AT334977B - Verfahren zur herstellung isolierter halbleiterbereiche - Google Patents
Verfahren zur herstellung isolierter halbleiterbereicheInfo
- Publication number
- AT334977B AT334977B AT211071A AT211071A AT334977B AT 334977 B AT334977 B AT 334977B AT 211071 A AT211071 A AT 211071A AT 211071 A AT211071 A AT 211071A AT 334977 B AT334977 B AT 334977B
- Authority
- AT
- Austria
- Prior art keywords
- semiconductor areas
- insulated semiconductor
- manufacturing insulated
- manufacturing
- areas
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/71—Manufacture of specific parts of devices defined in group H01L21/70
- H01L21/76—Making of isolation regions between components
- H01L21/762—Dielectric regions, e.g. EPIC dielectric isolation, LOCOS; Trench refilling techniques, SOI technology, use of channel stoppers
- H01L21/76297—Dielectric isolation using EPIC techniques, i.e. epitaxial passivated integrated circuit
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/026—Deposition thru hole in mask
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/049—Equivalence and options
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/051—Etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/085—Isolated-integrated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/097—Lattice strain and defects
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/135—Removal of substrate
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/914—Doping
- Y10S438/924—To facilitate selective etching
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S438/00—Semiconductor device manufacturing: process
- Y10S438/928—Front and rear surface processing
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Element Separation (AREA)
- Weting (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19702013546 DE2013546A1 (de) | 1970-03-20 | 1970-03-20 | Verfahren zur Herstellung isolierter Halbleiterbereiche |
Publications (2)
Publication Number | Publication Date |
---|---|
ATA211071A ATA211071A (de) | 1976-06-15 |
AT334977B true AT334977B (de) | 1977-02-10 |
Family
ID=5765809
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT211071A AT334977B (de) | 1970-03-20 | 1971-03-11 | Verfahren zur herstellung isolierter halbleiterbereiche |
Country Status (8)
Country | Link |
---|---|
US (1) | US3776788A (de) |
AT (1) | AT334977B (de) |
CH (1) | CH522961A (de) |
DE (1) | DE2013546A1 (de) |
FR (1) | FR2083459B1 (de) |
GB (1) | GB1279588A (de) |
NL (1) | NL7103589A (de) |
SE (1) | SE358256B (de) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3884733A (en) * | 1971-08-13 | 1975-05-20 | Texas Instruments Inc | Dielectric isolation process |
US3997381A (en) * | 1975-01-10 | 1976-12-14 | Intel Corporation | Method of manufacture of an epitaxial semiconductor layer on an insulating substrate |
US4054497A (en) * | 1975-10-06 | 1977-10-18 | Honeywell Inc. | Method for electrolytically etching semiconductor material |
US4349394A (en) * | 1979-12-06 | 1982-09-14 | Siemens Corporation | Method of making a zener diode utilizing gas-phase epitaxial deposition |
US4554059A (en) * | 1983-11-04 | 1985-11-19 | Harris Corporation | Electrochemical dielectric isolation technique |
JP2833519B2 (ja) * | 1994-09-27 | 1998-12-09 | 日本電気株式会社 | 絶縁膜上の半導体膜の薄膜化方法および薄膜化装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL6703014A (de) * | 1967-02-25 | 1968-08-26 |
-
1970
- 1970-03-20 DE DE19702013546 patent/DE2013546A1/de active Pending
-
1971
- 1971-03-08 CH CH336271A patent/CH522961A/de not_active IP Right Cessation
- 1971-03-11 AT AT211071A patent/AT334977B/de active
- 1971-03-17 NL NL7103589A patent/NL7103589A/xx unknown
- 1971-03-19 FR FR7109674A patent/FR2083459B1/fr not_active Expired
- 1971-03-19 SE SE03607/71A patent/SE358256B/xx unknown
- 1971-03-22 US US00126724A patent/US3776788A/en not_active Expired - Lifetime
- 1971-04-19 GB GB24817/71A patent/GB1279588A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
US3776788A (en) | 1973-12-04 |
ATA211071A (de) | 1976-06-15 |
SE358256B (de) | 1973-07-23 |
CH522961A (de) | 1972-05-15 |
GB1279588A (en) | 1972-06-28 |
NL7103589A (de) | 1971-09-22 |
FR2083459B1 (de) | 1977-01-28 |
FR2083459A1 (de) | 1971-12-17 |
DE2013546A1 (de) | 1971-09-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CH531000A (de) | Verfahren zur Herstellung neuer Benzocycloheptathiophene | |
AT326468B (de) | Verfahren zur herstellung von nahrungsmitteln | |
AT345152B (de) | Verfahren zur herstellung von formkoerpern | |
DE1918845B2 (de) | Verfahren zur herstellung von halbleiteranordnungen | |
CH558312A (de) | Verfahren zur herstellung von siliciumnitrid-formkoerpern. | |
AT311315B (de) | Verfahren zur Herstellung neuer Alkoxydinitroaniline | |
AT324101B (de) | Verfahren zur herstellung von lebensmitteln | |
CH547799A (de) | Verfahren zur herstellung von indolinderivaten. | |
AT323868B (de) | Verfahren zur herstellung von waschmitteln | |
CH555825A (de) | Verfahren zur herstellung von indolinderivaten. | |
AT334977B (de) | Verfahren zur herstellung isolierter halbleiterbereiche | |
AT313863B (de) | Verfahren zur Herstellung von Methanol | |
AT305226B (de) | Verfahren zur Herstellung von Methanol | |
AT310948B (de) | Verfahren zur Herstellung einer Salbengrundlage | |
CH546752A (de) | Verfahren zur herstellung von haertbaren cycloaliphatischen glycidylaethern. | |
AT324283B (de) | Verfahren zur herstellung von oxydationskatalysatoren | |
AT335078B (de) | Verfahren zur herstellung von 3beta-hydroxy-5alfa-cardenoliden und -bufadienoliden | |
CH515783A (de) | Verfahren zur Herstellung hygienisch-sanitärer Geräte | |
CH558809A (de) | Verfahren zur herstellung von penicillinen. | |
AT305266B (de) | Verfahren zur Herstellung neuer substituierter 2-Benzylphenole | |
AT314506B (de) | Verfahren zur Herstellung von 4-Hydroxyphenylglycin | |
AT334978B (de) | Verfahren zur herstellung mehrerer halbleiterbauelemente | |
CH557854A (de) | Verfahren zur herstellung von triarylcarbinollactonen. | |
CH550124A (de) | Verfahren zur herstellung von isothymol. | |
AT339710B (de) | Verfahren zur herstellung von nahrungsmitteln |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
UEP | Publication of translation of european patent specification |