodes For Compound Or Non-Metal Manufacture (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Investigating Or Analyzing Materials By The Use Of Electric Means (AREA)
- Physical Vapour Deposition (AREA)
- Manufacture Of Metal Powder And Suspensions Thereof (AREA)
- Chemically Coating (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GBGB0026276.6A GB0026276D0 (en) | 2000-10-27 | 2000-10-27 | Method for chlorine plasma modification of silver electrodes |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| ATE378586T1 true ATE378586T1 (de) | 2007-11-15 |
Family
ID=9902048
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| AT01980648T ATE378586T1 (de) | 2000-10-27 | 2001-10-29 | Verfahren zur modifizierung von silber-elektroden mittels eines chlorplasmas |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US20040069654A1 (de) |
| EP (1) | EP1330642B1 (de) |
| JP (1) | JP4368108B2 (de) |
| KR (1) | KR20030055291A (de) |
| AT (1) | ATE378586T1 (de) |
| AU (1) | AU2002212443A1 (de) |
| DE (1) | DE60131440T2 (de) |
| GB (1) | GB0026276D0 (de) |
| WO (1) | WO2002035221A1 (de) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2004073763A1 (en) * | 2003-02-20 | 2004-09-02 | Drm International | Antimicrobial and electrically conducting materials |
| EP1638699A4 (de) * | 2003-05-02 | 2008-04-02 | Noble Fiber Technologies Llc | Verbesserte metallionenabgaberate für antimikrobielle anwendungen |
| JP2007284276A (ja) * | 2006-04-14 | 2007-11-01 | Nippon Sheet Glass Co Ltd | 導電性セラミックス焼結体付き窓ガラス及びその製造方法 |
| SK51082006A3 (sk) * | 2006-12-05 | 2008-07-07 | Fakulta Matematiky, Fyziky A Informatiky Univerzitfakulta Matematiky, Fyziky A Informatiky Univerzity Komensk�Hoy Komensk�Ho | Zariadenie a spôsob úpravy povrchov kovov a metaloZariadenie a spôsob úpravy povrchov kovov a metaloidov, oxidov kovov a oxidov metaloidov a nitridovidov, oxidov kovov a oxidov metaloidov a nitridovkovov a nitridov metaloidovkovov a nitridov metaloidov |
| US20100196203A1 (en) | 2007-02-20 | 2010-08-05 | Gurdial Singh Sanghera | Formation of Lipid Bilayers |
| GB0724736D0 (en) | 2007-12-19 | 2008-01-30 | Oxford Nanolabs Ltd | Formation of layers of amphiphilic molecules |
| US8753561B2 (en) * | 2008-06-20 | 2014-06-17 | Baxter International Inc. | Methods for processing substrates comprising metallic nanoparticles |
| GB201202519D0 (en) | 2012-02-13 | 2012-03-28 | Oxford Nanopore Tech Ltd | Apparatus for supporting an array of layers of amphiphilic molecules and method of forming an array of layers of amphiphilic molecules |
| GB201313121D0 (en) | 2013-07-23 | 2013-09-04 | Oxford Nanopore Tech Ltd | Array of volumes of polar medium |
| GB201611770D0 (en) | 2016-07-06 | 2016-08-17 | Oxford Nanopore Tech | Microfluidic device |
| GB2574048B (en) | 2018-05-24 | 2021-06-16 | Oxford Nanopore Tech Ltd | Nanopore sensor component with electrostatic discharge protection |
| JP7492200B2 (ja) | 2019-03-12 | 2024-05-29 | オックスフォード ナノポール テクノロジーズ ピーエルシー | ナノ細孔センシングデバイスと操作方法およびその成形方法 |
| JP7411672B2 (ja) | 2019-10-11 | 2024-01-11 | タツタ電線株式会社 | 生体用電極 |
| EP4675256A3 (de) | 2020-07-17 | 2026-01-28 | Oxford Nanopore Technologies PLC | Nanoporenmessvorrichtung |
| US12426820B2 (en) | 2020-11-17 | 2025-09-30 | Tatsuta Electric Wire & Cable Co., Ltd. | Biological electrode |
| US12529134B1 (en) | 2023-01-04 | 2026-01-20 | Rhythmlink International, Llc | Methods of making silver/silver chloride electrodes by vapor deposition techniques |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5756222A (en) * | 1994-08-15 | 1998-05-26 | Applied Materials, Inc. | Corrosion-resistant aluminum article for semiconductor processing equipment |
| US5874174A (en) * | 1995-08-09 | 1999-02-23 | Matsushita Electric Industrial Co., Ltd. | Conductor film and its forming method |
| US6033582A (en) * | 1996-01-22 | 2000-03-07 | Etex Corporation | Surface modification of medical implants |
| ES2220066T3 (es) * | 1998-06-01 | 2004-12-01 | Roche Diagnostics Corporation | Metodo y dispositivo para inmunoensayo electroquimico de analitos multiples. |
| EP1026500A1 (de) * | 1999-02-01 | 2000-08-09 | Fuji Photo Film Co., Ltd. | Silber/Silberhalogenid-Elektrode und Element mit Ionenselektiver Elektrode |
| AU1455201A (en) * | 1999-11-02 | 2001-05-14 | Advanced Sensor Technologies, Inc. | Batch fabrication of electrodes |
-
2000
- 2000-10-27 GB GBGB0026276.6A patent/GB0026276D0/en not_active Ceased
-
2001
- 2001-10-29 DE DE60131440T patent/DE60131440T2/de not_active Expired - Lifetime
- 2001-10-29 KR KR10-2003-7005841A patent/KR20030055291A/ko not_active Withdrawn
- 2001-10-29 EP EP01980648A patent/EP1330642B1/de not_active Expired - Lifetime
- 2001-10-29 AU AU2002212443A patent/AU2002212443A1/en not_active Abandoned
- 2001-10-29 WO PCT/GB2001/004757 patent/WO2002035221A1/en not_active Ceased
- 2001-10-29 JP JP2002538155A patent/JP4368108B2/ja not_active Expired - Fee Related
- 2001-10-29 US US10/415,194 patent/US20040069654A1/en not_active Abandoned
- 2001-10-29 AT AT01980648T patent/ATE378586T1/de not_active IP Right Cessation
Also Published As
| Publication number | Publication date |
|---|---|
| EP1330642A1 (de) | 2003-07-30 |
| US20040069654A1 (en) | 2004-04-15 |
| EP1330642B1 (de) | 2007-11-14 |
| WO2002035221A1 (en) | 2002-05-02 |
| DE60131440D1 (de) | 2007-12-27 |
| WO2002035221A9 (en) | 2003-05-08 |
| DE60131440T2 (de) | 2008-09-11 |
| JP2004512527A (ja) | 2004-04-22 |
| GB0026276D0 (en) | 2000-12-13 |
| JP4368108B2 (ja) | 2009-11-18 |
| KR20030055291A (ko) | 2003-07-02 |
| AU2002212443A1 (en) | 2002-05-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |