ATE331424T1 - Verfahren zur strahlungserzeugung - Google Patents
Verfahren zur strahlungserzeugungInfo
- Publication number
- ATE331424T1 ATE331424T1 AT02076898T AT02076898T ATE331424T1 AT E331424 T1 ATE331424 T1 AT E331424T1 AT 02076898 T AT02076898 T AT 02076898T AT 02076898 T AT02076898 T AT 02076898T AT E331424 T1 ATE331424 T1 AT E331424T1
- Authority
- AT
- Austria
- Prior art keywords
- target
- plasma
- directing
- predetermined period
- radiating
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
- H05G1/08—Electrical details
- H05G1/10—Power supply arrangements for feeding the X-ray tube
- H05G1/20—Power supply arrangements for feeding the X-ray tube with high-frequency ac; with pulse trains
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- X-Ray Techniques (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Radiation-Therapy Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02076898A EP1365635B1 (en) | 2002-05-13 | 2002-05-13 | Method for producing radiation |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE331424T1 true ATE331424T1 (de) | 2006-07-15 |
Family
ID=29286188
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT02076898T ATE331424T1 (de) | 2002-05-13 | 2002-05-13 | Verfahren zur strahlungserzeugung |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1365635B1 (ko) |
KR (1) | KR20050005478A (ko) |
AT (1) | ATE331424T1 (ko) |
DE (1) | DE60212581T2 (ko) |
TW (1) | TW569652B (ko) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102004005242B4 (de) | 2004-01-30 | 2006-04-20 | Xtreme Technologies Gmbh | Verfahren und Vorrichtung zur plasmabasierten Erzeugung intensiver kurzwelliger Strahlung |
EP1730764A4 (en) * | 2004-03-17 | 2010-08-18 | Cymer Inc | LPP EUV LIGHT SOURCE |
DE102005014433B3 (de) * | 2005-03-24 | 2006-10-05 | Xtreme Technologies Gmbh | Verfahren und Anordnung zur effizienten Erzeugung von kurzwelliger Strahlung auf Basis eines lasererzeugten Plasmas |
-
2002
- 2002-05-13 AT AT02076898T patent/ATE331424T1/de not_active IP Right Cessation
- 2002-05-13 DE DE60212581T patent/DE60212581T2/de not_active Expired - Lifetime
- 2002-05-13 EP EP02076898A patent/EP1365635B1/en not_active Expired - Lifetime
- 2002-09-12 TW TW091120911A patent/TW569652B/zh not_active IP Right Cessation
-
2003
- 2003-05-13 KR KR10-2004-7018331A patent/KR20050005478A/ko not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
EP1365635B1 (en) | 2006-06-21 |
KR20050005478A (ko) | 2005-01-13 |
DE60212581D1 (de) | 2006-08-03 |
TW569652B (en) | 2004-01-01 |
DE60212581T2 (de) | 2007-07-05 |
EP1365635A1 (en) | 2003-11-26 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6944010B2 (ja) | 極端紫外線光源用のターゲット | |
EP2951643B1 (en) | Euv light source using cryogenic droplet targets in mask inspection | |
HK1094501A1 (en) | Method and device for producing extreme ultraviolet radiation or soft x-ray radiation | |
DE602004005225D1 (de) | Verfahren und vorrichtung zur herstellung von extrem-ultraviolettstrahlung oder weicher röntgenstrahlung | |
JP4555679B2 (ja) | X線または極紫外線を生じさせる方法およびそれを利用する方法 | |
CN110784981B (zh) | 极紫外光源 | |
SE9601547L (sv) | Laser-plasma röntgenkälla utnyttjande vätskor som strålmål | |
CN103841744B (zh) | 激光尾波场加速器及产生高亮度阿秒光脉冲的方法 | |
JP2008532293A5 (ko) | ||
DE60143527D1 (de) | Verfahren und vorrichtung zur erzeugung von röntgenstrahlung | |
WO2006091948A3 (en) | Laser produced plasma euv light source with pre-pulse | |
TW201444417A (zh) | 用於雷射生成式電漿型極紫外線光源的靶材 | |
WO2007121142A3 (en) | Improved light source employing laser-produced plasma | |
US9426872B1 (en) | System and method for controlling source laser firing in an LPP EUV light source | |
JP2006210157A (ja) | レーザ生成プラズマ方式極端紫外光光源 | |
US9363877B2 (en) | System and method to reduce oscillations in extreme ultraviolet light generation | |
WO2009140270A3 (en) | System and method for light source employing laser-produced plasma | |
DE60212581D1 (de) | Verfahren zur Strahlungserzeugung | |
WO2013029897A1 (en) | Radiation source and lithographic apparatus | |
SE0003715D0 (sv) | Förfarande och apparat för generering av röntgen- eller euv-strålning | |
TW200742503A (en) | Laser produced plasma EUV light source with pre-pulse | |
WO2024056330A1 (en) | Mixed energy control in an euv lithography system | |
USH1200H (en) | Method or creating x-rays from a pulsed laser source using a gaseous medium | |
Fourmaux et al. | Progress towards a LWFA-based X-ray machine for plant phase-contrast X-ray imaging | |
SE0003073D0 (sv) | Method and apparatus for generating X-ray or euv radiation as well as use thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |