ATE311620T1 - Beleuchtungssystem mit einer eine transparente struktur aufweisenden vakuumkammerwand - Google Patents

Beleuchtungssystem mit einer eine transparente struktur aufweisenden vakuumkammerwand

Info

Publication number
ATE311620T1
ATE311620T1 AT01272772T AT01272772T ATE311620T1 AT E311620 T1 ATE311620 T1 AT E311620T1 AT 01272772 T AT01272772 T AT 01272772T AT 01272772 T AT01272772 T AT 01272772T AT E311620 T1 ATE311620 T1 AT E311620T1
Authority
AT
Austria
Prior art keywords
vacuum chamber
radiation
chamber wall
lighting system
radiation source
Prior art date
Application number
AT01272772T
Other languages
English (en)
Inventor
Hugo M Visser
Levinus P Bakker
Jeroen Jonkers
Original Assignee
Koninkl Philips Electronics Nv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv filed Critical Koninkl Philips Electronics Nv
Application granted granted Critical
Publication of ATE311620T1 publication Critical patent/ATE311620T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G03F7/70166—Capillary or channel elements, e.g. nested extreme ultraviolet [EUV] mirrors or shells, optical fibers or light guides
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Chemical & Material Sciences (AREA)
  • Public Health (AREA)
  • Nanotechnology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Theoretical Computer Science (AREA)
  • Mathematical Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AT01272772T 2001-01-03 2001-12-24 Beleuchtungssystem mit einer eine transparente struktur aufweisenden vakuumkammerwand ATE311620T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/752,818 US6576912B2 (en) 2001-01-03 2001-01-03 Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
PCT/IB2001/002710 WO2002054153A1 (en) 2001-01-03 2001-12-24 Illumination system with vacuum chamber wall having transparent structure

Publications (1)

Publication Number Publication Date
ATE311620T1 true ATE311620T1 (de) 2005-12-15

Family

ID=25027984

Family Applications (1)

Application Number Title Priority Date Filing Date
AT01272772T ATE311620T1 (de) 2001-01-03 2001-12-24 Beleuchtungssystem mit einer eine transparente struktur aufweisenden vakuumkammerwand

Country Status (8)

Country Link
US (1) US6576912B2 (de)
EP (1) EP1350141B1 (de)
JP (1) JP2004517485A (de)
KR (1) KR20020077521A (de)
AT (1) ATE311620T1 (de)
DE (1) DE60115495T2 (de)
TW (1) TWI237741B (de)
WO (1) WO2002054153A1 (de)

Families Citing this family (56)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7856044B2 (en) * 1999-05-10 2010-12-21 Cymer, Inc. Extendable electrode for gas discharge laser
US7180081B2 (en) * 2000-06-09 2007-02-20 Cymer, Inc. Discharge produced plasma EUV light source
US7346093B2 (en) * 2000-11-17 2008-03-18 Cymer, Inc. DUV light source optical element improvements
US6576912B2 (en) * 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window
US7439530B2 (en) * 2005-06-29 2008-10-21 Cymer, Inc. LPP EUV light source drive laser system
US7372056B2 (en) * 2005-06-29 2008-05-13 Cymer, Inc. LPP EUV plasma source material target delivery system
US7405416B2 (en) 2005-02-25 2008-07-29 Cymer, Inc. Method and apparatus for EUV plasma source target delivery
US7598509B2 (en) * 2004-11-01 2009-10-06 Cymer, Inc. Laser produced plasma EUV light source
US7465946B2 (en) * 2004-03-10 2008-12-16 Cymer, Inc. Alternative fuels for EUV light source
US7378673B2 (en) * 2005-02-25 2008-05-27 Cymer, Inc. Source material dispenser for EUV light source
US7671349B2 (en) * 2003-04-08 2010-03-02 Cymer, Inc. Laser produced plasma EUV light source
KR100589236B1 (ko) * 2002-08-15 2006-06-14 에이에스엠엘 네델란즈 비.브이. 리소그래피 투영장치 및 상기 장치에 사용하는 반사기조립체
CN1495531B (zh) * 2002-08-23 2010-05-26 Asml荷兰有限公司 光刻投射装置及用于所述装置中的粒子屏障
US6770895B2 (en) * 2002-11-21 2004-08-03 Asml Holding N.V. Method and apparatus for isolating light source gas from main chamber gas in a lithography tool
US6963071B2 (en) * 2002-11-25 2005-11-08 Intel Corporation Debris mitigation device
EP1434098B1 (de) * 2002-12-23 2006-03-08 ASML Netherlands B.V. Kontaminationsschutz mit ausdehnbaren Lamellen
TWI255394B (en) * 2002-12-23 2006-05-21 Asml Netherlands Bv Lithographic apparatus with debris suppression means and device manufacturing method
CN100476585C (zh) 2002-12-23 2009-04-08 Asml荷兰有限公司 具有可扩展薄片的杂质屏蔽
TWI275325B (en) * 2003-03-08 2007-03-01 Cymer Inc Discharge produced plasma EUV light source
US6919573B2 (en) * 2003-03-20 2005-07-19 Asml Holding N.V Method and apparatus for recycling gases used in a lithography tool
US7217941B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Systems and methods for deflecting plasma-generated ions to prevent the ions from reaching an internal component of an EUV light source
US7217940B2 (en) * 2003-04-08 2007-05-15 Cymer, Inc. Collector for EUV light source
US20060146906A1 (en) * 2004-02-18 2006-07-06 Cymer, Inc. LLP EUV drive laser
US7193228B2 (en) 2004-03-10 2007-03-20 Cymer, Inc. EUV light source optical elements
US7164144B2 (en) * 2004-03-10 2007-01-16 Cymer Inc. EUV light source
US8075732B2 (en) * 2004-11-01 2011-12-13 Cymer, Inc. EUV collector debris management
US7087914B2 (en) * 2004-03-17 2006-08-08 Cymer, Inc High repetition rate laser produced plasma EUV light source
US7196342B2 (en) * 2004-03-10 2007-03-27 Cymer, Inc. Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
WO2005096099A2 (en) 2004-03-31 2005-10-13 Philips Intellectual Property & Standards Gmbh Removal of particles generated by a radiation source
US7050237B2 (en) * 2004-06-02 2006-05-23 The Regents Of The University Of California High-efficiency spectral purity filter for EUV lithography
US7307263B2 (en) 2004-07-14 2007-12-11 Asml Netherlands B.V. Lithographic apparatus, radiation system, contaminant trap, device manufacturing method, and method for trapping contaminants in a contaminant trap
US7109503B1 (en) * 2005-02-25 2006-09-19 Cymer, Inc. Systems for protecting internal components of an EUV light source from plasma-generated debris
US7355191B2 (en) * 2004-11-01 2008-04-08 Cymer, Inc. Systems and methods for cleaning a chamber window of an EUV light source
US7361911B2 (en) * 2004-12-09 2008-04-22 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7211810B2 (en) * 2004-12-29 2007-05-01 Asml Netherlands B.V. Method for the protection of an optical element, lithographic apparatus, and device manufacturing method
US7868304B2 (en) * 2005-02-07 2011-01-11 Asml Netherlands B.V. Method for removal of deposition on an optical element, lithographic apparatus, device manufacturing method, and device manufactured thereby
US7449703B2 (en) * 2005-02-25 2008-11-11 Cymer, Inc. Method and apparatus for EUV plasma source target delivery target material handling
US7482609B2 (en) * 2005-02-28 2009-01-27 Cymer, Inc. LPP EUV light source drive laser system
US7336416B2 (en) * 2005-04-27 2008-02-26 Asml Netherlands B.V. Spectral purity filter for multi-layer mirror, lithographic apparatus including such multi-layer mirror, method for enlarging the ratio of desired radiation and undesired radiation, and device manufacturing method
US7385673B2 (en) * 2005-06-10 2008-06-10 International Business Machines Corporation Immersion lithography with equalized pressure on at least projection optics component and wafer
CN101218543A (zh) * 2005-06-14 2008-07-09 皇家飞利浦电子股份有限公司 具有改进气体分布的碎片抑制系统
US7365349B2 (en) * 2005-06-27 2008-04-29 Cymer, Inc. EUV light source collector lifetime improvements
US7180083B2 (en) * 2005-06-27 2007-02-20 Cymer, Inc. EUV light source collector erosion mitigation
US7402825B2 (en) * 2005-06-28 2008-07-22 Cymer, Inc. LPP EUV drive laser input system
US8018574B2 (en) * 2005-06-30 2011-09-13 Asml Netherlands B.V. Lithographic apparatus, radiation system and device manufacturing method
US7468521B2 (en) 2005-12-28 2008-12-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7307237B2 (en) * 2005-12-29 2007-12-11 Honeywell International, Inc. Hand-held laser welding wand nozzle assembly including laser and feeder extension tips
US7736820B2 (en) * 2006-05-05 2010-06-15 Asml Netherlands B.V. Anti-reflection coating for an EUV mask
US7655925B2 (en) * 2007-08-31 2010-02-02 Cymer, Inc. Gas management system for a laser-produced-plasma EUV light source
US7812329B2 (en) * 2007-12-14 2010-10-12 Cymer, Inc. System managing gas flow between chambers of an extreme ultraviolet (EUV) photolithography apparatus
US8519366B2 (en) * 2008-08-06 2013-08-27 Cymer, Inc. Debris protection system having a magnetic field for an EUV light source
KR101697610B1 (ko) * 2008-09-11 2017-01-18 에이에스엠엘 네델란즈 비.브이. 방사선 소스 및 리소그래피 장치
JP5687488B2 (ja) 2010-02-22 2015-03-18 ギガフォトン株式会社 極端紫外光生成装置
NL2008009A (en) * 2011-02-02 2012-08-06 Asml Netherlands Bv Illumination system, lithographic apparatus and method.
US10732421B2 (en) * 2013-11-08 2020-08-04 IRISS Holdings, Inc. Bus duct with a curved viewing window assembly
WO2021133605A1 (en) * 2019-12-24 2021-07-01 Donald Ronning Tunable source and methods using the same

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE101736C (de)
JPS6197918A (ja) * 1984-10-19 1986-05-16 Hitachi Ltd Ｘ線露光装置
JPS6216525A (ja) * 1985-07-15 1987-01-24 Canon Inc 保持機構
JPS6240145A (ja) * 1985-08-16 1987-02-21 Fujitsu Ltd プラズマｘ線発生装置
US4792688A (en) * 1987-06-15 1988-12-20 The Perkin-Elmer Corporation Differentially pumped seal apparatus
US5175755A (en) 1990-10-31 1992-12-29 X-Ray Optical System, Inc. Use of a kumakhov lens for x-ray lithography
NL1008352C2 (nl) 1998-02-19 1999-08-20 Stichting Tech Wetenschapp Inrichting, geschikt voor extreem ultraviolet lithografie, omvattende een stralingsbron en een verwerkingsorgaan voor het verwerken van de van de stralingsbron afkomstige straling, alsmede een filter voor het onderdrukken van ongewenste atomaire en microscopische deeltjes welke door een stralingsbron zijn uitgezonden.
US6459472B1 (en) * 1998-05-15 2002-10-01 Asml Netherlands B.V. Lithographic device
US6118535A (en) * 1999-06-02 2000-09-12 Goldberg; Kenneth Alan In Situ alignment system for phase-shifting point-diffraction interferometry
DE19962160C2 (de) 1999-06-29 2003-11-13 Fraunhofer Ges Forschung Vorrichtungen zur Erzeugung von Extrem-Ultraviolett- und weicher Röntgenstrahlung aus einer Gasentladung
TWI267704B (en) * 1999-07-02 2006-12-01 Asml Netherlands Bv Capping layer for EUV optical elements
TWI246872B (en) * 1999-12-17 2006-01-01 Asml Netherlands Bv Radiation source for use in lithographic projection apparatus
TWI240151B (en) * 2000-10-10 2005-09-21 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6924492B2 (en) * 2000-12-22 2005-08-02 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6576912B2 (en) * 2001-01-03 2003-06-10 Hugo M. Visser Lithographic projection apparatus equipped with extreme ultraviolet window serving simultaneously as vacuum window

Also Published As

Publication number Publication date
DE60115495D1 (de) 2006-01-05
DE60115495T2 (de) 2006-08-03
EP1350141B1 (de) 2005-11-30
TWI237741B (en) 2005-08-11
JP2004517485A (ja) 2004-06-10
US20020084428A1 (en) 2002-07-04
EP1350141A1 (de) 2003-10-08
KR20020077521A (ko) 2002-10-11
US6576912B2 (en) 2003-06-10
WO2002054153A1 (en) 2002-07-11

Similar Documents

Publication Publication Date Title
ATE311620T1 (de) Beleuchtungssystem mit einer eine transparente struktur aufweisenden vakuumkammerwand
JP2008518480A5 (de)
WO2010002766A3 (en) Energy-driven, e.g. laser-driven, light source
DE60313255D1 (de) Lichtemittierendes Bauelement, das poröses Aluminiumoxid enthält, und Methode zu dessen Herstellung
WO2006049886A3 (en) Euv collector debris management
WO2008057441A3 (en) Water disinfection apparatus
TW200511900A (en) Method and apparatus for producing extreme ultraviolet radiation or soft X-ray radiation
SG127702A1 (en) Radiation source, lithographic apparatus, and device manufacturing method
US6670619B2 (en) Transilluminator
DE50003999D1 (de) Bestrahlungsgerät
JP2005502209A5 (de)
TW200723361A (en) A luminous source device of extreme ultraviolet rays and method for eliminating debris of the same
TW200741134A (en) Optical device for creating an illumination window
ATE313041T1 (de) Kfz-scheinwerfer nach dem projektionsprinzip mit einer sekundären lichtquelle
TW200715849A (en) Method for producing transmissive screen, apparatus for producing transmissive screen, and transmissive screen
PE20030588A1 (es) Metodos para granulacion humeda de azitromicina
SG159566A1 (en) High pressure discharge lamp containing a getter device
ATE491324T1 (de) Vorrichtung zur erzeugung von extrem-ultraviolett-und weicher röntgenstrahlung aus einer gasentladung
ATE533175T1 (de) Korona-entladungslampen
DE69501379D1 (de) Metall-halogenid lampe
DE50006799D1 (de) Verfahren zum Betrieb einer Entladungslampe
KR102244638B1 (ko) 오염방지 성능이 향상된 고차조화파를 이용한 극자외선 발생장치
EP0502429A3 (en) Fast atom beam source
DE502006005713D1 (de) Leuchtanordnung
ATE352181T1 (de) Mikrowellengerät

Legal Events

Date Code Title Description
RER Ceased as to paragraph 5 lit. 3 law introducing patent treaties