ATE204927T1 - Verfahren und vorrichtung zur herstellung einer beschichtung auf einem substrat - Google Patents

Verfahren und vorrichtung zur herstellung einer beschichtung auf einem substrat

Info

Publication number
ATE204927T1
ATE204927T1 AT97870100T AT97870100T ATE204927T1 AT E204927 T1 ATE204927 T1 AT E204927T1 AT 97870100 T AT97870100 T AT 97870100T AT 97870100 T AT97870100 T AT 97870100T AT E204927 T1 ATE204927 T1 AT E204927T1
Authority
AT
Austria
Prior art keywords
substrate
zone
thickness
deposition
deposit
Prior art date
Application number
AT97870100T
Other languages
English (en)
Inventor
Brande Pierre Vanden
Alain Weymeersch
Original Assignee
Cockerill Rech & Dev
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cockerill Rech & Dev filed Critical Cockerill Rech & Dev
Application granted granted Critical
Publication of ATE204927T1 publication Critical patent/ATE204927T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/0641—Nitrides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/58—After-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Chemical Vapour Deposition (AREA)
AT97870100T 1996-07-12 1997-07-08 Verfahren und vorrichtung zur herstellung einer beschichtung auf einem substrat ATE204927T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE9600637A BE1010420A3 (fr) 1996-07-12 1996-07-12 Procede pour la formation d'un revetement sur un substrat et installation pour la mise en oeuvre de ce procede.

Publications (1)

Publication Number Publication Date
ATE204927T1 true ATE204927T1 (de) 2001-09-15

Family

ID=3889877

Family Applications (1)

Application Number Title Priority Date Filing Date
AT97870100T ATE204927T1 (de) 1996-07-12 1997-07-08 Verfahren und vorrichtung zur herstellung einer beschichtung auf einem substrat

Country Status (8)

Country Link
US (2) US6171659B1 (de)
EP (1) EP0818557B1 (de)
AT (1) ATE204927T1 (de)
BE (1) BE1010420A3 (de)
DE (1) DE69706380T2 (de)
DK (1) DK0818557T3 (de)
ES (1) ES2162670T3 (de)
PT (1) PT818557E (de)

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US6964731B1 (en) * 1998-12-21 2005-11-15 Cardinal Cg Company Soil-resistant coating for glass surfaces
US6676810B2 (en) * 2000-01-12 2004-01-13 D2 In-Line Solutions, Llc Method of coating insulative substrates
AUPR515301A0 (en) * 2001-05-22 2001-06-14 Commonwealth Scientific And Industrial Research Organisation Process and apparatus for producing crystalline thin film buffer layers and structures having biaxial texture
AU2002302168B2 (en) * 2001-05-22 2007-11-08 Commonwealth Scientific And Industrial Research Organisation Process and apparatus for producing crystalline thin film buffer layers and structures having biaxial texture
WO2003085156A1 (en) * 2002-03-29 2003-10-16 D2 In-Line Solutions, Llc Gravity-fed in-line continuous processing system and method
CA2509952A1 (en) 2002-12-18 2004-11-25 Cardinal Cg Company Plasma-enhanced film deposition
WO2004061151A1 (en) * 2002-12-31 2004-07-22 Cardinal Cg Company Coater having substrate cleaning device and coating deposition methods employing such coater
US7128133B2 (en) * 2003-12-16 2006-10-31 3M Innovative Properties Company Hydrofluoroether as a heat-transfer fluid
US7294404B2 (en) * 2003-12-22 2007-11-13 Cardinal Cg Company Graded photocatalytic coatings
DE602005003234T2 (de) * 2004-07-12 2008-08-28 Cardinal Cg Co., Eden Prairie Wartungsarme beschichtungen
JP2008520525A (ja) * 2004-11-15 2008-06-19 日本板硝子株式会社 配列構造を有するコーティングの蒸着方法および設備
US7923114B2 (en) * 2004-12-03 2011-04-12 Cardinal Cg Company Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
US8092660B2 (en) * 2004-12-03 2012-01-10 Cardinal Cg Company Methods and equipment for depositing hydrophilic coatings, and deposition technologies for thin films
WO2007124291A2 (en) 2006-04-19 2007-11-01 Cardinal Cg Company Opposed functional coatings having comparable single surface reflectances
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US8383209B2 (en) * 2006-09-27 2013-02-26 Wd Media (Singapore) Pte. Ltd. Magnetic recording medium manufacturing method and laminate manufacturing method
EP2261186B1 (de) * 2007-09-14 2017-11-22 Cardinal CG Company Pflegeleichte beschichtungstechnologie
BE1017852A3 (fr) * 2007-11-19 2009-09-01 Ind Plasma Services & Technologies Ipst Gmbh Procede et installation de galvanisation par evaporation plasma.
DE102013110328B4 (de) * 2013-09-19 2018-05-09 VON ARDENNE Asset GmbH & Co. KG Beschichtungsanordnung und Beschichtungsverfahren
WO2018093985A1 (en) 2016-11-17 2018-05-24 Cardinal Cg Company Static-dissipative coating technology

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Publication number Priority date Publication date Assignee Title
US3594238A (en) * 1968-08-15 1971-07-20 United States Steel Corp Method for treating aluminum surfaces to prevent discoloration
JPS56163262A (en) * 1980-05-21 1981-12-15 Ulvac Corp Method and apparatus for forming oxidation and weather resistant film after surface treatment
US4478703A (en) * 1983-03-31 1984-10-23 Kawasaki Jukogyo Kabushiki Kaisha Sputtering system
JPS60141869A (ja) * 1983-12-29 1985-07-26 Nissin Electric Co Ltd 膜形成方法および膜形成装置
GB8423255D0 (en) * 1984-09-14 1984-10-17 Atomic Energy Authority Uk Surface treatment of metals
US4708037A (en) * 1985-11-18 1987-11-24 Gte Laboratories Incorporated Coated cemented carbide tool for steel roughing applications and methods for machining
GB8626330D0 (en) * 1986-11-04 1986-12-31 Atomic Energy Authority Uk Ion assisted coatings
DE3641718A1 (de) * 1986-12-06 1988-06-16 Leybold Ag Verfahren zum herstellen von wickeln aus im vakuum leitfaehig beschichteten isolierstoff-folien
JPS63206464A (ja) * 1987-02-23 1988-08-25 Asahi Glass Co Ltd インライン型複合表面処理装置
US4851095A (en) * 1988-02-08 1989-07-25 Optical Coating Laboratory, Inc. Magnetron sputtering apparatus and process
JPH01294861A (ja) * 1988-05-20 1989-11-28 Hitachi Koki Co Ltd イオンビームミキシング法
US5241152A (en) * 1990-03-23 1993-08-31 Anderson Glen L Circuit for detecting and diverting an electrical arc in a glow discharge apparatus
US5346600A (en) * 1992-08-14 1994-09-13 Hughes Aircraft Company Plasma-enhanced magnetron-sputtered deposition of materials
JP3291088B2 (ja) * 1993-10-06 2002-06-10 株式会社神戸製鋼所 被膜形成方法

Also Published As

Publication number Publication date
DK0818557T3 (da) 2002-01-07
US20010001948A1 (en) 2001-05-31
EP0818557B1 (de) 2001-08-29
EP0818557A1 (de) 1998-01-14
PT818557E (pt) 2002-02-28
US6337005B2 (en) 2002-01-08
ES2162670T3 (es) 2002-01-01
BE1010420A3 (fr) 1998-07-07
DE69706380D1 (de) 2001-10-04
US6171659B1 (en) 2001-01-09
DE69706380T2 (de) 2002-05-08

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UEP Publication of translation of european patent specification