ATE127651T1 - Vorrichtung und verfahren zur behandlung von materialien. - Google Patents
Vorrichtung und verfahren zur behandlung von materialien.Info
- Publication number
- ATE127651T1 ATE127651T1 AT90908390T AT90908390T ATE127651T1 AT E127651 T1 ATE127651 T1 AT E127651T1 AT 90908390 T AT90908390 T AT 90908390T AT 90908390 T AT90908390 T AT 90908390T AT E127651 T1 ATE127651 T1 AT E127651T1
- Authority
- AT
- Austria
- Prior art keywords
- ultraviolet light
- high intensity
- intensity ultraviolet
- temperature
- pinch unit
- Prior art date
Links
- 239000000463 material Substances 0.000 title abstract 4
- 238000000137 annealing Methods 0.000 abstract 2
- 238000004140 cleaning Methods 0.000 abstract 1
- 238000005530 etching Methods 0.000 abstract 1
- 239000007788 liquid Substances 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
- B08B7/0035—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like
- B08B7/0057—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by radiant energy, e.g. UV, laser, light beam or the like by ultraviolet radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70016—Production of exposure light, i.e. light sources by discharge lamps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/26—Bombardment with radiation
- H01L21/263—Bombardment with radiation with high-energy radiation
- H01L21/268—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation
- H01L21/2686—Bombardment with radiation with high-energy radiation using electromagnetic radiation, e.g. laser radiation using incoherent radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/02—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma
- H05H1/04—Arrangements for confining plasma by electric or magnetic fields; Arrangements for heating plasma using magnetic fields substantially generated by the discharge in the plasma
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/52—Generating plasma using exploding wires or spark gaps
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Optics & Photonics (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Nanotechnology (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- High Energy & Nuclear Physics (AREA)
- Toxicology (AREA)
- Mathematical Physics (AREA)
- Electromagnetism (AREA)
- Theoretical Computer Science (AREA)
- Health & Medical Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Forging (AREA)
- Threshing Machine Elements (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
- Weting (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/347,422 US5079187A (en) | 1987-12-07 | 1989-05-04 | Method for processing semiconductor materials |
US07/425,865 US5204506A (en) | 1987-12-07 | 1989-10-24 | Plasma pinch surface treating apparatus and method of using same |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE127651T1 true ATE127651T1 (de) | 1995-09-15 |
Family
ID=26995261
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT90908390T ATE127651T1 (de) | 1989-05-04 | 1990-05-04 | Vorrichtung und verfahren zur behandlung von materialien. |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP0441905B1 (de) |
AT (1) | ATE127651T1 (de) |
AU (1) | AU5725690A (de) |
DE (1) | DE69022212D1 (de) |
WO (1) | WO1990013910A1 (de) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7025831B1 (en) | 1995-12-21 | 2006-04-11 | Fsi International, Inc. | Apparatus for surface conditioning |
US6165273A (en) | 1997-10-21 | 2000-12-26 | Fsi International Inc. | Equipment for UV wafer heating and photochemistry |
US6465374B1 (en) | 1997-10-21 | 2002-10-15 | Fsi International, Inc. | Method of surface preparation |
KR20010107966A (ko) * | 1998-11-16 | 2001-12-07 | 에프 에스 아이 인터내셔날,인코포레이티드 | 자외선 웨이퍼 가열처리 및 광화학적 프로세스 장비 |
US10415552B2 (en) * | 2017-02-07 | 2019-09-17 | The Boeing Company | Injection system and method for injecting a cylindrical array of liquid jets |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3946332A (en) * | 1974-06-13 | 1976-03-23 | Samis Michael A | High power density continuous wave plasma glow jet laser system |
US4369514A (en) * | 1980-10-30 | 1983-01-18 | Bell Telephone Laboratories, Incorporated | Recombination laser |
US4450568A (en) * | 1981-11-13 | 1984-05-22 | Maxwell Laboratories, Inc. | Pumping a photolytic laser utilizing a plasma pinch |
US4454835A (en) * | 1982-09-13 | 1984-06-19 | The United States Of America As Represented By The Secretary Of The Navy | Internal photolysis reactor |
JPS59129772A (ja) * | 1983-01-18 | 1984-07-26 | Ushio Inc | 光化学蒸着装置 |
US4522657A (en) * | 1983-10-20 | 1985-06-11 | Westinghouse Electric Corp. | Low temperature process for annealing shallow implanted N+/P junctions |
JPS60175351A (ja) * | 1984-02-14 | 1985-09-09 | Nippon Telegr & Teleph Corp <Ntt> | X線発生装置およびx線露光法 |
US4624736A (en) * | 1984-07-24 | 1986-11-25 | The United States Of America As Represented By The United States Department Of Energy | Laser/plasma chemical processing of substrates |
US4718974A (en) * | 1987-01-09 | 1988-01-12 | Ultraphase Equipment, Inc. | Photoresist stripping apparatus using microwave pumped ultraviolet lamp |
US4889605A (en) * | 1987-12-07 | 1989-12-26 | The Regents Of The University Of California | Plasma pinch system |
-
1990
- 1990-05-04 AU AU57256/90A patent/AU5725690A/en not_active Abandoned
- 1990-05-04 WO PCT/US1990/002480 patent/WO1990013910A1/en active IP Right Grant
- 1990-05-04 AT AT90908390T patent/ATE127651T1/de not_active IP Right Cessation
- 1990-05-04 DE DE69022212T patent/DE69022212D1/de not_active Expired - Lifetime
- 1990-05-04 EP EP90908390A patent/EP0441905B1/de not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
WO1990013910A1 (en) | 1990-11-15 |
DE69022212D1 (de) | 1995-10-12 |
EP0441905A4 (en) | 1991-12-18 |
EP0441905B1 (de) | 1995-09-06 |
EP0441905A1 (de) | 1991-08-21 |
AU5725690A (en) | 1990-11-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |