ATE135666T1 - Verfahren zur herstellung eines kieselsäuregels - Google Patents
Verfahren zur herstellung eines kieselsäuregelsInfo
- Publication number
- ATE135666T1 ATE135666T1 AT91919289T AT91919289T ATE135666T1 AT E135666 T1 ATE135666 T1 AT E135666T1 AT 91919289 T AT91919289 T AT 91919289T AT 91919289 T AT91919289 T AT 91919289T AT E135666 T1 ATE135666 T1 AT E135666T1
- Authority
- AT
- Austria
- Prior art keywords
- sol
- silica gel
- silicic acid
- producing
- thawing
- Prior art date
Links
- 235000012239 silicon dioxide Nutrition 0.000 title abstract 2
- LRCFXGAMWKDGLA-UHFFFAOYSA-N dioxosilane;hydrate Chemical compound O.O=[Si]=O LRCFXGAMWKDGLA-UHFFFAOYSA-N 0.000 title 1
- 238000004519 manufacturing process Methods 0.000 title 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 5
- 239000000741 silica gel Substances 0.000 abstract 3
- 229910002027 silica gel Inorganic materials 0.000 abstract 3
- 238000007710 freezing Methods 0.000 abstract 2
- 230000008014 freezing Effects 0.000 abstract 2
- 239000000017 hydrogel Substances 0.000 abstract 2
- 238000000034 method Methods 0.000 abstract 2
- 238000006116 polymerization reaction Methods 0.000 abstract 2
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 abstract 2
- 238000010257 thawing Methods 0.000 abstract 2
- 239000013078 crystal Substances 0.000 abstract 1
- 238000001035 drying Methods 0.000 abstract 1
- 238000004108 freeze drying Methods 0.000 abstract 1
- 238000001879 gelation Methods 0.000 abstract 1
- 230000000704 physical effect Effects 0.000 abstract 1
- 239000011148 porous material Substances 0.000 abstract 1
- 239000000377 silicon dioxide Substances 0.000 abstract 1
- 239000002904 solvent Substances 0.000 abstract 1
- 238000005406 washing Methods 0.000 abstract 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/152—Preparation of hydrogels
Landscapes
- Chemical & Material Sciences (AREA)
- Dispersion Chemistry (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27464390 | 1990-10-12 |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE135666T1 true ATE135666T1 (de) | 1996-04-15 |
Family
ID=17544566
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT91919289T ATE135666T1 (de) | 1990-10-12 | 1991-10-11 | Verfahren zur herstellung eines kieselsäuregels |
Country Status (5)
Country | Link |
---|---|
US (1) | US5380510A (de) |
EP (1) | EP0505583B1 (de) |
AT (1) | ATE135666T1 (de) |
DE (1) | DE69118167T2 (de) |
WO (1) | WO1992006920A1 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5912257A (en) * | 1995-09-06 | 1999-06-15 | The Research Foundation Of State University Of New York | Two-photon upconverting dyes and applications |
EP1062031A4 (de) * | 1998-02-09 | 2001-04-04 | Ind Science & Technology Netwo | Ionen-trennung mit oberflächenbehandeltem xerogel |
CN1315725C (zh) * | 1999-12-28 | 2007-05-16 | 株式会社渡边商行 | 二氧化硅粒子、合成石英粉、合成石英玻璃的合成方法 |
US7026362B2 (en) * | 2001-10-09 | 2006-04-11 | Simax Technologies, Inc. | Sol-gel process utilizing reduced mixing temperatures |
US7125912B2 (en) * | 2001-10-09 | 2006-10-24 | Simax Technologies, Inc. | Doped sol-gel materials and method of manufacture utilizing reduced mixing temperatures |
US20030147606A1 (en) * | 2002-02-01 | 2003-08-07 | Shiho Wang | Sol-gel-based optical preforms and methods of manufacture |
US6928220B2 (en) * | 2002-02-01 | 2005-08-09 | Simax Technologies, Inc. | Sol-gel-derived optical fiber preform and method of manufacture |
US20040194511A1 (en) * | 2002-02-01 | 2004-10-07 | Chih-Hsing Cheng | Sol-gel-derived halogen-doped glass |
US7001568B2 (en) * | 2002-02-01 | 2006-02-21 | Simax Technologies, Inc. | Method of removing liquid from pores of a sol-gel monolith |
US7000885B2 (en) * | 2002-02-01 | 2006-02-21 | Simax Technologies, Inc. | Apparatus and method for forming a sol-gel monolith utilizing multiple casting |
US20100324155A1 (en) * | 2003-07-08 | 2010-12-23 | Los Alamos National Security, Llc | Preparation of inorganic foam |
US7438875B2 (en) * | 2003-10-16 | 2008-10-21 | Kimberly-Clark Worldwide, Inc. | Method for reducing odor using metal-modified silica particles |
CN102794202B (zh) * | 2012-08-17 | 2014-05-21 | 垦利三合新材料科技有限责任公司 | 一种孔径可调控催化剂载体硅胶的制备方法 |
JP6317878B2 (ja) * | 2012-11-30 | 2018-04-25 | 国立大学法人九州大学 | 電極付基板の製造方法および電極付基板 |
WO2015034515A1 (en) * | 2013-09-06 | 2015-03-12 | The Massachusetts Institute Of Technology | In-situ aerogels and methods of making same |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2561304A (en) * | 1947-10-30 | 1951-07-17 | Philadelphia Quartz Co | Process for the production of finely divided amorphous silica |
US3681017A (en) * | 1970-07-06 | 1972-08-01 | Grace W R & Co | Platelet silica,its production and uses |
JPS50161484A (de) * | 1974-06-20 | 1975-12-27 | ||
US4230679A (en) * | 1978-12-22 | 1980-10-28 | E. I. Du Pont De Nemours And Company | Poly(silicic acid) |
SU1174376A1 (ru) * | 1983-08-12 | 1985-08-23 | Армянский Филиал Неорганических Материалов Всесоюзного Ордена Трудового Красного Знамени Научно-Исследовательского Института Химических Реактивов И Особо Чистых Химических Веществ | Способ получени силикагел дл хроматографии |
-
1991
- 1991-10-11 EP EP91919289A patent/EP0505583B1/de not_active Expired - Lifetime
- 1991-10-11 AT AT91919289T patent/ATE135666T1/de not_active IP Right Cessation
- 1991-10-11 DE DE69118167T patent/DE69118167T2/de not_active Expired - Fee Related
- 1991-10-11 WO PCT/JP1991/001404 patent/WO1992006920A1/ja active IP Right Grant
-
1993
- 1993-12-09 US US08/166,261 patent/US5380510A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
DE69118167T2 (de) | 1996-09-05 |
EP0505583A4 (en) | 1993-09-15 |
DE69118167D1 (de) | 1996-04-25 |
EP0505583A1 (de) | 1992-09-30 |
WO1992006920A1 (fr) | 1992-04-30 |
EP0505583B1 (de) | 1996-03-20 |
US5380510A (en) | 1995-01-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |