ATE330976T1 - Reinigungsverfahren - Google Patents
ReinigungsverfahrenInfo
- Publication number
- ATE330976T1 ATE330976T1 AT00992477T AT00992477T ATE330976T1 AT E330976 T1 ATE330976 T1 AT E330976T1 AT 00992477 T AT00992477 T AT 00992477T AT 00992477 T AT00992477 T AT 00992477T AT E330976 T1 ATE330976 T1 AT E330976T1
- Authority
- AT
- Austria
- Prior art keywords
- cleaning procedure
- polymer
- partitioning
- polymers
- improving
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/06—Treatment of polymer solutions
- C08F6/12—Separation of polymers from solutions
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F6/00—Post-polymerisation treatments
- C08F6/06—Treatment of polymer solutions
- C08F6/10—Removal of volatile materials, e.g. solvents
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
- Glass Compositions (AREA)
- Steering Control In Accordance With Driving Conditions (AREA)
- Gas Separation By Absorption (AREA)
- Water Treatment By Sorption (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US44002399A | 1999-11-12 | 1999-11-12 | |
US09/667,856 US6414110B1 (en) | 1999-11-12 | 2000-09-20 | Purification means |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE330976T1 true ATE330976T1 (de) | 2006-07-15 |
Family
ID=27032263
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT00992477T ATE330976T1 (de) | 1999-11-12 | 2000-10-23 | Reinigungsverfahren |
Country Status (7)
Country | Link |
---|---|
US (1) | US6414110B1 (de) |
EP (1) | EP1228103B1 (de) |
AT (1) | ATE330976T1 (de) |
AU (1) | AU4503501A (de) |
DE (1) | DE60028997T2 (de) |
TW (1) | TW526212B (de) |
WO (1) | WO2001040321A2 (de) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6593431B2 (en) * | 2000-06-27 | 2003-07-15 | Chemfirst Electronic Materials Lp | Purification means |
US6787611B2 (en) * | 2000-06-27 | 2004-09-07 | Chemfirst Electronic Materials L.P. | Purification means |
US6761824B2 (en) | 2000-08-17 | 2004-07-13 | Reeve Lorraine E | Process for the fractionation of polymers |
US6864324B2 (en) | 2002-04-19 | 2005-03-08 | Chem First Electronic Materials L.P. | Anhydrous, liquid phase process for preparing hydroxyl containing polymers of enhanced purity |
TWI284783B (en) * | 2003-05-08 | 2007-08-01 | Du Pont | Photoresist compositions and processes for preparing the same |
US7834113B2 (en) * | 2003-05-08 | 2010-11-16 | E. I. Du Pont De Nemours And Company | Photoresist compositions and processes for preparing the same |
US7148320B2 (en) | 2003-12-16 | 2006-12-12 | Dupont Electronic Polymers L.P. | Polymer purification |
CN102109760B (zh) | 2006-03-31 | 2015-04-15 | Jsr株式会社 | 抗蚀剂图案形成方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01278503A (ja) * | 1988-05-02 | 1989-11-08 | Tonen Sekiyukagaku Kk | ポリ(2‐ヒドロキシスチレン)及びその製造法 |
US5087772A (en) * | 1990-11-16 | 1992-02-11 | Hoechst Celanese Corporation | Method for preparing 4-hydroxystyrene |
US6027853A (en) * | 1998-01-16 | 2000-02-22 | Olin Microelectronic Chemicals, Inc. | Process for preparing a radiation-sensitive composition |
US5945251A (en) * | 1998-05-08 | 1999-08-31 | Olin Corporation | Process for producing purified solutions of blocked polyhydroxystyrene resins |
-
2000
- 2000-09-20 US US09/667,856 patent/US6414110B1/en not_active Expired - Lifetime
- 2000-10-23 AT AT00992477T patent/ATE330976T1/de not_active IP Right Cessation
- 2000-10-23 EP EP00992477A patent/EP1228103B1/de not_active Expired - Lifetime
- 2000-10-23 WO PCT/US2000/041453 patent/WO2001040321A2/en active IP Right Grant
- 2000-10-23 DE DE60028997T patent/DE60028997T2/de not_active Expired - Lifetime
- 2000-10-23 AU AU45035/01A patent/AU4503501A/en not_active Abandoned
- 2000-11-10 TW TW089123818A patent/TW526212B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW526212B (en) | 2003-04-01 |
WO2001040321A2 (en) | 2001-06-07 |
US6414110B1 (en) | 2002-07-02 |
EP1228103A2 (de) | 2002-08-07 |
DE60028997T2 (de) | 2007-01-11 |
WO2001040321A3 (en) | 2002-05-10 |
EP1228103B1 (de) | 2006-06-21 |
DE60028997D1 (de) | 2006-08-03 |
AU4503501A (en) | 2001-06-12 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |